公开(公告)号：US20110180965A1

公开(公告)日：2011-07-28

申请号：US13011844

申请日：2011-01-21

申请人： Wei Zhang ,  Hua Tan ,  Lin Hu ,  Stephen Y. Chou

发明人： Wei Zhang ,  Hua Tan ,  Lin Hu ,  Stephen Y. Chou

IPC分类号： B28B11/08 ,  B29C35/08 ,  B28B21/42 ,  B28B17/00

CPC分类号： B29C59/02 ,  B29L2007/001 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： The invention disclosed apparatuses and methods to do nanoimprint lithography using a deformable mold. Generally, the apparatus has a chamber with a transparent section on its top wall, which is capable of vacuuming and pressurizing. The deformable mold fixed firmly onto a hollow mold holder around its full periphery is attached to top inner surface of the chamber and positioned underneath the transparent section. The central area of the mold is freely accessible from underneath through the opening of the mold holder. An enclosed volume referring to mold mini-chamber is formed between the mold/holder and top wall of the chamber. Inside chamber, a stage assembly is installed. A chuck to vacuumly hold a substrate is mounted on top of the stage assembly. At beginning of the imprinting, the substrate with a layer of resist is positioned underneath the mold at a predetermined gap between them. Then, the substrate is moved up to contact with the mold either under vacuum or under atmosphere. The substrate and mold may be pressed further by introducing higher pressure inside the chamber. After consolidating the resist, the substrate is separated from the mold by either direct pull-down enabled by stage movement or deforming the mold enabled by differential pressure between the mold mini-chamber and the bulk volume of the chamber, or mixing of both.

摘要翻译： 本发明公开了使用可变形模具进行纳米压印光刻的装置和方法。 通常，该装置具有在其顶壁上具有透明部分的室，其能够进行抽真空和加压。 可变形模具牢固地固定在围绕其整个周边的中空模具架上，附接到室的顶部内表面并且定位在透明部分下方。 模具的中心区域可以通过模具夹具的开口从下面自由进入。 在模具/保持器和腔室的顶壁之间形成涉及模具小室的封闭体积。 内腔，安装了一个舞台组件。 用于真空地保持基板的卡盘安装在平台组件的顶部上。 在刻印开始时，具有抗蚀剂层的基板位于模具下面，处于它们之间的预定间隙。 然后，在真空或大气下，将基板向上移动以与模具接触。 可以通过在室内引入更高的压力来进一步压制基底和模具。 在固化抗蚀剂之后，通过在模具微型室和室的体积之间的差压或通过两者的混合的阶段移动或使模具变形来实现直接下拉，衬底与模具分离。

公开(公告)号：US20110155060A1

公开(公告)日：2011-06-30

申请号：US13027530

申请日：2011-02-15

申请人： Wei Zhang ,  Lin Hu ,  Hua Tan ,  Linshu Kong ,  Stephen Y. Chou

发明人： Wei Zhang ,  Lin Hu ,  Hua Tan ,  Linshu Kong ,  Stephen Y. Chou

IPC分类号： C23C16/513

CPC分类号： H01J37/32431 ,  B82Y10/00 ,  B82Y40/00 ,  C23C14/12 ,  G03F7/0002 ,  H01J2237/3355

摘要： A surface coating apparatus for preparing a work piece having a working surface for imprint lithography, wherein the work piece comprises either a mold or a substrate. The apparatus includes a vacuum chamber and a generator to produce chemical reaction radicals for cleaning the working surface. The generator may be located inside said vacuum chamber and connected to an inner surface of said vacuum chamber or external to the vacuum chamber and connected thereto via suitable couplings. A fixture within the vacuum chamber is configured to hold the work piece with the working surface accessible by the chemical reaction radicals, and a means is provided for depositing a molecular layer of surfactant on the working surface inside the vacuum chamber.

