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公开(公告)号：US20240149461A1
公开(公告)日：2024-05-09
申请号：US18386829
申请日：2023-11-03
Applicant: MITUTOYO CORPORATION
Inventor： Akira TAKADA , Mitsuru FUKUDA , Hirotada ANZAI , Eran YERUHAM , Yuval YERUHAM , David BUNIMOVICH
CPC classification number: B25J9/1697 , B25J9/1653 , B25J9/1687 , G01B11/005
Abstract: A foolproof device provided to a manufacturing process includes an imaging part that captures an object on which a plurality of identifiable marks are provided, an image processing part that obtains state data including a coordinate position of each mark from at least one captured image captured by the imaging part, a storage that stores reference data obtained by the image processing part, the reference data including a reference position of each mark, and a comparison processing part that compares the reference data stored in the storage with the current state data obtained by the image processing part, and outputs a result of the comparison regarding at least some of the plurality of marks.
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公开(公告)号：US20240142762A1
公开(公告)日：2024-05-02
申请号：US18495397
申请日：2023-10-26
Applicant: MITUTOYO CORPORATION
Inventor： Keiji Murata
CPC classification number: G02B21/361 , G02B21/02 , G02B21/06
Abstract: An optical device comprises: an image forming lens disposed in an optical path between an objective lens and an imaging device, the image forming lens forming an image of light incident via the objective lens on an imaging surface of the imaging device; a beam splitter disposed in an optical path between the objective lens and the image forming lens; a first lens group disposed in an optical path between the objective lens and the beam splitter and having a positive refractive power; and a coaxial epi-illumination optical system configured to be able to illuminate an imaging target via the beam splitter, the first lens group, and the objective lens, the coaxial epi-illumination optical system being arranged in an optical path different from the optical path in which the image forming lens is arranged.
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公开(公告)号：US11965733B2
公开(公告)日：2024-04-23
申请号：US17721858
申请日：2022-04-15
Applicant: Mitutoyo Corporation
Inventor： Takamitsu Watanabe , Kentaro Nemoto , Yoshihiko Sugita
IPC: G01B11/24
CPC classification number: G01B11/24
Abstract: An optical sensor includes a radiation part that irradiates an object to be measured with laser light, an imaging part that receives laser light reflected by the object to be measured and captures an image of the object to be measured, a first driving part that moves the radiation part in a radiation direction of laser light to the object to be measured, and a second driving part that moves the imaging part in a reflection direction of laser light from the object to be measured and an orthogonal direction to the reflection direction.
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公开(公告)号：US20240102784A1
公开(公告)日：2024-03-28
申请号：US17955051
申请日：2022-09-28
Applicant: Mitutoyo Corporation
Inventor： Michael NAHUM
CPC classification number: G01B3/18 , G06T7/13 , G06T7/70 , H04N5/232933 , G06T2207/30204
Abstract: A micrometer head displacement system includes a micrometer head and an imaging portion. The micrometer head includes a coarse scale and a fine scale. The system is configured to: acquire at least one image of the micrometer head from the imaging portion; determine a coarse measurement based at least in part on the at least one image wherein the coarse measurement corresponds to a coarse relative position between the coarse scale and a coarse fiducial line; determine a fine measurement based at least in part on the at least one image and based on calculating an interpolated position of the a fiducial line wherein the fine measurement corresponds to a fine relative position between the fine scale and the fine fiducial line; and determine a micrometer head displacement based at least in part on summing the coarse measurement with the fine measurement.
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公开(公告)号：US20240077292A1
公开(公告)日：2024-03-07
申请号：US18450544
申请日：2023-08-16
Applicant: MITUTOYO CORPORATION
Inventor： Ryunosuke YANO
IPC: G01B3/00
CPC classification number: G01B3/004
Abstract: A one dimensional measuring machine includes a scale having graduations, a mover that has a light source configured to emit light to the graduations of the scale and a light receiving element configured to receive the light having passed through the scale from the light source, and can move along the scale, a light amount information detector that detects information regarding a light amount of the light emitted to the scale from the light source while the mover moves along the scale, and a contamination detector that detects a degree of contamination of the scale, based the information regarding the light amount of the light detected by the light amount information detector.
