Photoimageable coating composition and composite article thereof
    234.
    发明授权
    Photoimageable coating composition and composite article thereof 有权
    可光成像涂料组合物及其复合制品

    公开(公告)号:US07449280B2

    公开(公告)日:2008-11-11

    申请号:US10945334

    申请日:2004-09-20

    CPC classification number: G03F7/0385 G03F7/038 G03F7/161

    Abstract: A photoimagable composition suitable for use as a negative photoresist comprising: (A) at least one epoxidized polyfunctional bisphenol A formaldehyde novolak resin; (B) at least one polycaprolactone polyol reactive diluent, wherein the amount of component (A) is from about 95% to about 75% by weight of the sum of (A) and (B) and the amount of component (B) is from about 5% to about 25% by weight of the sum of (A) and (B); (C) at least one photoacid generator in an amount from about 2.5 to about 12.5 parts per hundred parts of resin and reactive diluent, which initiates polymerization upon exposure to actinic radiation; and (D) a sufficient amount of solvent to dissolve (A), (B) and (C); wherein the solvent comprises 2-pentanone, 3-pentanone, and 1,3-dioxolane and mixtures thereof.

    Abstract translation: 适合用作负性光致抗蚀剂的可光成像组合物,其包含:(A)至少一种环氧化多官能双酚A甲醛酚醛清漆树脂; (B)至少一种聚己内酯多元醇反应性稀释剂,其中组分(A)的量为(A)和(B)之和的总量的约95重量%至约75重量%,组分(B)的量为 (A)和(B)之和的约5%至约25%; (C)至少一种光致酸产生剂,其量为每百份树脂和反应性稀释剂约2.5至约12.5份,其在暴露于光化辐射时引发聚合; 和(D)足够量的溶剂以溶解(A),(B)和(C); 其中溶剂包括2-戊酮,3-戊酮和1,3-二氧戊环及其混合物。

    Active layer
    240.
    发明申请
    Active layer 有权
    活动层

    公开(公告)号:US20080080047A1

    公开(公告)日:2008-04-03

    申请号:US11540792

    申请日:2006-09-29

    CPC classification number: G03B21/56 G03B21/10 H04N9/31

    Abstract: A method and apparatus apply an electric field across active layer, wherein active layer is configured to change from a first light attenuating state to a second lesser light attenuating state in response to the applied the electric field and wherein the second lesser light attenuating state permits light to be reflected from a light reflective face.

    Abstract translation: 一种方法和装置在有源层上施加电场,其中有源层被配置为响应于施加的电场而从第一光衰减状态改变到第二较小的光衰减状态,并且其中第二较小的光衰减状态允许光 从光反射面反射出来。

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