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    Translucent imaging systems and related methods
    2.
    发明授权
    Translucent imaging systems and related methods 有权

    公开(公告)号：US11678035B2

    公开(公告)日：2023-06-13

    申请号：US16753694

    申请日：2018-10-05

    Applicant: University of Utah Research Foundation

    Inventor： Rajesh Menon ,  Ganghun Kim

    IPC: H04N5/225

    CPC classification number: H04N5/2258 ,  H04N5/2253 ,  H04N5/2254

    Abstract: An imaging system that is translucent can be achieved by placing an image sensor (204) at one of more edges or periphery of a translucent window (202). A small fraction of light from the outside scene scatters off imperfections (218) in the translucent window (202) and reach the peripheral image sensor (204). Based on appropriate calibration of the response of point sources (206) from the outside scene, the full scene can be reconstructed computationally from the peripherally scattered light (210, 212). The technique can be extended to color, multi-spectral, light-field, 3D, and polarization selective imaging. Applications can include surveillance, imaging for autonomous agents, microscopy, etc.

    NANOPHOTONIC SCATTERING STRUCTURE
    4.
    发明申请
    NANOPHOTONIC SCATTERING STRUCTURE 有权
    纳米光散射结构

    公开(公告)号：US20140063587A1

    公开(公告)日：2014-03-06

    申请号：US14019099

    申请日：2013-09-05

    Applicant: University of Utah Research Foundation

    Inventor： Rajesh Menon ,  Peng Wang

    IPC: G06F17/50 ,  G02B26/08

    CPC classification number: G06F17/50 ,  B82Y20/00 ,  G02B26/08 ,  G06F17/5068

    Abstract: A method of designing a nanophotonic scattering structure can include establishing an initial design having an array of discrete pixels variable between at least two pixel height levels. A performance metric for the structure can be a function of the heights of the pixels. The height of a pixel can be varied, and then the performance metric can be calculated. The steps of varying the pixel height and calculating the performance metric can be repeated to increase the performance metric. The above steps can be repeated for each pixel within the array and then the method can be iterated until the performance metric reaches an optimized value. Nanophotonic scattering structures can be produced from designs obtained through this process.

    Abstract translation: 设计纳米光子散射结构的方法可以包括建立具有在至少两个像素高度之间可变的离散像素阵列的初始设计。 结构的性能指标可以是像素高度的函数。 可以改变像素的高度，然后可以计算出性能指标。 可以重复改变像素高度和计算性能度量的步骤来增加性能度量。 可以对阵列内的每个像素重复上述步骤，然后可以重复该方法，直到性能度量达到优化值。 纳米光子散射结构可以通过该方法获得的设计来制造。

    Computational microscopy through a cannula
    6.
    发明授权
    Computational microscopy through a cannula 有权

    公开(公告)号：US10429627B2

    公开(公告)日：2019-10-01

    申请号：US14950371

    申请日：2015-11-24

    Applicant: University of Utah Research Foundation

    Inventor： Rajesh Menon ,  Ganghun Kim

    IPC: G02B21/04 ,  G02B21/06 ,  H04N5/225 ,  G06K9/46 ,  G06K9/52 ,  G02B21/36 ,  G02B21/16

    Abstract: An imaging system can include an optical fiber and a light source for providing optical stimulation to a region of interest along the optical fiber. A camera can capture emission such as fluorescence resulting from the optical stimulation. A cannula configured for implantation into a subject can be configured to direct the emission from the subject. A mating sleeve coupling the cannula to the optical fiber, and configured to support the camera, can include a dichroic mirror to allow the optical stimulation to pass from the optical fiber to the cannula and to redirect the emission from the cannula to the camera.

    Sub-diffraction-limited patterning and imaging via multi-step photoswitching
    8.
    发明授权
    Sub-diffraction-limited patterning and imaging via multi-step photoswitching 有权
    亚衍射限制图案化和通过多步光切换成像

    公开(公告)号：US09063434B2

    公开(公告)日：2015-06-23

    申请号：US14152720

    申请日：2014-01-10

    Applicant: University of Utah Research Foundation

    Inventor： Rajesh Menon ,  Precious Cantu

    IPC: G03F7/20 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039

    CPC classification number: G03F7/7045 ,  G03F7/0035 ,  G03F7/0045 ,  G03F7/0395

    Abstract: Sub-diffraction-limited patterning using a photoswitchable recording material is disclosed. A substrate can be provided with a photoresist in a first transition state. The photoresist can be configured for spectrally selective reversible transitions between at least two transition states based on a first wavelength band of illumination and a second wavelength band of illumination. An optical device can selectively expose the photoresist to a standing wave with a second wavelength in the second wavelength band to convert a section of the photoresist into a second transition state. The optical device or a substrate carrier securing the substrate can modify the standing wave relative to the substrate to further expose additional regions of the photoresist into the second transition state in a specified pattern. The method can further convert one of the first and second transition states of the photoresist into an irreversible transition state, while the other of the first and second transition states remains in a reversible transition state. The photoresist can be developed to remove the regions of the photoresist in the irreversible transition state.

    Abstract translation: 公开了使用可光开关的记录材料进行亚衍射限制图案化。 衬底可以设置有处于第一过渡状态的光致抗蚀剂。 光致抗蚀剂可以被配置用于基于照明的第一波长带和第二波长带照明的至少两个过渡状态之间的光谱选择性可逆转换。 光学装置可以选择性地将光致抗蚀剂暴露于第二波长带中的第二波长的驻波，以将光致抗蚀剂的一部分转化为第二过渡状态。 固定衬底的光学器件或衬底载体可以改变相对于衬底的驻波，以进一步将光致抗蚀剂的附加区域以特定的图案曝光到第二过渡状态。 该方法可以将光致抗蚀剂的第一和第二过渡态之一进一步转换成不可逆的过渡态，而第一和第二过渡态中的另一个保持在可逆转变状态。 可以显影光致抗蚀剂以去除处于不可逆过渡状态的光致抗蚀剂的区域。

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