公开(公告)号：US20070259287A1

公开(公告)日：2007-11-08

申请号：US11597332

申请日：2005-05-24

申请人： Hirokazu Sakakibara ,  Takayoshi Abe ,  Takashi Chiba ,  Toru Kimura

发明人： Hirokazu Sakakibara ,  Takayoshi Abe ,  Takashi Chiba ,  Toru Kimura

IPC分类号： G03C1/00

CPC分类号： G03F7/40 ,  H01L21/0274

摘要： A resin composition which, in forming a fine pattern by a heat treatment of a resist pattern formed by using a photoresist, can be applied onto the resist pattern, can cause the resist pattern to smoothly shrink by heat treatment, and can be easily washed away by a treatment with an alkaline aqueous solution, and a method for efficiently forming a fine resist pattern using the resin composition are provided. The resin composition comprises a resin containing a hydroxyl group, a crosslinking component, and an alcohol solvent containing water in an amount of 10 wt % or less for the total solvent, wherein the alcohol in the alcohol solvent is a monovalent alcohol having 1 to 8 carbon atoms.

摘要翻译： 通过对通过使用光致抗蚀剂形成的抗蚀剂图案的热处理形成微细图案的树脂组合物可以施加到抗蚀剂图案上，可以使抗蚀剂图案通过热处理而平滑地收缩，并且可以容易地被冲走 通过用碱性水溶液处理，以及使用该树脂组合物有效形成精细抗蚀剂图案的方法。 树脂组合物包含含有羟基的树脂，交联组分和含有总量为10重量％以下的水的醇溶剂，其中醇溶剂中的醇为1〜8价的一元醇 碳原子。

公开(公告)号：US20130085199A1

公开(公告)日：2013-04-04

申请号：US13638751

申请日：2011-03-29

申请人： Kouji Tamori ,  Takayoshi Abe ,  Yusuke Okano ,  Masaki Momiyama ,  Hiroshi Kawai ,  Satoshi Hyugaji ,  Tomonori Shiotani ,  Kazuhiro Ikkyu ,  Yong Wang

发明人： Kouji Tamori ,  Takayoshi Abe ,  Yusuke Okano ,  Masaki Momiyama ,  Hiroshi Kawai ,  Satoshi Hyugaji ,  Tomonori Shiotani ,  Kazuhiro Ikkyu ,  Yong Wang

IPC分类号： C08F220/00 ,  C07K1/22 ,  C08F8/00

CPC分类号： B01D15/3804 ,  B01J20/265 ,  B01J20/286 ,  C08F8/00 ,  C08F220/26 ,  Y10T428/2982

摘要： Provided is a filler for affinity chromatography having a high dynamic binding capacity for proteins and having excellent alkali resistance and storage stability. The filler for affinity chromatography of the present invention comprises a porous particle consisting of a copolymer of 40 parts to 99.5 parts by mass of (M-1) a methacryloyl group-containing vinyl monomer that contains a hydroxyl group and does not contain an epoxy group, 0.5 parts to 30 parts by mass of (M-2) an epoxy group-containing vinyl monomer, 0 parts to 59.5 parts by mass of (M-3) a methacryloyl group-containing vinyl monomer which is other than the monomers (M-1) and (M-2), and 0 parts to 25 parts by mass of (M-4) a vinyl monomer other than the monomers (M-1), (M-2) and (M-3) (with the proviso that the total amount of the contents of (M-1), (M-2), (M-3) and (M-4) is 100 parts by mass); ring-opened epoxy group obtainable by ring-opening of epoxy group that is contained in the copolymer; and ligand that is bound to the porous particle.

摘要翻译： 本发明提供一种对蛋白质具有高动态结合能力并具有优异的耐碱性和储存稳定性的亲和层析用填料。 本发明的亲和层析用填料包含由40〜99.5质量份的含有甲基丙烯酰基的含有甲基丙烯酰基的乙烯基单体（不含有环氧基）的（M-1）共聚物构成的多孔质粒子 ，（M-2）含有环氧基的乙烯基单体0.5〜30质量份，除了单体（M）以外的（M-3）含有甲基丙烯酰基的乙烯基单体的（M-3） -1）和（M-2）和0〜25质量份（M-4）除了单体（M-1），（M-2）和（M-3） 条件是（M-1），（M-2），（M-3）和（M-4）的含量的总量为100质量份） 通过共聚物中包含的环氧基开环获得的开环环氧基; 和与多孔颗粒结合的配体。

