公开(公告)号：US20230174884A1

公开(公告)日：2023-06-08

申请号：US18047419

申请日：2022-10-18

Applicant: BestLine International Research, Inc.

Inventor： Ronald J. SLOAN

IPC: C10M161/00 ,  C10M143/08 ,  C10M127/00 ,  C07F17/00 ,  C08G61/02 ,  C08K3/16 ,  C10M125/06 ,  C10M131/00 ,  C10M169/04

CPC classification number: C10M161/00 ,  C10M143/08 ,  C10M127/00 ,  C07F17/00 ,  C08G61/02 ,  C08K3/16 ,  C10M125/06 ,  C10M131/00 ,  C10M169/04 ,  C10M2203/10 ,  C10M2203/1006 ,  C10M2203/1025 ,  C10M2205/028 ,  C10M2205/0285 ,  C10M2213/062 ,  C10M2219/044 ,  C10M2219/046 ,  C10M2203/102 ,  C10N2030/02

Abstract: An environmentally-improved motor oil blend and related methods for properly lubricating components of an engine and favorably modifying a plastic response of components of the engine, the blend being free of zinc di-alkyl-di-thiophosphates (ZDDP) and free of zinc di-thiophosphate (ZDTP), comprising: a motor oil selected from the motor oil group consisting of Group I, Group II, Group III, Group IV, and Group V motor oils; a motor oil additive comprising alpha-olefins and hydroisomerized hydro-treated severe hydrocracked base oil; ZDDP omitted from the chemical constituents of the motor oil; and ZDTP omitted from the chemical constituents of the motor oil.

公开(公告)号：US20230174694A1

公开(公告)日：2023-06-08

申请号：US18102858

申请日：2023-01-30

Applicant: Univation Technologies, LLC

Inventor： Francis C. Rix ,  Ching-Tai Lue ,  C. Jeff Harlan ,  Laughlin G. McCullough

IPC: C08F210/16 ,  C08F4/659 ,  C07F17/00 ,  C08J5/18 ,  C08F210/02 ,  C08F4/76 ,  C08F2/00 ,  C08F2/34

CPC classification number: C08F210/16 ,  C07F17/00 ,  C08F2/00 ,  C08F2/34 ,  C08F4/76 ,  C08F4/65904 ,  C08F210/02 ,  C08J5/18 ,  C08L23/0815

Abstract: Catalyst systems and methods for making and using the same. A method of polymerizing olefins to produce a polyolefin polymer with a multimodal composition distribution, includes contacting ethylene and a comonomer with a catalyst system. The catalyst system includes a first catalyst compound and a second catalyst compound that are co-supported to form a commonly supported catalyst system. The first catalyst compound includes a compound with the general formula (C5HaR1b)(C5HcR2d)HfX2. The second catalyst compound includes at least one of the following general formulas:










In both catalyst systems, the R groups can be independently selected from any number of substituents, including, for example, H, a hydrocarbyl group, a substituted hydrocarbyl group, or a heteroatom group, among others.

公开(公告)号：US20230141606A1

公开(公告)日：2023-05-11

申请号：US17906394

申请日：2021-03-18

Applicant: ExxonMobil Chemical Patents Inc.

Inventor： Lubin Luo ,  Nikola S. Lambic ,  Jo Ann M. Canich

IPC: C08F4/6592 ,  C08F4/62 ,  C07F17/00

CPC classification number: C08F4/65927 ,  C08F4/62093 ,  C07F17/00 ,  C08F2420/01 ,  C08F2420/08 ,  C08F2410/01

Abstract: The alkylation of transition metal coordination catalyst complexes (such as metallocenes and/or post-metallocenes) in non-polar solvents with high conversion to the dialkylated transition metal coordination catalyst complex may be accomplished by reacting (a) a transition metal coordination catalyst complex comprising a transition metal linked to at least one an anionic donor ligand and at least one leaving group having a non-carbon atom directly linked to the transition metal, (b) an aluminum alkyl, and (c) a fluoride salt at 0° C. to 85° C. in a non-polar solvent to yield an alkylated transition metal coordination catalyst complex.

公开(公告)号：US20230086874A1

公开(公告)日：2023-03-23

申请号：US17985254

申请日：2022-11-11

Applicant: SABIC GLOBAL TECHNOLOGIES B.V.

Inventor： Coen HENDRIKSEN ,  Nicolaas Hendrika FRIEDERICHS ,  Alexander Z. VOSKOBOYNIKOV ,  Antonio VITTORIA ,  Vincenzo BUSICO ,  Roberta CIPULLO ,  Dmitry Y. MLADENTSEV ,  Bogdan A. GUZEEV ,  Dmitry V. UBORSKY

IPC: C07F17/00 ,  C08F4/76 ,  C08F10/02

Abstract: The invention relates to a metallocene complex according to formula (I), (I) wherein R1 and R2 are independently selected from H, an alkyl or an aryl group, wherein R3 is a C1-C10 alkyl group, wherein R′ is selected from H, an alkyl group, an aryl group and wherein different R′ substituents can be connected to form a ring structure and wherein B is a 1,2 phenylene bridging moiety, which can be optionally substituted, wherein Mt is selected from Ti, Zr and Hf, X is an anionic ligand, z is the number of X groups and equals the valence of Mt minus 2. The invention also relates to a catalyst comprising the reaction product of the metallocene complex and a cocatalyst. Further the invention relates to a (co)polymerisation process of olefinic monomers.

