公开(公告)号：US20080032301A1

公开(公告)日：2008-02-07

申请号：US11731748

申请日：2007-03-29

Applicant: David Rank ,  Jeffery Wegener ,  Jonas Korlach ,  Daniel Roitman ,  Yue Xu ,  John Lyle ,  Stephen Turner ,  Paul Peluso ,  Geoff Otto

Inventor： David Rank ,  Jeffery Wegener ,  Jonas Korlach ,  Daniel Roitman ,  Yue Xu ,  John Lyle ,  Stephen Turner ,  Paul Peluso ,  Geoff Otto

IPC: C12Q1/68 ,  H01S4/00

CPC classification number: C12Q1/6874 ,  B01J19/0046 ,  B01J2219/00427 ,  B01J2219/0045 ,  B01J2219/00605 ,  B01J2219/0061 ,  B01J2219/00612 ,  B01J2219/00617 ,  B01J2219/00626 ,  B01J2219/00635 ,  B01J2219/00637 ,  B01J2219/00639 ,  B01J2219/00659 ,  B01J2219/00711 ,  B01J2219/00722 ,  B82Y20/00 ,  B82Y30/00 ,  C12Q1/6837 ,  Y10T29/49002 ,  C12Q2565/629 ,  C12Q2527/127

Abstract: Methods of producing substrates having selected active chemical regions by employing elements of the substrates in assisting the localization of active chemical groups in desired regions of the substrate. The methods may include optical, chemical and/or mechanical processes for the deposition, removal, activation and/or deactivation of chemical groups in selected regions of the substrate to provide selective active regions of the substrate.