公开(公告)号：US20210033769A1

公开(公告)日：2021-02-04

申请号：US16971464

申请日：2018-07-19

Applicant: University of Utah Research Foundation

Inventor： Rajesh Menon

IPC: G02B5/32 ,  G03H1/26 ,  G02B27/42 ,  G03H1/22

Abstract: Technology is described for methods and systems for a diffractive optic device (525) for holographic projection. The diffractive optic device can include a lens (535) configured to convey a hologram. The lens (535) further comprises a patterned material (510) formed with an array of cells having a non-planar arrangement of cell heights extending from a surface of the patterned material. The lens further optionally comprises a filling material (530) to fill gaps on both surfaces of the patterned material.

公开(公告)号：US20200275002A1

公开(公告)日：2020-08-27

申请号：US16753694

申请日：2018-10-05

Applicant: University of Utah Research Foundation

Inventor： Rajesh Menon ,  Ganghun Kim

IPC: H04N5/225

Abstract: An imaging system that is translucent can be achieved by placing an image sensor (204) at one of more edges or periphery of a translucent window (202). A small fraction of light from the outside scene scatters off imperfections (218) in the translucent window (202) and reach the peripheral image sensor (204). Based on appropriate calibration of the response of point sources (206) from the outside scene, the full scene can be reconstructed computationally from the peripherally scattered light (210, 212). The technique can be extended to color, multi-spectral, light-field, 3D, and polarization selective imaging. Applications can include surveillance, imaging for autonomous agents, microscopy, etc.

公开(公告)号：US10571861B2

公开(公告)日：2020-02-25

申请号：US15274993

申请日：2016-09-23

Applicant: University of Utah Research Foundation

Inventor： Rajesh Menon ,  Peng Wang

IPC: G02B5/32 ,  G03H1/00 ,  G03H1/08 ,  H01L21/306 ,  H01L21/67

Abstract: A system for surface patterning using a three dimensional holographic mask includes a light source configured to emit a light beam toward the holographic mask. The holographic mask can be formed as a topographical pattern on a transparent mask substrate. A semiconductor substrate can be positioned on an opposite site of the holographic mask as the light source and can be spaced apart from the holographic mask. The system can also include a base for supporting the semiconductor substrate.

公开(公告)号：US10395134B2

公开(公告)日：2019-08-27

申请号：US14444718

申请日：2014-07-28

Applicant: University of Utah Research Foundation

Inventor： Rajesh Menon

IPC: G06K9/46 ,  G01J3/28

Abstract: A spectral distribution of incident light can be determined to increase collected spectral information. The spectral distribution of the incident light can be represented as a sum of spectral components after the incident light passes through a spectrum selective element. A signal at each color pixel of the spectrum selective element can be determined using, in part, the sum of the spectral components, where the spectral components are represented by a set of preliminary values. An error associated with the signal at each color pixel of the spectrum selective element is calculated. One or more perturbations are performed on each of the preliminary values and the error associated with the signal at each color pixel of the spectrum selective element is recalculated. The perturbations on each of the preliminary values is repeated until the error stabilizes within a predetermined range in order to assign the stabilized preliminary values as the spectral components in the incident light.

公开(公告)号：US20180095300A1

公开(公告)日：2018-04-05

申请号：US15722456

申请日：2017-10-02

Applicant: University of Utah Research Foundation

Inventor： Rajesh Menon

IPC: G02F1/00 ,  G02F1/01

CPC classification number: G02F1/0054 ,  G02F1/011 ,  G02F1/0121 ,  G02F2202/30

Abstract: Metamaterial optical modulators can include one or more optical inputs, one or more optical outputs, one or more control inputs and an arrangement of a plurality of elements. The plurality of elements can include one or more variable state elements. The plurality of elements as arranged can be configured to modulate one or more properties of light passing through the metamaterial optical modulator via a change in a state of the one or more variable state elements based on one or more control signals received at the one or more control inputs.

公开(公告)号：US20170010585A1

公开(公告)日：2017-01-12

申请号：US15274993

申请日：2016-09-23

Applicant: University of Utah Research Foundation

Inventor： Rajesh Menon ,  Peng Wang

IPC: G03H1/08 ,  G02B5/32 ,  G03H1/00

CPC classification number: G03H1/0808 ,  G02B5/32 ,  G03H1/0005 ,  G03H1/08 ,  G03H2001/0094 ,  G03H2001/0816 ,  G03H2001/2221 ,  G03H2210/30 ,  H01L21/30604 ,  H01L21/67011

Abstract: A system for surface patterning using a three dimensional holographic mask includes a light source configured to emit a light beam toward the holographic mask. The holographic mask can be formed as a topographical pattern on a transparent mask substrate. A semiconductor substrate can be positioned on an opposite site of the holographic mask as the light source and can be spaced apart from the holographic mask. The system can also include a base for supporting the semiconductor substrate.

