摘要:
In a method of controlling a manufacturing process, a Mahalanobis space of plural manufacturing control parameters is generated on the basis of first sampled data. Then, a Mahalanobis distance from the Mahalanobis space and second sampled data is calculated. A manufacturing process is determined to be under a malfunction operating condition by comparing the Mahalanobis distance and a threshold value.
摘要:
[PROBLEM] To visually display the manufacturing statuses of products manufactured through a plurality of manufacturing processes in order and changes of process characteristic factors caused in the manufacturing processes. [SOLVING MEANS] A visualization system according to an embodiment stores manufacturing log information including start times and end times of manufacturing processes of products grouped in manufacturing units and manufactured through a plurality of manufacturing processes in order, and chronological history information of process characteristic factors corresponding to factors affecting quality characteristics in the manufacturing processes. A time axis for the process characteristic factors in synchronization with the time course of the manufacturing log information is created, and a display object representing a state or a change of each of the process characteristic factors is created based on the chronological history information and placed on the time axis to create a time line object of each of the process characteristic factors. A process characteristic factor timeline screen including the timeline objects of the respective process characteristic factors arranged in parallel is displayed on a display apparatus.
摘要:
An information processing device includes a target value receiving unit receiving one or more types of target values in a predetermined semiconductor manufacturing process; a parameter acquiring unit acquiring values of parameters during the semiconductor manufacturing process; an execution result acquiring unit acquiring one or more types of execution results indicating results of the semiconductor manufacturing process; an accumulation unit associating the execution results, the target values, and the values of parameters with one another and accumulating the same; a correlation acquiring unit acquiring correlation information indicating correlations among the execution results, the target values, and the values of parameters; an assist information acquiring unit acquiring assist information related to parameters with high correlation with respect to the target values received by the target value receiving unit by using the correlation information; and an output unit outputting the assist information acquired by the assist information acquiring unit.
摘要:
A plant information display apparatus and a plant information display method are provided. A defining section 11 defines correspondence relationships between all of plant data and softwares displaying the corresponding plant data. A plant data displaying section 12 expands and displays the plant data in a hierarchical manner. A plant data selection accepting section 13 accepts an operation of selecting the plant data on the screen displayed by the plant data displaying section 12. A software selection accepting section 14 displays a selecting screen for selecting one of the softwares, and accepts an operation of selecting the one of the softwares in accordance with an operation of the selecting screen. A extracting section 15 extracts the software or plant data based on the defining section 11.
摘要:
A computer-implemented method, system and computer program device are provided for monitoring production of semiconductor products to detect potential defect excursions. Equipment based data is collected reflecting equipment performance for a plurality of semiconductor manufacturing tools used for processing a plurality of semiconductor products. Also, product level data is collected reflecting product quality for the plurality of semiconductor products processed on the plurality of manufacturing tools. At least a portion of the product level data and at least a portion of the equipment based data are then correlated. At least one report is generated of the correlation of data.
摘要:
A process control system includes a client computer which prepares a correlation between a reference monitored value of apparatus information and a feature quantity, a manufacturing execution system which prepares a processing recipe describing, as a first setting value in an actual manufacturing process, a value of the control parameter, an apparatus information collection section which collects an objective monitored value of the apparatus information in operation of the actual manufacturing process with the first setting value, a feature quantity calculation section which calculates a value of a feature quantity corresponding to the objective monitored value based on the correlation, a parameter calculation section which calculates a second setting value in the actual manufacturing process on the basis of the value of the feature quantity, and an apparatus control unit which changes the processing recipe with the second setting value being as a setting value of the second step.
摘要:
In invariant relation analysis, a correlation diagram with improved visibility is obtained.A system analysis device (100) includes a correlation model storage unit (112), and the display control unit (105). The correlation model storage unit (112) stores the correlation model expressing correlations between metrics in the system. The display control unit (105) divides a display region into n divided regions such that an area of a divided region i (1≦i≦n) is equal to or larger than an area of a divided region i+1. The display control unit 105 allocates each of the plurality of clusters obtained by tracking correlations contained in the correlation model to the divided region i sequentially selected from i=1, in the decreasing order of the number of metrics contained in each of the clusters, in such a way that the allocated number increases in accordance with increase in i. The display control unit 105 draws the cluster allocated to the respective divided region i in the divided region i.
摘要:
User interfaces for displaying relationships between cells in a grid. In one example embodiment, a user interface includes a grid including rows and columns and a plurality of cells each having a specific position in the grid. A first one of the cells is related to a second one of the cells. The grid is configured to display, upon selection of the first cell or second cell, a visual representation of the relationship between the first cell and the second cell.
摘要:
A process control system includes a client computer which prepares a correlation between a reference monitored value of apparatus information and a feature quantity, a manufacturing execution system which prepares a processing recipe describing, as a first setting value in an actual manufacturing process, a value of the control parameter, an apparatus information collection section which collects an objective monitored value of the apparatus information in operation of the actual manufacturing process with the first setting value, a feature quantity calculation section which calculates a value of a feature quantity corresponding to the objective monitored value based on the correlation, a parameter calculation section which calculates a second setting value in the actual manufacturing process on the basis of the value of the feature quantity, and an apparatus control unit which changes the processing recipe with the second setting value being as a setting value of the second step.
摘要:
A process control system includes a client computer which prepares a correlation between a reference monitored value of apparatus information and a feature quantity, a manufacturing execution system which prepares a processing recipe describing, as a first setting value in an actual manufacturing process, a value of the control parameter, an apparatus information collection section which collects an objective monitored value of the apparatus information in operation of the actual manufacturing process with the first setting value, a feature quantity calculation section which calculates a value of a feature quantity corresponding to the objective monitored value based on the correlation, a parameter calculation section which calculates a second setting value in the actual manufacturing process on the basis of the value of the feature quantity, and an apparatus control unit which changes the processing recipe with the second setting value being as a setting value of the second step.