Substrate noise isolation structures for semiconductor devices

    公开(公告)号:US09923051B1

    公开(公告)日:2018-03-20

    申请号:US15272292

    申请日:2016-09-21

    Applicant: Xilinx, Inc.

    CPC classification number: H01L29/0623 H01L21/761 H01L21/823481

    Abstract: An example a semiconductor device includes a first circuit and a second circuit formed in a semiconductor substrate. The semiconductor device further includes a first guard structure formed in the semiconductor substrate and disposed between the first circuit and the second circuit, the first guard structure including first discontinuous pairs of n+ and p+ diffusions disposed along a first axis. The semiconductor device further includes a second guard structure formed in the semiconductor substrate and disposed between the first circuit and the second circuit, the second guard structure including second discontinuous pairs of n+ and p+ diffusions disposed along the first axis, the second discontinuous pairs of n+ and p+ diffusions being staggered with respect to the first discontinuous pairs of n+ and p+ diffusions.

    INTEGRATED CIRCUIT WITH SHIELDING STRUCTURES
    13.
    发明申请

    公开(公告)号:US20180076134A1

    公开(公告)日:2018-03-15

    申请号:US15267035

    申请日:2016-09-15

    Applicant: Xilinx, Inc.

    CPC classification number: H01L23/5227 H01L23/5225 H01L23/645 H01L28/10

    Abstract: A semiconductor device includes an interconnect structure disposed over a semiconductor substrate. The interconnect structure includes a first device disposed in a first portion of the interconnect structure. A first shielding plane including a first conductive material is disposed in a second portion of the interconnect structure over the first portion of the interconnect structure. A second device is disposed in a third portion of the interconnect structure over the second portion of the interconnect structure. An isolation wall including a second conductive material is disposed in the first, second, and third portions of the interconnect structure. The isolation wall is coupled to the first shielding plane, and surrounds the first device, the first shielding plane, and the second device.

    Inductor structure with a current return encompassing a coil
    15.
    发明授权
    Inductor structure with a current return encompassing a coil 有权
    具有电流返回的电感器结构包含线圈

    公开(公告)号:US08860180B2

    公开(公告)日:2014-10-14

    申请号:US13661195

    申请日:2012-10-26

    Applicant: Xilinx, Inc.

    Abstract: An inductor structure implemented within a semiconductor integrated circuit includes a coil of conductive material including at least one turn and a current return encompassing the coil. The current return is formed of a plurality of interconnected metal layers of the semiconductor integrated circuit.

    Abstract translation: 在半导体集成电路内实现的电感器结构包括包括至少一个匝的导电材料的线圈和包围线圈的电流返回。 电流返回由半导体集成电路的多个互连的金属层形成。

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