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    Frame for holding a beverage container on a bicycle
    24.
    发明授权
    Frame for holding a beverage container on a bicycle 失效
    将饮料容器固定在自行车上的框架

    公开(公告)号：US06616021B1

    公开(公告)日：2003-09-09

    申请号：US10160079

    申请日：2002-06-03

    Applicant: He-Jen Shih

    Inventor： He-Jen Shih

    IPC: B62J1100

    CPC classification number: B62J11/00 ,  Y10S224/926

    Abstract: A frame is mounted on a bicycle frame to hold a beverage container and is formed of a fastening seat and a container holder. The fastening seat is fastened to the bicycle frame. The container holder is movably fastened to the fastening seat. When the container holder is forced to move by an external force, the beverage container can be removed from a confining portion of the container holder.

    Abstract translation: 框架安装在自行车车架上以保持饮料容器，并且由紧固座和容器座构成。 紧固座固定在自行车架上。 容器保持器可移动地紧固到紧固座。 当容器保持器被外力迫使其移动时，饮料容器可以从容器保持器的限制部分移除。

    Method for preventing tungsten contact/via plug loss after a backside pressure fault
    25.
    发明授权
    Method for preventing tungsten contact/via plug loss after a backside pressure fault 有权
    背面压力故障后防止钨接触/堵头损失的方法

    公开(公告)号：US06245654B1

    公开(公告)日：2001-06-12

    申请号：US09283063

    申请日：1999-03-31

    Applicant: Po-Jen Shih ,  Po-Jen Chen

    Inventor： Po-Jen Shih ,  Po-Jen Chen

    IPC: H01L2144

    CPC classification number: H01L21/76862 ,  H01L21/76843 ,  H01L21/76877

    Abstract: A method for preventing tungsten contact/via plug loss after a backside pressure fault defect in a deposition chamber is provided. In the method, first deposited by a silane soak step and a tungsten nucleation layer is subsequently deposited, a plasma treating step by a H2 plasma is carried out at a temperature of not higher than 480° C. for a time period of at least 15 seconds. The plasma treating step significantly improves the uniform distribution of the silicon prenucleation layer and substantially prevents the formation of any tungsten silicide layers such that during an etchback process, the dry etchant utilized does not remove a tungsten silicide layer at a much faster rate and leads to a plug loss defect.

    Abstract translation: 提供了一种用于在沉积室中的背面压力故障缺陷之后防止钨接触/经由插塞损失的方法。 在该方法中，首先通过硅烷浸渍步骤和钨成核层沉积，通过H 2等离子体的等离子体处理步骤在不高于480℃的温度下进行至少15 秒。 等离子体处理步骤显着地改善了硅预核层的均匀分布，并且基本上防止了任何硅化钨层的形成，使得在回蚀工艺期间，所用的干蚀刻剂不会以更快的速率除去硅化钨层，并导致 插头损失缺陷。

    Method for preventing tungsten contact plug loss after a backside pressure fault
    26.
    发明授权
    Method for preventing tungsten contact plug loss after a backside pressure fault 有权
    背面压力故障后防止钨触头堵塞的方法

    公开(公告)号：US06174795B1

    公开(公告)日：2001-01-16

    申请号：US09282993

    申请日：1999-03-31

    Applicant: Po-Jen Shih ,  Po-Jen Chen

    Inventor： Po-Jen Shih ,  Po-Jen Chen

    IPC: H01L2144

    CPC classification number: H01L21/76864 ,  H01L21/28525 ,  H01L21/7684 ,  H01L21/76843 ,  H01L21/76877

    Abstract: A method for preventing tungsten contact plug loss problem after a backside pressure fault problem in a deposition chamber is provided. In the method, first deposited by a silane soak step and a tungsten nucleation layer is subsequently deposited, a heat treating step by a rapid thermal process is carried out at a temperature of at least 600° C. for a time period of at least 10 seconds. The heat treating step significantly improves the uniform distribution of the silicon prenucleation layer and substantially prevents the formation of any tungsten silicide layers such that during an etchback process, the dry etchant utilized does not remove a tungsten silicide layer at a much faster rate and thereby does not result in a plug loss problem.

    Abstract translation: 提供了一种用于在沉积室中的背面压力故障问题之后防止钨接触塞损耗问题的方法。 在该方法中，首先通过硅烷浸渍步骤和钨成核层沉积，通过快速热处理的热处理步骤在至少600℃的温度下进行至少10 秒。 热处理步骤显着地改善了硅预核层的均匀分布，并且基本上防止了任何硅化钨层的形成，使得在回蚀工艺期间，所用的干蚀刻剂不会以更快的速度除去硅化钨层，从而 不会导致插头丢失问题。

    Replaceable key module and keyboard with the same
    28.
    发明授权
    Replaceable key module and keyboard with the same 有权
    可更换的键盘模块和键盘相同

    公开(公告)号：US08927884B2

    公开(公告)日：2015-01-06

    申请号：US13482852

    申请日：2012-05-29

    Applicant: Po-Jen Shih ,  Shu I Chen

    Inventor： Po-Jen Shih ,  Shu I Chen

    IPC: H01H9/26 ,  H01H13/72 ,  H01H13/76 ,  G06F3/02 ,  H01H13/86

    CPC classification number: G06F3/0202 ,  H01H13/86 ,  H01H2215/006 ,  H01H2223/03 ,  H01H2223/056 ,  H01H2233/014 ,  H01H2233/034

    Abstract: A replaceable key module for a keyboard, comprising: a keycap holder, a springy member and a keycap. The keycap holder embraces an accommodation space, a first surface having an opening, and a second surface having a hole. The springy member is located on the second surface and within the accommodation space of the keycap holder. The keycap is movably connected to the springy member through the opening of the first surface of the keycap holder and capable of moving between a released position and a depressed position. The keycap is referred to as in a released position when not depressed and in a depressed position pushing the springy member to be deformed downwardly when depressed. By means of adjusting some factors such as hardness, length, material and pressing angle of the springy member, the user may obtain the key module with the specified pressure load as desired.

    Abstract translation: 一种用于键盘的可替换的键模块，包括：键帽保持器，弹性构件和键帽。 键帽保持器包括容纳空间，具有开口的第一表面和具有孔的第二表面。 弹性构件位于第二表面上并且在键帽保持器的容纳空间内。 键帽通过键帽保持器的第一表面的开口可移动地连接到弹性构件，并且能够在释放位置和按压位置之间移动。 键帽在未被按压时被称为处于释放位置，并且处于按压位置时推动弹性构件在压下时向下变形。 通过调整弹性构件的硬度，长度，材料和按压角等因素，用户可根据需要获得具有规定压力载荷的关键模块。

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