公开(公告)号：US20230040334A1

公开(公告)日：2023-02-09

申请号：US17859214

申请日：2022-07-07

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hyunwoo KIM ,  Kazuki HARANO ,  Kiyoshi MURATA ,  Haruyoshi SATO ,  Younsoo KIM ,  Seungmin RYU ,  Atsushi YAMASHITA ,  Gyuhee PARK ,  Younjoung CHO

IPC: C07F17/00 ,  C23C16/40

Abstract: An yttrium compound and a method of manufacturing an integrated circuit device, the compound being represented by General Formula (I):

公开(公告)号：US11555242B2

公开(公告)日：2023-01-17

申请号：US16460139

申请日：2019-07-02

Applicant: ASM International N.V.

Inventor： Timo Hatanpaa ,  Jaakko Niinisto ,  Mikko Ritala ,  Markku Leskela ,  Suvi Haukka

IPC: C23C16/40 ,  C23C16/455 ,  C07F7/00 ,  C07F17/00 ,  C01G23/07 ,  C01G25/02 ,  C01G27/02

Abstract: Methods are provided herein for forming transition metal oxide thin films, preferably Group IVB metal oxide thin films, by atomic layer deposition. The metal oxide thin films can be deposited at high temperatures using metalorganic reactants. Metalorganic reactants comprising two ligands, at least one of which is a cycloheptatriene or cycloheptatrienyl (CHT) ligand are used in some embodiments. The metal oxide thin films can be used, for example, as dielectric oxides in transistors, flash devices, capacitors, integrated circuits, and other semiconductor applications.

公开(公告)号：US11530280B2

公开(公告)日：2022-12-20

申请号：US16469616

申请日：2017-12-12

Applicant: BOREALIS AG

Inventor： Noureddine Ajellal ,  Anna Fait ,  Luigi Resconi ,  Vyatcheslav Izmer ,  Dmitry Kononovich ,  Alexander Voskoboynikov ,  Rafael Sablong ,  Timo Sciarone

IPC: C07F17/00 ,  C08F4/6592 ,  C08F210/16 ,  C08F2/06

Abstract: Catalyst system for producing ethylene copolymers in a high temperature solution process, the catalyst system comprising (i) a metallocene complex of formula (I), M is Hf or a mixture with Zr, provided that more than 50% by moles of the complex of Formula I has M=Hf, X is a sigma ligand, R are the same or different from each other and can be saturated linear or branched C1-C10 alkyl, C5-C10 aryl, C6-C20 alkylaryl or C6-C20 arylalkyl groups, which can optionally contain up to 2 heteroatoms or silicon atoms, R1 is a C6-C20-aryl, which can be unsubstituted or substituted by one or up to 5 linear or branched C1-C10 alkyl group(s), R2 is a saturated linear or cyclic C3-C20 alkyl group or a branched CR3R4R5 group, wherein R3 is hydrogen or an C1-C20 alkyl group and R4 and R5 are the same or are different and can be an C1-C20 alkyl group and (ii) a boron containing cocatalyst.

公开(公告)号：US11459653B2

公开(公告)日：2022-10-04

申请号：US17294377

申请日：2019-11-13

Applicant: DNF CO., LTD.

Inventor： Myong Woon Kim ,  Sang Ick Lee ,  Jang Woo Seo ,  Sang Yong Jeon ,  Haeng Don Lim

IPC: C23C16/18 ,  C23C16/455 ,  C23C16/56 ,  C07F17/00

Abstract: The present invention provides a method for manufacturing a molybdenum-containing thin film and a molybdenum-containing thin film manufactured thereby. By using a molybdenum (0)-based hydrocarbon compound and a predetermined reaction gas, the method for manufacturing a molybdenum-containing thin film according to the present invention enables easy manufacturing of a highly pure thin film in a simple process.

公开(公告)号：US20220275009A1

公开(公告)日：2022-09-01

申请号：US17609982

申请日：2019-05-10

Applicant: Wacker Chemie AG

Inventor： Elke Fritz-Langhals ,  Richard Weidner ,  Sven Werge

IPC: C07F7/08 ,  B01J31/14 ,  B01J31/22 ,  C07F17/00

Abstract: A mixture M includes at least one compound A, selected from (a1) a compound of the general formula (I) and/or (a2) a compound of the general formula (I′), at least one compound B, selected from (b1) a compound of the general formula (II) and/or (b2) a compound of the general formula (II′) and/or (b3) a compound of the general formula (II″), and at least one compound C, selected from cationic germanium(II) compounds of the general formula (III).

公开(公告)号：US20220251706A1

公开(公告)日：2022-08-11

申请号：US17629975

申请日：2020-07-28

Applicant: KOJUNDO CHEMICAL LABORATORY CO., LTD.

Inventor： Nobutaka TAKAHASHI ,  Fumikazu MIZUTANI ,  Shintaro HIGASHI

IPC: C23C16/455 ,  C07F17/00 ,  C23C16/18 ,  C23C16/40

Abstract: Provided are: bis(alkylcyclopentadienyl)tin or bis(alkyltetramethylcyclopentadienyl)tin having a high vapor pressure even at lower temperatures, typified by bis(ethylcyclopentadienyl)tin; a precursor for chemical vapor deposition containing any of the above-mentioned organotin compounds as a main component; and a method of producing a tin-containing thin film by an atomic layer deposition process using the precursor for chemical vapor deposition. A precursor for chemical vapor deposition containing bis(alkylcyclopentadienyl)tin or bis(alkyltetramethylcyclopentadienyl)tin represented by the following Formula (1) as a main component: (In Formula (1), R1 and R2 each independently represent hydrogen or an alkyl group having 6 or less carbon atoms, and R3 and R4 each independently represent an alkyl group having 6 or less carbon atoms.)