Abstract translation: 用于使用三维全息掩模的表面图案化的系统包括被配置为向全息掩模发射光束的光源。 全息掩模可以形成为透明掩模基底上的形貌图案。 半导体衬底可以定位在全息掩模的与光源相对的位置上并且可以与全息掩模间隔开。 该系统还可以包括用于支撑半导体衬底的基座。

公开(公告)号：US20150032402A1

公开(公告)日：2015-01-29

申请号：US14444718

申请日：2014-07-28

Applicant: University of Utah Research Foundation

Inventor： Rajesh Menon

IPC: G01J3/28 ,  G01J3/02

CPC classification number: G01J3/2823 ,  G06K9/4652

Abstract: A spectral distribution of incident light can be determined to increase collected spectral information. The spectral distribution of the incident light can be represented as a sum of spectral components after the incident light passes through a spectrum selective element. A signal at each color pixel of the spectrum selective element can be determined using, in part, the sum of the spectral components, where the spectral components are represented by a set of preliminary values. An error associated with the signal at each color pixel of the spectrum selective element is calculated. One or more perturbations are performed on each of the preliminary values and the error associated with the signal at each color pixel of the spectrum selective element is recalculated. The perturbations on each of the preliminary values is repeated until the error stabilizes within a predetermined range in order to assign the stabilized preliminary values as the spectral components in the incident light.

Abstract translation: 可以确定入射光的光谱分布，以增加收集的光谱信息。 入射光的光谱分布可以表示为入射光通过光谱选择元件后的光谱分量之和。 频谱选择元件的每个颜色像素处的信号可以部分地使用频谱分量的和来确定，其中频谱分量由一组初始值表示。 计算与频谱选择元件的每个颜色像素处的信号相关联的误差。 对每个初步值执行一个或多个扰动，并重新计算与频谱选择元件的每个颜色像素处的信号相关联的误差。 重复每个初步值的扰动，直到误差在预定范围内稳定，以便将稳定的初步值分配为入射光中的光谱分量。

公开(公告)号：US20140300877A1

公开(公告)日：2014-10-09

申请号：US14351465

申请日：2012-10-15

Applicant: University of Utah Research Foundation

Inventor： Rajesh Menon

IPC: G03F7/20

CPC classification number: G03F7/70291 ,  G03F7/2051 ,  G03F7/70 ,  G03F7/7035 ,  H01L21/027

Abstract: A method of programmable photolithography includes positioning (910) a programmable photomask in proximity to a photoresist layer on a sample. The programmable photomask is illuminated (920) with a plurality of different wavelengths of light simultaneously to expose the photoresist layer in a predetermined pattern. The programmable photomask is separated (930) from the photoresist layer and the photoresist layer is developed (940) to create the predetermined pattern in the photoresist layer.

Abstract translation: 可编程光刻的方法包括将可编程光掩模定位（910）在样品附近的光致抗蚀剂层附近。 可编程光掩模被同时照射多个不同波长的光（920），以以预定图案曝光光致抗蚀剂层。 可编程光掩模与光致抗蚀剂层分离（930），并且光致抗蚀剂层被显影（940）以在光致抗蚀剂层中产生预定图案。

公开(公告)号：US20140030895A1

公开(公告)日：2014-01-30

申请号：US13954437

申请日：2013-07-30

Applicant: University of Utah Research Foundation

Inventor： Rajesh Menon ,  Peng Wang

IPC: G03H1/08 ,  H01L21/67 ,  H01L21/306

CPC classification number: G03H1/0808 ,  G02B5/32 ,  G03H1/0005 ,  G03H1/08 ,  G03H2001/0094 ,  G03H2001/0816 ,  G03H2001/2221 ,  G03H2210/30 ,  H01L21/30604 ,  H01L21/67011

Abstract: A system for surface patterning using a three dimensional holographic mask includes a light source configured to emit a light beam toward the holographic mask. The holographic mask can be formed as a topographical pattern on a transparent mask substrate. A semiconductor substrate can be positioned on an opposite site of the holographic mask as the light source and can be spaced apart from the holographic mask. The system can also include a base for supporting the semiconductor substrate.

Abstract translation: 用于使用三维全息掩模的表面图案化的系统包括被配置为向全息掩模发射光束的光源。 全息掩模可以形成为透明掩模基底上的形貌图案。 半导体衬底可以定位在全息掩模的与光源相对的位置上并且可以与全息掩模间隔开。 该系统还可以包括用于支撑半导体衬底的基座。

公开(公告)号：US20230127827A1

公开(公告)日：2023-04-27

申请号：US17391309

申请日：2021-08-02

Applicant: University of Utah Research Foundation

Inventor： Rajesh Menon ,  Apratim Majumder ,  Monjurul Feeroz Meem

IPC: G02B27/42 ,  G02B27/00

Abstract: A Broadband Diffractive-Optical Element (BDOE) as a lens whose f-number and numerical aperture are decoupled. The BDOE can include a substrate and an array of optical cells formed on the substrate to have a non-linear arrangement of cell heights to diffract light into a focal spot. The geometry of the focal spot can be designed to decouple the f-number from the numerical aperture for an imaging device that employs the broadband diffractive optical element as a lens.