公开(公告)号：US20090161201A1

公开(公告)日：2009-06-25

申请号：US12004905

申请日：2007-12-20

Applicant: Alexander I. Ershov ,  Jerzy R. Hoffman ,  Norbert R. Bowering ,  Alexander N. Bykanov

Inventor： Alexander I. Ershov ,  Jerzy R. Hoffman ,  Norbert R. Bowering ,  Alexander N. Bykanov

IPC: H01S4/00 ,  G02B5/22

CPC classification number: H01S3/105 ,  G03F7/70033 ,  H01S3/005 ,  H01S3/115 ,  H01S3/2232 ,  H01S3/225 ,  H01S3/2325 ,  H01S2301/02 ,  H05G2/003 ,  H05G2/008

Abstract: A device is described herein which may comprise an oscillator having an oscillator cavity length, Lo, and defining an oscillator path; and a multi-pass optical amplifier coupled with the oscillator to establish a combined optical cavity including the oscillator path, the combined cavity having a length, Lcombined, where Lcombined=(N+x)*Lo, where “N” is an integer and “x” is a number between 0.4 and 0.6.

Abstract translation: 本文描述了一种器件，其可以包括具有振荡器腔长度Lo并且限定振荡器路径的振荡器; 和与所述振荡器耦合的多通道光放大器以建立包括所述振荡器路径的组合光腔，所述组合腔具有长度L组合，其中L组合=（N + x）* Lo，其中“N”是整数， “x”是介于0.4和0.6之间的数字。

公开(公告)号：US07465946B2

公开(公告)日：2008-12-16

申请号：US11406216

申请日：2006-04-17

Applicant: Norbert R. Bowering ,  Oleh V. Khodykin ,  Alexander N. Bykanov ,  Igor V. Fomenkov

Inventor： Norbert R. Bowering ,  Oleh V. Khodykin ,  Alexander N. Bykanov ,  Igor V. Fomenkov

IPC: A61N5/06 ,  G01J3/10 ,  H05G2/00

CPC classification number: H05G2/006 ,  B82Y10/00 ,  G21K2201/061 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: An EUV light source is disclosed which may comprise at least one optical element having a surface, such as a multi-layer collector mirror; a laser source generating a laser beam; and a source material irradiated by the laser beam to form a plasma and emit EUV light. In one aspect, the source material may consist essentially of a tin compound and may generate tin debris by plasma formation which deposits on the optical element and, in addition, the tin compound may include an element that is effective in etching deposited tin from the optical element surface. Tin compounds may include SnBr4, SnBr2 and SnH4. In another aspect, an EUV light source may comprise a molten source material irradiated by a laser beam to form a plasma and emit EUV light, the source material comprising tin and at least one other metal, for example tin with Gallium and/or Indium.

Abstract translation: 公开了一种EUV光源，其可以包括具有表面的至少一个光学元件，例如多层收集镜; 产生激光束的激光源; 以及由激光束照射以形成等离子体并发射EUV光的源材料。 在一个方面，源材料可以基本上由锡化合物组成，并且可以通过沉积在光学元件上的等离子体形成而产生锡屑，此外，锡化合物可以包括有效地从光学蚀刻沉积的锡的元素 元素表面。 锡化合物可以包括SnBr4，SnBr2和SnH4。 另一方面，EUV光源可以包括由激光束照射以形成等离子体并发射EUV光的熔融源材料，源材料包含锡和至少一种其它金属，例如锡与镓和/或铟。

公开(公告)号：US07109503B1

公开(公告)日：2006-09-19

申请号：US11067099

申请日：2005-02-25

Applicant: Norbert R. Bowering ,  Bjorn A. M. Hansson ,  Alexander N. Bykanov ,  Oleh Khodykin ,  Alexander I. Ershov ,  William N. Partlo

Inventor： Norbert R. Bowering ,  Bjorn A. M. Hansson ,  Alexander N. Bykanov ,  Oleh Khodykin ,  Alexander I. Ershov ,  William N. Partlo

IPC: G01J1/00

CPC classification number: G03F7/70925 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  G21K2201/06 ,  H05G2/001

Abstract: Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.

Abstract translation: 公开了用于保护EUV光源等离子体生产室光学元件表面免受等离子体形成产生的碎片的系统和方法。 在本发明的实施例的一个方面，公开了一种屏蔽件，其包括位于光学元件和等离子体形成部位之间的至少一个中空管。 管被定向以捕获碎片，同时允许光以相对较小的掠入射角度的反射通过管的内腔。 在本发明的一个实施例的另一方面，公开了一种屏蔽件，其被加热到足以去除沉积在屏蔽上的一种或多种碎屑材料的温度。 在本发明的一个实施例的另一方面，公开了一种系统，其将屏蔽件从光源等离子体室移动到清洁室，其中屏蔽件被清洁。