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    DETERMINISTIC APERIODIC PATTERNED DIELECTRIC AND PLASMONIC MATERIALS FOR LOCALIZED ELECTROMAGNETIC FIELD ENHANCEMENT
    23.
    发明申请
    DETERMINISTIC APERIODIC PATTERNED DIELECTRIC AND PLASMONIC MATERIALS FOR LOCALIZED ELECTROMAGNETIC FIELD ENHANCEMENT 有权
    用于局部电磁场增强的确定性APERIODIC PATTERNED介电和等离子体材料

    公开(公告)号：US20090195879A1

    公开(公告)日：2009-08-06

    申请号：US12423508

    申请日：2009-04-14

    申请人： Luca Dal Negro ,  Ashwin Gopinath ,  Ning-Ning Feng ,  Mark Luitzen Brongersma

    发明人： Luca Dal Negro ,  Ashwin Gopinath ,  Ning-Ning Feng ,  Mark Luitzen Brongersma

    IPC分类号： G02B1/10

    CPC分类号： G02B5/008 ,  B82Y20/00 ,  G01N21/658 ,  G02B6/1225

    摘要： A method is shown for the extension in higher spatial dimensions of deterministic, aperiodic structures which exhibit strong aperiodic effects and have overall compatibility with the planar technology of integrated optical circuits. Disclosed devices are operative in response to incident electromagnetic energy to create a distribution of electromagnetic energy having localized electromagnetic field enhancement, wherein the device includes a dielectric or plasmonic material having a region of interaction with the incident electromagnetic energy. The region of interaction has a deterministic, aperiodic patterning with an array of individual patterning elements of distinct refractive indices such that a variation of refractive index of the device occurs over distances comparable with a wavelength of the incident electromagnetic energy, the array being a multi-dimensional extension of a corresponding one-dimensional sequence such that a spectral response of the array is a multi-dimensional equivalent of a spectral response of the one-dimensional sequence. Specific examples employing so-called Rudin-Shapiro, Thue-Morse and Fibonacci sequences are shown.

    摘要翻译： 显示了一种在具有强非周期效应的确定性，非周期性结构的较高空间维度中延伸的方法，并且与集成光电路的平面技术具有整体兼容性。 公开的装置响应于入射的电磁能而起作用以产生具有局部电磁场增强的电磁能的分布，其中该装置包括具有与入射的电磁能相互作用的区域的电介质或等离子体元素材料。 相互作用区域具有确定性的非周期性图案化，其具有不同折射率的单个图案化元件的阵列，使得器件的折射率变化发生在与入射电磁能量的波长相当的距离上， 相应的一维序列的三维扩展，使得阵列的光谱响应是一维序列的光谱响应的多维等价物。 显示了使用所谓的Rudin-Shapiro，Thue-Morse和斐波那契序列的具体实例。

    Optical field concentrator using multiple low-index nano-layer configuration for CMOS compatible laser devices
    24.
    发明授权
    Optical field concentrator using multiple low-index nano-layer configuration for CMOS compatible laser devices 有权
    使用CMOS兼容激光器件的多个低折射率纳米层配置的光场集中器

    公开(公告)号：US07352942B2

    公开(公告)日：2008-04-01

    申请号：US11410228

    申请日：2006-04-24

    申请人： Ning-Ning Feng ,  Jurgen Michel ,  Lionel C. Kimerling

    发明人： Ning-Ning Feng ,  Jurgen Michel ,  Lionel C. Kimerling

    IPC分类号： G02B6/10 ,  H01L21/00

    CPC分类号： G02B6/107 ,  B82Y20/00 ,  G02B6/0229 ,  G02B6/03611 ,  G02B6/03644 ,  G02B6/03688 ,  G02B6/1223

    摘要： An optical field concentrator includes a plurality of waveguide layers comprising high index materials having a first defined thickness. At least one nano-layer structure is positioned between said waveguide layers. The at least one nano-layer structure comprises low index materials having a second defined thickness that is smaller than the first defined thickness. A plurality of cladding layers are positioned between the waveguide layers and the at least one nano-layer structure. The cladding layers have a third defined thickness that is larger than the first defined thickness.

    摘要翻译： 光场集中器包括多个波导层，其包括具有第一限定厚度的高折射率材料。 至少一个纳米层结构位于所述波导层之间。 所述至少一个纳米层结构包括具有小于所述第一限定厚度的第二限定厚度的低折射率材料。 多个包层位于波导层和至少一个纳米层结构之间。 包覆层具有大于第一限定厚度的第三限定厚度。

    Deterministic aperiodic patterned dielectric and plasmonic materials for localized electromagnetic field enhancement
    25.
    发明授权
    Deterministic aperiodic patterned dielectric and plasmonic materials for localized electromagnetic field enhancement 有权
    用于局部电磁场增强的确定性非周期图案化电介质和等离子体激元材料

    公开(公告)号：US07903246B2

    公开(公告)日：2011-03-08

    申请号：US12423508

    申请日：2009-04-14

    申请人： Luca Dal Negro ,  Ashwin Gopinath ,  Ning-Ning Feng ,  Mark Luitzen Brongersma

    发明人： Luca Dal Negro ,  Ashwin Gopinath ,  Ning-Ning Feng ,  Mark Luitzen Brongersma

    IPC分类号： G01J3/44 ,  G01N21/65

    CPC分类号： G02B5/008 ,  B82Y20/00 ,  G01N21/658 ,  G02B6/1225

    摘要： A method is shown for the extension in higher spatial dimensions of deterministic, aperiodic structures which exhibit strong aperiodic effects and have overall compatibility with the planar technology of integrated optical circuits. Disclosed devices are operative in response to incident electromagnetic energy to create a distribution of electromagnetic energy having localized electromagnetic field enhancement, wherein the device includes a dielectric or plasmonic material having a region of interaction with the incident electromagnetic energy. The region of interaction has a deterministic, aperiodic patterning with an array of individual patterning elements of distinct refractive indices such that a variation of refractive index of the device occurs over distances comparable with a wavelength of the incident electromagnetic energy, the array being a multi-dimensional extension of a corresponding one-dimensional sequence such that a spectral response of the array is a multi-dimensional equivalent of a spectral response of the one-dimensional sequence. Specific examples employing so-called Rudin-Shapiro, Thue-Morse and Fibonacci sequences are shown.

    摘要翻译： 显示了一种在具有强非周期效应的确定性，非周期性结构的较高空间维度中延伸的方法，并且与集成光电路的平面技术具有整体兼容性。 公开的装置响应于入射的电磁能而起作用以产生具有局部电磁场增强的电磁能的分布，其中该装置包括具有与入射的电磁能相互作用的区域的电介质或等离子体元素材料。 相互作用区域具有确定性的非周期性图案化，其具有不同折射率的单个图案化元件的阵列，使得器件的折射率变化发生在与入射电磁能量的波长相当的距离上， 相应的一维序列的三维扩展，使得阵列的光谱响应是一维序列的光谱响应的多维等价物。 显示了使用所谓的Rudin-Shapiro，Thue-Morse和斐波那契序列的具体实例。