Rotary actuator
    13.
    发明授权
    Rotary actuator 失效
    旋转执行机构

    公开(公告)号:US4916342A

    公开(公告)日:1990-04-10

    申请号:US317723

    申请日:1989-03-02

    CPC分类号: H02K41/0358 G11B5/5521

    摘要: In a rotary actuator including a voice coil motor having a coil fitted to the other end portion of a carriage fixed to a rotary shaft and having a load at one of the end portions thereof, the rotary actuator of the present invention is characterized in that the rotation on the coil side and the rotation on the load side with respect to the rotary shaft are balanced. The weight of the coil is adjusted by forming the coil by at least two kinds of coil wires having different specific gravities, and where a plurality of coils are disposed on the outer side of the rotary shaft, the weight of the coil on the load side is made smaller than that of the coil on the opposite side.

    摘要翻译: 在具有线圈马达的旋转执行机构中,本发明的旋转执行机构具有线圈马达,该线圈马达具有与固定在旋转轴上的托架的另一端部并且在其一端部具有载荷的线圈,其特征在于, 平衡线圈侧的旋转和负载侧相对于旋转轴的旋转。 线圈的重量通过由具有不同比重的至少两种线圈线形成线圈来调节,并且多个线圈设置在旋转轴的外侧,负载侧的线圈的重量 比在相对侧的线圈小。

    Method of manufacturing semiconductor device having polycrystalline
silicon layer with metal silicide film
    14.
    发明授权
    Method of manufacturing semiconductor device having polycrystalline silicon layer with metal silicide film 失效
    制造具有金属硅化物膜的多晶硅层的半导体器件的方法

    公开(公告)号:US4716131A

    公开(公告)日:1987-12-29

    申请号:US675768

    申请日:1984-11-28

    摘要: A metal silicide film is formed on the sides of a polycrystalline silicon layer formed on a semiconductor substrate via an insulating film and the surface of the metal silicide film is covered by a silicon oxide film, whereby the silicon layer has a low electrical resistance and no short-circuiting is necessary. For example, in an insulated gate field effect transistor, the gate electrode is constituted by the polycrystalline silicon layer and the metal silicide film at the side walls of the polycrystalline silicon layer. Such a gate electrode has a low electrical resistance and does not cause undesirable short-circuiting with source and drain regions by the existence of the silicon oxide film formed on the surface of the metal silicide film. Also, other metal silicide film may be formed on the upper surface of the gate electrode. Moreover the silicide-SiO.sub.2 structure may be used on the source and drain regions.

    摘要翻译: 通过绝缘膜在半导体衬底上形成的多晶硅层的侧面上形成金属硅化物膜,并且金属硅化物膜的表面被氧化硅膜覆盖,由此硅层具有低电阻和无 短路是必要的。 例如,在绝缘栅场效应晶体管中,栅极由多晶硅层和多晶硅层侧壁的金属硅化物膜构成。 这种栅电极具有低电阻,并且由于存在形成在金属硅化物膜的表面上的氧化硅膜,不会引起与源区和漏区的不期望的短路。 而且,也可以在栅电极的上表面上形成其他的金属硅化物膜。 此外,硅化物SiO 2结构可以用在源区和漏区上。