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    ON-PRESS DEVELOPMENT OF IMAGED ELEMENTS
    21.
    发明申请
    ON-PRESS DEVELOPMENT OF IMAGED ELEMENTS 失效
    成像元素的新闻发展

    公开(公告)号：US20100310840A1

    公开(公告)日：2010-12-09

    申请号：US12477226

    申请日：2009-06-03

    Applicant: Domenico Balbinot ,  Mathias Jarek

    Inventor： Domenico Balbinot ,  Mathias Jarek

    IPC: B32B3/10 ,  G03F7/20

    CPC classification number: B41C1/1025 ,  B41C2201/04 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/24 ,  B41C2210/26 ,  B41C2210/264 ,  B41C2210/266 ,  Y10T428/24917

    Abstract: Images can be provided using a method comprising thermally imaging a negative-working imageable element to provide an imaged element with exposed regions and non-exposed regions, the exposed regions consisting essentially of coalesced core-shell particles, and developing the imaged element on-press to remove only the non-exposed regions using a lithographic printing ink, fountain solution, or both. The imageable element comprises a single thermally-sensitive imageable layer consisting essentially of an infrared radiation absorbing compound and core-shell particles that coalesce upon thermal imaging. The core of the core-shell particles is composed of a hydrophobic thermoplastic polymer, the shell of the core-shell particles is composed of a hydrophilic polymer that is covalently bonded to the core hydrophobic thermoplastic polymer, and the thermally-sensitive imageable layer comprises less than 10 weight % of free polymer.

    Abstract translation: 可以使用包括热成像负性可成像元件以提供具有暴露区域和非曝光区域的成像元件的方法来提供图像，所述暴露区域基本上由聚结的核 - 壳颗粒组成，并且将成像元件在印刷机上显影 以使用平版印刷油墨，润版液或两者仅去除非曝光区域。 可成像元件包括基本上由红外辐射吸收化合物和在热成像时聚结的核 - 壳颗粒组成的单一热敏可成像层。 核 - 壳颗粒的核心由疏水性热塑性聚合物组成，核 - 壳颗粒的壳由共价结合到芯疏水性热塑性聚合物上的亲水性聚合物组成，热敏可成像层包含较少 超过10重量％的游离聚合物。

    NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS
    25.
    发明申请
    NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS 有权
    负离子平版印刷机前驱板

    公开(公告)号：US20130078575A1

    公开(公告)日：2013-03-28

    申请号：US13239435

    申请日：2011-09-22

    Applicant: Domenico Balbinot ,  Harald Baumann ,  Udo Dwars ,  Mathias Jarek ,  Christopher D. Simpson

    Inventor： Domenico Balbinot ,  Harald Baumann ,  Udo Dwars ,  Mathias Jarek ,  Christopher D. Simpson

    IPC: G03F7/20 ,  G03F7/004 ,  G03F7/032

    CPC classification number: G03F7/029 ,  B41C1/1008 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/266 ,  G03F7/031

    Abstract: A lithographic printing plate precursor comprises an imageable layer comprising a free radically polymerizable component, an initiator composition capable of generating free radicals upon exposure to imaging infrared radiation, an infrared radiation absorbing dye comprising an infrared radiation absorbing cation and a counter anion, and a polymeric binder. The salt formed between the infrared radiation absorbing cation and a tetraphenyl borate has solubility in 2-methoxy propanol at 20° C. that is greater than or equal to 3.5 g/l. The use of these infrared radiation absorbing dyes in the imageable layers provides a reduced tendency of these dyes to crystallize in the presence of tetraaryl borate counter anions.