摘要翻译： 一种用于制备具有用于压印光刻的工作表面的工件的表面涂覆装置，其中所述工件包括模具或基板。 该装置包括一个真空室和发生器，以产生用于清洁工作表面的化学反应基团。 发生器可以位于所述真空室内并且连接到所述真空室的内表面或者在真空室的外部，并通过适当的联接与其连接。 真空室内的固定装置构造成保持工件与化学反应基团可接近的工作表面，并提供一种用于在真空室内的工作表面上沉积表面活性剂分子的装置。

公开(公告)号：US20100247698A1

公开(公告)日：2010-09-30

申请号：US12795063

申请日：2010-06-07

申请人： Wei Zhang ,  Hua Tan ,  Stephen Y. Chou

发明人： Wei Zhang ,  Hua Tan ,  Stephen Y. Chou

IPC分类号： B29C59/02

CPC分类号： B29C37/0053 ,  B29C33/10 ,  B29C33/46 ,  B29C37/006 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： A mold for imprinting a patterned region by imprint lithography is provided with a peripheral groove around the patterned region. The groove is connected, as by channels through the mold, to a switchable source for gas removal to prevent bubbles and for the application of pressurized gas to separate the mold and substrate. In use, the mold is disposed adjacent the moldable surface and gas is withdrawn from the patterned region through the groove as the mold is pressed toward and into the moldable surface. At or near the end of the imprinting, the process is switched from removal of gas to the application of pressurized gas. The pressurized gas passes through the groove and separates or facilitates separation of the mold and the moldable surface.

摘要翻译： 用于通过压印光刻压印图案化区域的模具在图案化区域周围设置有周边凹槽。 凹槽通过通过模具的通道连接到用于气体去除的可切换源，以防止气泡和用于加压气体以分离模具和基底。 在使用中，模具邻近可模制表面设置，并且当模具被压入可模制表面时，气体通过凹槽从图案化区域中排出。 在压印结束或接近结束时，该过程从去除气体切换到施加加压气体。 加压气体通过凹槽并分离或便于模具和可模制表面的分离。

公开(公告)号：US20080122144A1

公开(公告)日：2008-05-29

申请号：US11945033

申请日：2007-11-26

申请人： Wei Zhang ,  Hua Tan ,  Lin Hu ,  Stephen Y. Chou

发明人： Wei Zhang ,  Hua Tan ,  Lin Hu ,  Stephen Y. Chou

IPC分类号： B29C33/44 ,  B29C59/02 ,  B41F1/18

CPC分类号： B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： In imprint lithography, a mold having a pattern of projecting and recessed regions is pressed into a moldable surface on a substrate. The thus-imprinted moldable surface is permitted to at least partially harden to retain the imprint, and the substrate and mold are separated. In accordance with the invention, the substrate is separated from the mold by bending laterally distal regions (regions away from the center toward the edges) of the mold transversely away from the interface and transversely restraining the substrate. The mold can then be easily separated from the substrate by transverse displacement. The separation can be facilitated by providing a mold having a lateral dimension that on at least two sides extends beyond the corresponding lateral dimension of the substrate. Alternatively, the substrate can have a greater lateral extent than the mold, and the mold can be restrained. The distal regions of the substrate can be bent in the transverse direction. Apparatus for effecting such separation is also described.

摘要翻译： 在压印光刻中，将具有突出和凹陷区域的图案的模具压入基板上的可模制表面中。 允许这样印制的可模塑表面至少部分地硬化以保持印记，并且分离基底和模具。 根据本发明，通过将模具的横向远离区域（远离中心朝向边缘的区域）横向远离界面弯曲并横向限制基底，将基底与模具分离。 然后可以通过横向位移容易地将模具与基底分离。 可以通过提供具有在至少两侧上延伸超过衬底的相应横向尺寸的横向尺寸的模具来促进分离。 或者，基板可以具有比模具更大的横向延伸，并且可以限制模具。 基板的远端区域可以在横向方向上弯曲。 还描述了用于实现这种分离的装置。