公开(公告)号：US20120244478A1

公开(公告)日：2012-09-27

申请号：US13489683

申请日：2012-06-06

申请人： Atsushi Nakamura ,  Tomoki Nagai ,  Takayoshi Abe ,  Tomohiro Kakizawa

发明人： Atsushi Nakamura ,  Tomoki Nagai ,  Takayoshi Abe ,  Tomohiro Kakizawa

IPC分类号： G03F7/20

CPC分类号： G03F7/70466 ,  G03F7/0035 ,  G03F7/0392 ,  G03F7/40 ,  H01L21/0274

摘要： A resist pattern formation method includes providing a first positive-tone radiation-sensitive resin composition on a substrate to form a first resist layer. The first resist layer is selectively exposed and developed to form a first resist pattern. The first resist pattern is coated with a resist pattern insolubilizing resin composition which comprises a resin and an alcohol solvent, the resin having a hydroxyl group. The resist pattern insolubilizing resin composition is baked or cured with UV to insolubilize the first resist pattern in a developer and in a second positive-tone radiation-sensitive resin composition. The resist pattern insolubilizing resin composition is developed to form an insolubilized resist pattern. The second positive-tone radiation-sensitive resin composition is provided on the insolubilized resist pattern to form a second resist layer. The second resist layer is selectively exposed and developed to form a second resist pattern.

摘要翻译： 抗蚀剂图案形成方法包括在基板上提供第一正色散辐射敏感树脂组合物以形成第一抗蚀剂层。 第一抗蚀剂层被选择性地曝光和显影以形成第一抗蚀剂图案。 第一抗蚀剂图案涂覆有抗蚀剂图案不溶化树脂组合物，其包含树脂和醇溶剂，该树脂具有羟基。 抗蚀剂图案不溶化树脂组合物用UV烘烤或固化，以使显影剂中的第一抗蚀图案和第二正色辐射敏感树脂组合物不溶化。 抗蚀剂图案不溶化树脂组合物被显影以形成不溶的抗蚀剂图案。 在不溶解的抗蚀剂图案上设置第二正色辐射敏感性树脂组合物以形成第二抗蚀剂层。 第二抗蚀剂层被选择性地曝光和显影以形成第二抗蚀剂图案。

公开(公告)号：US20120182024A1

公开(公告)日：2012-07-19

申请号：US13427088

申请日：2012-03-22

申请人： Takehito IKE ,  Takayoshi ABE ,  Tomomichi NAKAI ,  Takeshi NAKASHIMA ,  Kazuo ISHIMOTO

发明人： Takehito IKE ,  Takayoshi ABE ,  Tomomichi NAKAI ,  Takeshi NAKASHIMA ,  Kazuo ISHIMOTO

IPC分类号： G01R31/14

CPC分类号： G01R31/025 ,  H02H3/16 ,  H02H7/20

摘要： A ground fault detection circuit includes: a first switch circuit that connects/disconnects a first path between a positive bus bar and a ground potential section, the positive bus bar being connected to positive electrodes of secondary battery units through a field-effect transistor including a parasitic diode; a second switch circuit that connects/disconnects a second path between a negative bus bar and a ground potential section, the negative bus bar being connected to negative electrodes of the secondary battery units; and a ground fault detection unit that detects a ground fault of the positive bus bar or the negative bus bar based on an electric current flowing through the first path or the second path.

摘要翻译： 接地故障检测电路包括：第一开关电路，其连接/断开正母线和地电位部分之间的第一路径，所述正母线通过场效应晶体管连接到二次电池单元的正电极，所述场效应晶体管包括 寄生二极管; 第二开关电路，连接/断开负母线和地电位部分之间的第二路径，负母线连接到二次电池单元的负电极; 以及接地故障检测单元，其基于流过所述第一路径或所述第二路径的电流来检测所述正母线或所述负母线的接地故障。

公开(公告)号：US20110262748A1

公开(公告)日：2011-10-27

申请号：US13121124

申请日：2009-09-24

申请人： Kouji Tamori ,  Tetsuo Fukuta ,  Masaaki Miyaji ,  Yong Wang ,  Takayoshi Abe ,  Yuusuke Okano ,  Masaki Momiyama ,  Takahiro Kawai

发明人： Kouji Tamori ,  Tetsuo Fukuta ,  Masaaki Miyaji ,  Yong Wang ,  Takayoshi Abe ,  Yuusuke Okano ,  Masaki Momiyama ,  Takahiro Kawai

IPC分类号： B01D15/38 ,  C08F24/00

CPC分类号： C07K1/22 ,  B01J20/286 ,  B01J20/321 ,  B01J20/3219 ,  B01J20/3274 ,  Y10T428/29

摘要： An affinity chromatography packing material includes porous mother particles that include a copolymer of a monomer mixture including a crosslinkable vinyl monomer and an epoxy group-containing vinyl monomer, a ligand being bound to the porous mother particles, and the porous mother particles including a ring-opening epoxy group produced by ring-opening of the epoxy group included in the porous mother particles.

摘要翻译： 亲和层析填充材料包括多孔母体颗粒，其包括包含可交联乙烯基单体和含环氧基的乙烯基单体的单体混合物的共聚物，与多孔母体颗粒结合的配体，以及多孔母体颗粒， 开环环氧基，其由包含在多孔母体颗粒中的环氧基开环制得。