    Abstract translation: 平版印刷版前体包括可成像层，其包含可自由基聚合的组分，在暴露于成像红外辐射时能够产生自由基的引发剂组合物，包含红外辐射吸收阳离子和抗衡阴离子的红外辐射吸收染料，以及聚合物 粘合剂 在红外辐射吸收阳离子和四苯基硼酸盐之间形成的盐在20℃下在2-甲氧基丙醇中具有大于或等于3.5g / l的溶解度。 在可成像层中使用这些红外辐射吸收染料提供这些染料在硼酸四芳基酯阴离子存在下结晶的趋势。

    METHOD OF PROCESSING ELEMENTS WITH COALESCED PARTICLES
    27.
    发明申请
    METHOD OF PROCESSING ELEMENTS WITH COALESCED PARTICLES 失效
    处理含有颗粒物的元素的方法

    公开(公告)号：US20110053089A1

    公开(公告)日：2011-03-03

    申请号：US12552362

    申请日：2009-09-02

    Applicant: Mathias Jarek ,  Domenico Balbinot

    Inventor： Mathias Jarek ,  Domenico Balbinot

    IPC: G03F7/20

    CPC classification number: B41C1/1025 ,  B41C2201/04 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24 ,  B41N3/08

    Abstract: Imageable elements can be imaged and then processed using a solution containing core-shell particles that are designed to complex with non-coalesced particles in the non-exposed regions of imaged element. A separate development step is not needed, but the non-coalesced particles and complexed core-shell particles can be removed from the resulting printing plate before using the resulting lithographic printing plate for printing.

    Abstract translation: 可成像元件可以成像，然后使用含有核 - 壳颗粒的溶液进行成像，该溶液设计成与成像元件的非曝光区域中的非聚结颗粒复合。 不需要单独的显影步骤，但是在使用所得的平版印刷版进行印刷之前，可以从得到的印刷版中除去非聚结颗粒和络合的核 - 壳颗粒。

    Solvent resistant polymers with improved bakeablity features
    28.
    再颁专利
    Solvent resistant polymers with improved bakeablity features 失效
    耐溶剂聚合物具有改进的可烘烤特性

    公开(公告)号：USRE41083E1

    公开(公告)日：2010-01-19

    申请号：US11190154

    申请日：2005-07-26

    Applicant: Mathias Jarek

    Inventor： Mathias Jarek

    IPC: G03F7/023

    CPC classification number: G03F7/0233 ,  C08F222/40

    Abstract: A radiation-sensitive composition for use in printing plates is described. The composition comprises: (a) at least one novolak; (b) at least one naphthoquinone diazide derivative; and (c) a copolymer comprising units A, B, and a unit C comprising a cyclic terminal urea group, wherein unit A is present in an amount of about 5 to about 50 mol % and has the formula is represented by wherein R1 is selected such that the homopolymer of A is alkali-soluble, unit B is present in an amount of about 20 to about 70 mol % and has the following formula is represented by wherein R2 is selected such that the homopolymer of B has a glass transition temperature greater than 100° C., preferably a glass transition temperature in the range from about 100 to about 380° C., and the unit C comprising a cyclic terminal urea group is present in an amount of about 10 to about 50 mol % and has the formula is represented by wherein X is a spacer group which is preferably selected from the group consisting of (a) a —(CR2)m— chain, (b) a —[CH2—CH2—O]m— chain; and (c) a —[Si(R2)—O]m— unit, wherein m is an integer greater than or equal to 1, more preferably between 2 and 12, the spacer group is connected to one of the carbon ring atoms of the cyclic urea unit or to one of the nitrogen atoms of the cyclic urea unit, and n is an integer greater than or equal to 1, more preferably between 1 and 5; and Y is a group selected from the group consisting of:  wherein each R in units A, B, and C, the —(CR2)m— chain, the —[Si(R2)—O]m— unit, and group Y represents a bond between the cyclic urea and the spacer group X, or is independently selected from hydrogen, aryl, (C1-C12) alkyl, and or halogen.