公开(公告)号：US08087922B2

公开(公告)日：2012-01-03

申请号：US12691202

申请日：2010-01-21

申请人： Wei Zhang ,  Hua Tan ,  Lin Hu ,  Stephen Y. Chou

发明人： Wei Zhang ,  Hua Tan ,  Lin Hu ,  Stephen Y. Chou

IPC分类号： B29C59/00 ,  B28B7/10

CPC分类号： B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： In imprint lithography, a mold having a pattern of projecting and recessed regions is pressed into a moldable surface on a substrate. The thus-imprinted moldable surface is permitted to at least partially harden to retain the imprint, and the substrate and mold are separated. In accordance with the invention, the substrate is separated from the mold by bending laterally distal regions (regions away from the center toward the edges) of the mold transversely away from the interface and transversely restraining the substrate. The mold can then be easily separated from the substrate by transverse displacement. The separation can be facilitated by providing a mold having a lateral dimension that on at least two sides extends beyond the corresponding lateral dimension of the substrate. Alternatively, the substrate can have a greater lateral extent than the mold, and the mold can be restrained. The distal regions of the substrate can be bent in the transverse direction. Apparatus for effecting such separation is also described.

摘要翻译： 在压印光刻中，将具有突出和凹陷区域的图案的模具压入基板上的可模制表面中。 允许这样印制的可模塑表面至少部分地硬化以保持印记，并且分离基底和模具。 根据本发明，通过将模具的横向远离区域（远离中心朝向边缘的区域）横向远离界面弯曲并横向限制基底，将基底与模具分离。 然后可以通过横向位移容易地将模具与基底分离。 可以通过提供具有在至少两侧上延伸超过衬底的相应横向尺寸的横向尺寸的模具来促进分离。 或者，基板可以具有比模具更大的横向延伸，并且可以限制模具。 基板的远端区域可以在横向方向上弯曲。 还描述了用于实现这种分离的装置。

公开(公告)号：US08025829B2

公开(公告)日：2011-09-27

申请号：US11945407

申请日：2007-11-27

申请人： Wei Zhang ,  Hua Tan ,  Lin Hu ,  Stephen Y. Chou

发明人： Wei Zhang ,  Hua Tan ,  Lin Hu ,  Stephen Y. Chou

IPC分类号： B29C59/02

CPC分类号： B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10S977/887

摘要： In accordance with the invention, step-and-repeat imprint lithography is effected by applying balanced pressing forces from both sides of a substrate. The pressing forces are substantially equal in amplitude and opposite in direction. With the pressing forces thus balanced, the fixture that steps and holds the substrate does not bear the load of imprinting. The balance allows use of a high resolution aligning stage to carry the substrate and to maintain high accuracy of positioning without being shifted by change of load. With this method, sufficient imprint pressure can be used to obtain high quality patterning, a thin and uniform residual layer, and a high fidelity pattern.

摘要翻译： 根据本发明，通过从衬底的两侧施加平衡的压力来实现步进重复压印光刻。 按压力在幅度上基本相等并且在方向上相反。 由于如此平衡的按压力，步进并保持基板的夹具不承受压印的载荷。 平衡允许使用高分辨率对准台承载基板并且保持高精度的定位而不会因负载变化而偏移。 通过这种方法，可以使用足够的压印压力来获得高质量图案，薄而均匀的残留层和高保真图案。

公开(公告)号：US20100244324A1

公开(公告)日：2010-09-30

申请号：US12794971

申请日：2010-06-07

申请人： Wei Zhang ,  Hua Tan ,  Stephen Y. Chou

发明人： Wei Zhang ,  Hua Tan ,  Stephen Y. Chou

IPC分类号： B28B7/12

CPC分类号： B29C37/0053 ,  B29C33/10 ,  B29C33/46 ,  B29C37/006 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： A mold for imprinting a patterned region by imprint lithography is provided with a peripheral groove around the patterned region. The groove is connected, as by channels through the mold, to a switchable source for gas removal to prevent bubbles and for the application of pressurized gas to separate the mold and substrate. In use, the mold is disposed adjacent the moldable surface and gas is withdrawn from the patterned region through the groove as the mold is pressed toward and into the moldable surface. At or near the end of the imprinting, the process is switched from removal of gas to the application of pressurized gas. The pressurized gas passes through the groove and separates or facilitates separation of the mold and the moldable surface.

