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公开(公告)号:US20220173731A1
公开(公告)日:2022-06-02
申请号:US17543720
申请日:2021-12-06
Applicant: pSemi Corporation
Inventor: Alexander Dribinsky , Tae Youn Kim , Dylan J. Kelly , Christopher N. Brindle
IPC: H03K17/16 , H03K17/10 , H03K17/284 , H03K17/687 , H03K17/689
Abstract: A circuit and method for controlling charge injection in a circuit are disclosed. In one embodiment, the circuit and method are employed in a semiconductor-on-insulator (SOI) Radio Frequency (RF) switch. In one embodiment, an SOI RF switch comprises a plurality of switching transistors coupled in series, referred to as “stacked” transistors, and implemented as a monolithic integrated circuit on an SOI substrate. Charge injection control elements are coupled to receive injected charge from resistively-isolated nodes located between the switching transistors, and to convey the injected charge to at least one node that is not resistively-isolated. In one embodiment, the charge injection control elements comprise resistors. In another embodiment, the charge injection control elements comprise transistors. A method for controlling charge injection in a switch circuit is disclosed whereby injected charge is generated at resistively-isolated nodes between series coupled switching transistors, and the injected charge is conveyed to at least one node of the switch circuit that is not resistively-isolated.
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公开(公告)号:US11201245B2
公开(公告)日:2021-12-14
申请号:US16739081
申请日:2020-01-09
Applicant: pSemi Corporation
Inventor: Michael A. Stuber , Christopher N. Brindle , Dylan J. Kelly , Clint L. Kemerling , George P. Imthurn , Robert B. Welstand , Mark L. Burgener , Alexander Dribinsky , Tae-Youn Kim
IPC: G06F30/33 , H01L29/786 , H01L27/12 , H01L29/49 , H03K17/16
Abstract: A method and apparatus are disclosed for use in improving the gate oxide reliability of semiconductor-on-insulator (SOD metal-oxide-silicon field effect transistor (MOSFET) devices using accumulated charge control (ACC) techniques. The method and apparatus are adapted to remove, reduce, or otherwise control accumulated charge in SOI MOSFETs, thereby yielding improvements in FET performance characteristics. In one embodiment, a circuit comprises a MOSFET, operating in an accumulated charge regime, and means for controlling the accumulated charge, operatively coupled to the SOI MOSFET. A first determination is made of the effects of an uncontrolled accumulated charge on time dependent dielectric breakdown (TDDB) of the gate oxide of the SOI MOSFET. A second determination is made of the effects of a controlled accumulated charge on TDDB of the gate oxide of the SOI MOSFET. The SOI MOSFET is adapted to have a selected average time-to-breakdown, responsive to the first and second determinations, and the circuit is operated using techniques for accumulated charge control operatively coupled to the SOI MOSFET. In one embodiment, the accumulated charge control techniques include using an accumulated charge sink operatively coupled to the SOI MOSFET body.
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公开(公告)号:US20210152170A1
公开(公告)日:2021-05-20
申请号:US16921790
申请日:2020-07-06
Applicant: pSemi Corporation
Inventor: Alexander Dribinsky , Tae Youn Kim , Dylan J. Kelly , Christopher N. Brindle
IPC: H03K17/16 , H03K17/10 , H03K17/284 , H03K17/687 , H03K17/689
Abstract: A circuit and method for controlling charge injection in a circuit are disclosed. In one embodiment, the circuit and method are employed in a semiconductor-on-insulator (SOI) Radio Frequency (RF) switch. In one embodiment, an SOI RF switch comprises a plurality of switching transistors coupled in series, referred to as “stacked” transistors, and implemented as a monolithic integrated circuit on an SOI substrate. Charge injection control elements are coupled to receive injected charge from resistively-isolated nodes located between the switching transistors, and to convey the injected charge to at least one node that is not resistively-isolated. In one embodiment, the charge injection control elements comprise resistors. In another embodiment, the charge injection control elements comprise transistors. A method for controlling charge injection in a switch circuit is disclosed whereby injected charge is generated at resistively-isolated nodes between series coupled switching transistors, and the injected charge is conveyed to at least one node of the switch circuit that is not resistively-isolated.
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公开(公告)号:US20180212599A1
公开(公告)日:2018-07-26
申请号:US15826453
申请日:2017-11-29
Applicant: pSemi Corporation
Inventor: Alexander Dribinsky , Tae Youn Kim , Dylan J. Kelly , Christopher N. Brindle
IPC: H03K17/16 , H03K17/284 , H03K17/10 , H03K17/687 , H03K17/689 , H03K17/04 , H03K17/08 , H03K17/06
Abstract: A circuit and method for controlling charge injection in a circuit are disclosed. In one embodiment, the circuit and method are employed in a semiconductor-on-insulator (SOI) Radio Frequency (RF) switch. In one embodiment, an SOI RF switch comprises a plurality of switching transistors coupled in series, referred to as “stacked” transistors, and implemented as a monolithic integrated circuit on an SOI substrate. Charge injection control elements are coupled to receive injected charge from resistively-isolated nodes located between the switching transistors, and to convey the injected charge to at least one node that is not resistively-isolated. In one embodiment, the charge injection control elements comprise resistors. In another embodiment, the charge injection control elements comprise transistors. A method for controlling charge injection in a switch circuit is disclosed whereby injected charge is generated at resistively-isolated nodes between series coupled switching transistors, and the injected charge is conveyed to at least one node of the switch circuit that is not resistively-isolated.
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