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Patent Agency Ranking
公开(公告)号：US11867809B2
公开(公告)日：2024-01-09
申请号：US16921839
申请日：2020-07-06
Applicant: Mitutoyo Corporation
Inventor： Yoshimasa Suzuki , Shinichi Hara , Shinji Komatsuzaki , Ryusuke Kato , Hiroki Ujihara , Masayuki Nara , Tomotaka Takahashi
CPC classification number: G01S17/08 , G01S7/4808 , G01S7/4814
Abstract: A measurement apparatus includes a laser apparatus, a branching part that branches a frequency-modulated laser beam output by the laser apparatus into a reference light and a measurement light; a beat signal generation part that generates a beat signal by mixing a reflected light and the reference light, a conversion part that converts the beat signal into a digital signal at a first sampling rate and frequency-analyses it, an extraction part that extracts a signal component corresponding to a cavity frequency from the frequency-modulated laser beam, a digital filter that digitally filters the extracted signal component at a second sampling rate; and a calculation part that calculates a difference in a propagation distance between the reference light and the measurement light.
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公开(公告)号：USD1008057S1
公开(公告)日：2023-12-19
申请号：US29818730
申请日：2021-12-10
Applicant: MITUTOYO CORPORATION
Designer： Kenji Iwamoto , Yuichi Kikuchi , Masanori Seki
Abstract: FIG. 1 is a front, right-side, top perspective view of a height gauge, showing the new design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a rear elevational view thereof;
FIG. 4 is a left-side elevational view thereof;
FIG. 5 is a right-side elevational view thereof;
FIG. 6 is a top plan view thereof;
FIG. 7 is a bottom plan view thereof; and,
FIG. 8 is an enlarged view of the area bound by arrows 8 in FIG. 2.
The broken lines depict parts of the height gauge that form no part of the claimed design.-
公开(公告)号：US20230384495A1
公开(公告)日：2023-11-30
申请号：US18233012
申请日：2023-08-11
Applicant: MITUTOYO CORPORATION
Inventor： Toshihiko AOKI , Kosaku MIYAKE
IPC: G02B5/18
CPC classification number: G02B5/1814 , G02B5/1852 , G02B2005/1804
Abstract: A grating part includes a first transparent substrate having an optical grating on a surface thereof, a second transparent substrate having an optical grating on a surface thereof, and a spacer positioned between the first transparent substrate and the second transparent substrate, the spacer bonding the first transparent substrate and the second transparent substrate.
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公开(公告)号：US11821724B2
公开(公告)日：2023-11-21
申请号：US17251097
申请日：2019-06-07
Applicant: MITUTOYO CORPORATION
Inventor： Koji Matsumoto , Yuji Fujikawa , Shinichiro Yanaka , Osamu Saito
Abstract: A digital micrometer includes a main-body frame, a spindle, a thimble part, and a displacement detector that detects displacement of the spindle. The main-body frame includes a U-shaped frame part, and a spindle holding part provided on the other end side of the U-shaped frame part and having a length in a direction away from an anvil. The spindle is held by a spindle holding part, provided to be movable forward and backward in an axial direction with respect to the anvil, and includes a contactor on one end face. The main-body frame and the spindle are formed of a non-magnetic material.
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公开(公告)号：US11808611B2
公开(公告)日：2023-11-07
申请号：US17174763
申请日：2021-02-12
Applicant: MITUTOYO CORPORATION
Inventor： Kosaku Miyake , Toshihiko Aoki
IPC: G01D5/347
CPC classification number: G01D5/34707
Abstract: A scale includes a base material, scale patterns arranged at a predetermined periodicity on a main surface of the base material, and a fluorine film that covers the scale patterns and is at least partly a monomolecular fluorine compound.
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