PHASE SHIFTER
    231.
    发明申请

    公开(公告)号:US20220397780A1

    公开(公告)日:2022-12-15

    申请号:US17829153

    申请日:2022-05-31

    Inventor: SEITA IWAHASHI

    Abstract: A phase shifter includes a substrate, waveguides and a wiring portion. The substrate includes optical waveguide regions and contact regions. Each contact region has contact portions. The waveguides are disposed at the substrate, and each of the waveguides accumulates carriers to modulate a phase of light for guiding propagation of the light. The wiring portion electrically connects each of the waveguides and each of the contact portions. Each of the contact portions connecting each of the waveguides to a corresponding one of electrodes to inject the carriers into each of the waveguides. Each of the waveguides has a lengthwise direction defined as a first direction, and a direction that is perpendicular to the first direction and is parallel to a surface of the substrate is defined as a second direction. The optical waveguide regions and the contact regions are disposed to be alternately aligned along the second direction.

    SEMICONDUCTOR MODULE
    232.
    发明申请

    公开(公告)号:US20220344286A1

    公开(公告)日:2022-10-27

    申请号:US17717426

    申请日:2022-04-11

    Abstract: A semiconductor module includes a substrate, a semiconductor package disposed to the substrate, a housing to which the substrate is fixed, and a Y capacitor. A front-surface wiring in the substrate includes a front-surface ground wiring electrically connected to the housing, and a front-surface main wiring connected to a rear-surface wiring that is connected to the semiconductor package. The Y capacitor is disposed on a front surface of the substrate at a position facing the semiconductor package and between the front-surface ground wiring and the front-surface main wiring. The semiconductor package and the Y capacitor are disposed in such a manner that a direction of electric current flowing in the semiconductor package and a direction of electric current flowing in the Y capacitor are opposite to each other.

    METHOD FOR MANUFACTURING SWITCHING DEVICE

    公开(公告)号:US20220336603A1

    公开(公告)日:2022-10-20

    申请号:US17716213

    申请日:2022-04-08

    Abstract: A method for manufacturing a switching device includes: forming a trench at a top surface of a semiconductor substrate; forming a gate insulation film for covering an inner surface of the trench; forming a gate electrode inside the trench to locate a top surface of the gate electrode below the top surface of the semiconductor substrate; forming an oxide film by oxidizing the top surface of the gate electrode; forming an interlayer insulation film by vapor phase growth at a top surface of the oxide film to locate a top surface of the interlayer insulation film below the top surface of the semiconductor substrate; and forming an upper electrode in contact with the semiconductor substrate at the top surface of the semiconductor substrate and a side surface of the trench located above the top surface of the interlayer insulation film.

    MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

    公开(公告)号:US20220189787A1

    公开(公告)日:2022-06-16

    申请号:US17535276

    申请日:2021-11-24

    Abstract: A manufacturing method of a semiconductor device includes: preparing a semiconductor substrate including a first semiconductor layer made of gallium oxide containing Sn and a second semiconductor layer disposed on the first semiconductor layer and made of n type gallium oxide having a Sn concentration lower than a Sn concentration of the first semiconductor layer; implanting ions of a group 2 element into the second semiconductor layer; and forming a diffusion region, in which the group 2 element diffuses, in a range from a surface of the second semiconductor layer to an interface between the second semiconductor layer and the first semiconductor layer.

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