    Abstract translation: 描述了用于印版的辐射敏感组合物。 组合物包含：（a）至少一种酚醛清漆; （b）至少一种萘醌二叠氮衍生物; 和（c）包含单元A，B和包含环状末端脲基团的单元C的共聚物，其中单元A以约5至约50摩尔％的量存在并具有下式由其中R1选择 使得A的均聚物是碱溶性的，单元B的存在量为约20至约70mol％，并且由下式表示，其中R2选择为使得B的均聚物具有较高的玻璃化转变温度 优选玻璃化转变温度在约100至约380℃的范围内，并且包含环状末端脲基团的单元C的存在量为约10至约50摩尔％，并且具有 式中X为间隔基，优选选自（a）a - （CR 2）m-链，（b）a - [CH 2 -CH 2 -O] m-链; 和（c）a- [Si（R 2）-O] m - 单元，其中m是大于或等于1的整数，更优选在2和12之间，间隔基连接到碳原子之一 环脲单元或环脲单元的氮原子之一，n为大于或等于1，更优选为1至5的整数; 并且Y是选自下组的基团：其中单元A，B和C中的每个R， - （CR 2）m-链， - [Si（R 2）-O] m - 单元和Y基团 表示环状脲和间隔基X之间的键，或独立地选自氢，芳基，（C1-C12）烷基和/或卤素。

    Solvent resistant polymers with improved bakeability features
    30.
    发明授权
    Solvent resistant polymers with improved bakeability features 有权
    具有改善烘烤性能的耐溶剂聚合物

    公开(公告)号：US06645689B2

    公开(公告)日：2003-11-11

    申请号：US10096651

    申请日：2002-03-13

    Applicant: Mathias Jarek

    Inventor： Mathias Jarek

    IPC: G03F7023

    CPC classification number: G03F7/0233 ,  C08F222/40

    Abstract: A radiation-sensitive composition for use in printing plates is described. The composition comprises: (a) at least one novolak; (b) at least one naphthoquinone diazide derivative; and (c) a copolymer comprising units A, B, and a unit C comprising a cyclic terminal urea group, wherein unit A is present in an amount of about 5 to about 50 mol % and has the formula wherein R1 is selected such that the homopolymer of A is alkali-soluble, unit B is present in an amount of about 20 to about 70 mol % and has the following formula wherein R2 is selected such that the homopolymer of B has a glass transition temperature greater than 100° C., preferably a glass transition temperature in the range from about 100 to about 380° C., and the unit C comprising a cyclic terminal urea group is present in an amount of about 10 to about 50 mol % and has the formula wherein X is a spacer group which is preferably selected from the group consisting of (a) a —(CR2)m— chain, (b) a —[CH2—CH2—O]m— chain; and (c) a —[Si(R2)—O]m— unit, wherein m is an integer greater than or equal to 1, more preferably between 2 and 12, the spacer group is connected to one of the carbon ring atoms of the cyclic urea unit or to one of the nitrogen atoms of the cyclic urea unit, and n is an integer greater than or equal to 1, more preferably between 1 and 5; and Y is a group selected from the group consisting of:  and  wherein each R in units A, B, and C, the —(CR2)m— chain, the —[Si(R2)—O]m— unit, and group Y is independently selected from hydrogen, aryl, (C1-C12) alkyl, and halogen.

    Abstract translation: 描述了用于印版的辐射敏感组合物。 组合物包含：（a）至少一种酚醛清漆; （b）至少一种萘醌二叠氮衍生物; 和（c）包含单元A，B和包含环状末端脲基团的单元C的共聚物，其中单元A以约5至约50摩尔％的量存在并且具有式 A的均聚物是碱溶性的，单元B的存在量为约20至约70mol％，并且具有以下化学式R 2，使得B的均聚物具有大于100的玻璃化转变温度 优选玻璃化转变温度在约100至约380℃的范围内，并且包含环状末端脲基团的单元C的存在量为约10至约50摩尔％，并且具有式 是优选选自（a）a - （CR 2）m-链，（b）a - [CH 2 -CH 2 -O] m - 链的间隔基; 和（c）a- [Si（R 2）-O] m - 单元，其中m是大于或等于1的整数，更优选在2和12之间，间隔基连接到碳原子之一 环脲单元或环脲单元的氮原子之一，n为大于或等于1，更优选为1至5的整数; 且Y为选自以下的基团：其中，单元A，B和C各自的R， - （CR 2）m - 链， - [Si（R 2）-O] m - 单元和Y基团是 独立地选自氢，芳基，（C1-C12）烷基和卤素。

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