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    Gradient-based pixel interpolation
    23.
    发明授权
    Gradient-based pixel interpolation 失效
    基于梯度的像素插值

    公开(公告)号：US06281875B1

    公开(公告)日：2001-08-28

    申请号：US09069291

    申请日：1998-04-29

    Applicant: Jun Zhao ,  Jonathan Hui ,  Tong Zheng

    Inventor： Jun Zhao ,  Jonathan Hui ,  Tong Zheng

    IPC: G60T536

    CPC classification number: G06T3/4007 ,  G06T11/001

    Abstract: In a method for determining a data value for a target pixel in a destination image based on data values for pixels in a source image, with the destination image being scaled relative to the source image, calculating a position in the source image based on position of a target pixel in the destination image, testing the presence of a diagonal gradient in the source image at the position determined in the calculating step, the testing step testing for the presence of a diagonal gradient by reference to values of pixels in the source image that surround the position calculated in the calculating step, responsive to the presence of a diagonal gradient in the testing step, calculating a data value for the target pixel based on interpolation of data values for diagonally-adjacent pixels in the source image, and responsive to the absence of a diagonal gradient in the testing step, calculating a data value for the target pixel based on interpolation of data values for at least all four surrounding pixels in the source image.

    Abstract translation: 在用于基于源图像中的像素的数据值确定目标图像中的目标像素的数据值的方法中，其中目标图像相对于源图像被缩放，基于源图像的位置来计算源图像中的位置 目标图像中的目标像素，测试在计算步骤中确定的位置处源图像中对角线梯度的存在，测试步骤通过参考源图像中的像素值来测试是否存在对角梯度 围绕在计算步骤中计算的位置，响应于在测试步骤中是否存在对角梯度，基于源图像中对角线相邻像素的数据值的内插计算目标像素的数据值，并响应于 在测试步骤中不存在对角梯度，基于至少所有四个surroun的数据值的插值来计算目标像素的数据值 源图像中的ding像素。

    Measuring elastic moduli of dielectric thin films using an optical metrology system
    28.
    发明授权
    Measuring elastic moduli of dielectric thin films using an optical metrology system 有权
    使用光学测量系统测量介电薄膜的弹性模量

    公开(公告)号：US07019845B1

    公开(公告)日：2006-03-28

    申请号：US10960351

    申请日：2004-10-06

    Applicant: Sean P. Leary ,  Guray Tas ,  Christopher J. Morath ,  Michael Kotelyanskii ,  Tong Zheng ,  Guenadiy Lazarov ,  Andre D. Miller ,  George A. Antonelli ,  Jamie I. Ludke

    Inventor： Sean P. Leary ,  Guray Tas ,  Christopher J. Morath ,  Michael Kotelyanskii ,  Tong Zheng ,  Guenadiy Lazarov ,  Andre D. Miller ,  George A. Antonelli ,  Jamie I. Ludke

    IPC: G01B9/02 ,  G01B11/28

    CPC classification number: G01N21/211 ,  G01N21/8422

    Abstract: An optical metrology system is provided with a data analysis method to determine the elastic moduli of optically transparent dielectric films such as silicon dioxide, other carbon doped oxides over metal or semiconductor substrates. An index of refraction is measured by an ellipsometer and a wavelength of a laser beam is measured using a laser spectrometer. The angle of refraction is determined by directing a light pulse focused onto a wafer surface, measuring a first set of x1, y1, and z1 coordinates, moving the wafer in the z direction, directing the light pulse onto the wafer surface and measuring a second set of x2, y2 and z2 coordinates, using the coordinates to calculate an angle of incidence, calculating an angle of refraction from the calculated angle of incidence, obtaining a sound velocity v, from the calculated angle of refraction and using the determined sound velocity v, to calculate a bulk modulus. Hardware calibration and adjustments for the optical metrology system are also provided in order to minimize the variation of the results from tool to tool down to about 0.5% or below.

    Abstract translation: 光学测量系统具有数据分析方法，以确定光学透明介电膜的弹性模量，例如二氧化硅，金属或半导体衬底上的其他碳掺杂氧化物。 使用椭偏仪测量折射率，使用激光光谱仪测量激光束的波长。 通过将聚焦在晶片表面上的光脉冲引导，测量第一组x 1，y 1和z 1，确定折射角， SUB>坐标，沿z方向移动晶片，将光脉冲引导到晶片表面上并测量第二组x 2，y 2和z 2， 2坐标，使用坐标来计算入射角，从计算的入射角计算折射角，从计算的折射角获得声速v，并使用确定的声速v，到 计算体积模量。 还提供了光学测量系统的硬件校准和调整，以便将结果从工具到工具的降低最小化到约0.5％或更低。

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