公开(公告)号：US07635262B2

公开(公告)日：2009-12-22

申请号：US10637838

申请日：2003-08-08

申请人： Stephen Y. Chou ,  Hua Tan ,  Wei Zhang

发明人： Stephen Y. Chou ,  Hua Tan ,  Wei Zhang

IPC分类号： B29C59/02

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： Improved apparatus for imprint lithography involves using direct fluid pressure to press a mold into a substrate-supported film. Advantageously the mold and/or substrate are sufficiently flexible to provide wide area contact under the fluid pressure. Fluid pressing can be accomplished by sealing the mold against the film and disposing the resulting assembly in a pressurized chamber. The result of this fluid pressing is enhanced resolution and high uniformity over an enlarged area.

摘要翻译： 用于压印光刻的改进的设备涉及使用直接流体压力将模具压入基板支撑的膜中。 有利地，模具和/或基底具有足够的柔性以在流体压力下提供广泛的面积接触。 流体压制可以通过将模具密封在膜上并将所得的组件设置在加压室中来实现。 这种流体压制的结果是在扩大的区域上增强了分辨率和高均匀性。

公开(公告)号：US06999156B2

公开(公告)日：2006-02-14

申请号：US10674608

申请日：2003-09-30

申请人： Stephen Y. Chou ,  Allan S. P. Chang ,  Hua Tan ,  Jim Jiam Wong ,  Wei Wu ,  Rich Zhaoning Yu

发明人： Stephen Y. Chou ,  Allan S. P. Chang ,  Hua Tan ,  Jim Jiam Wong ,  Wei Wu ,  Rich Zhaoning Yu

IPC分类号： G02F1/13

CPC分类号： G02F1/133553 ,  G02F1/1326 ,  G02F1/1393 ,  G02F2201/307 ,  G02F2203/055

摘要： In accordance with the invention, a tunable subwavelength resonant grating filter comprises a liquid crystal cell having a pair of major surface walls. One wall of the cell is a coated subwavelength grating of a SRGF. The coating comprises a polymer layer to fill the grating trenches and a surfactant layer to facilitate uniform alignment of the liquid crystal material. The refractive index of the LCD material in the cell can then be electrically or thermally adjusted to tune the resonant wavelength.

摘要翻译： 根据本发明，可调谐亚波长谐振光栅滤波器包括具有一对主表面壁的液晶单元。 电池的一个壁是SRGF的涂覆的亚波长光栅。 涂层包括填充光栅沟槽的聚合物层和表面活性剂层以促进液晶材料的均匀取向。 然后可以对电池中的LCD材料的折射率进行电或热调节以调谐谐振波长。

公开(公告)号：US07322287B2

公开(公告)日：2008-01-29

申请号：US10926376

申请日：2004-08-25

申请人： Hua Tan ,  Linshu Kong ,  Mingtao Li ,  Stephen Y. Chou

发明人： Hua Tan ,  Linshu Kong ,  Mingtao Li ,  Stephen Y. Chou

IPC分类号： H01L21/302

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  Y10S438/945

摘要： Improved apparatus for imprint lithography involves using direct fluid pressure to press a mold into a substrate-supported film. Advantageously the mold and/or substrate are sufficiently flexible to provide wide area contact under the fluid pressure. Fluid pressing can be accomplished by sealing the mold against the film and disposing the resulting assembly in a pressurized chamber. The result of this fluid pressing is enhanced resolution and high uniformity over an enlarged area.

摘要翻译： 用于压印光刻的改进的设备涉及使用直接流体压力将模具压入基板支撑的膜中。 有利地，模具和/或基底具有足够的柔性以在流体压力下提供广泛的面积接触。 流体压制可以通过将模具密封在膜上并将所得的组件设置在加压室中来实现。 这种流体压制的结果是在扩大的区域上增强了分辨率和高均匀性。