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    Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon
    22.
    发明申请
    Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon 有权

    公开(公告)号：US20060234155A1

    公开(公告)日：2006-10-19

    申请号：US10544758

    申请日：2004-02-20

    Applicant: Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Michael Flugel

    Inventor： Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Michael Flugel

    IPC: G03C1/00

    CPC classification number: G03F7/029 ,  G03F7/031

    Abstract: Radiation-sensitive element comprising: (a) one or more types of monomers each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (b) at least one sensitizer, (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from the following classes of compounds: metallocenes; 1,3,5-triazine derivatives with one to three CX3 groups, wherein X represents chlorine or bromine; peroxides; hexaarylbiimidazoles; oxime ethers; oxime esters; N-aryl glycines and derivatives thereof; thiol compounds; N-aryl, S-aryl and O-aryl polycarboxylic acids with at least 2 carboxyl groups of which at least one is bonded to the N, S or O atom of the aryl unit; alkyltriarylborates; benzoin ethers; benzoin esters; trihalogenomethylarylsulfones; amines; N,N-dialkylaminobenzoic acid esters; aromatic sulfonyl halides; trihalogenomethylsulfones; imides; diazosulfonates; 9,10-dihydroanthracene derivatives; a-hydroxy and a-amino acetophenones; and (d) optionally one or more components selected from alkali-soluble binders, colorants, exposure indicators, plasticizers, chain transfer agents, leuco dyes, surfactants, inorganic fillers and thermopolymerization inhibitors characterized in that the at least one sensitizer is an oxazole derivative of the formula (I), wherein each R1, R2 and R3 is independently selected from a halogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, which may also be fused, an optionally substituted aralkyl group, a group —NR4R5 and a group —OR6, wherein R4 and R5 are independently selected from a hydrogen atom, an alkyl, aryl or ralkyl group, R6 is an alkyl, aryl or aralkyl group or a hydrogen atom and k, m and n are independently 0 or an integer from 1 to 5.

    Use of carboxyl group-containing acetal polymers in light-sensitive compositions and lithographic printing plates
    23.
    发明授权
    Use of carboxyl group-containing acetal polymers in light-sensitive compositions and lithographic printing plates 失效
    在光敏组合物和平版印刷版中使用含羧基的缩醛聚合物

    公开(公告)号：US06808858B2

    公开(公告)日：2004-10-26

    申请号：US10221117

    申请日：2002-12-10

    Applicant: Robert Fuss ,  Harald Baumann ,  Udo Dwars ,  Hans-Joachim Timpe

    Inventor： Robert Fuss ,  Harald Baumann ,  Udo Dwars ,  Hans-Joachim Timpe

    IPC: G03F7021

    CPC classification number: G03F7/0212 ,  G03F7/0215 ,  G03F7/032

    Abstract: The present invention relates to a light-sensitive composition containing: (i) at least one diazonium polycondensation product or at least one system that can be radically polymerized and consists of photoinitiators and unsaturated compounds which can be radically polymerized or at least one hybrid system consisting of a diazonium polycondensation product and a system that can be radically polymerized and consists of photo initiators and unsaturated compounds which can be radically polymerized, (ii) at least one binding agent and optionally one or more exposure indicators, one or more dyes for increasing the image contrast and one or more acids for stabilizing the light-sensitive composition which is characterized in that the binding agent essentially consists of units (A, B, C, D), whereby A corresponds to formula (I), B corresponds to formula (II), C corresponds to formula (III) and D corresponds to formula (IV). The invention also relates to the use thereof for coating printing plates. The invention further relates to printing plates which are coated with said light-sensitive composition.

    On press developable printing plate precursor
    24.
    发明授权
    On press developable printing plate precursor 失效
    在印刷机上可印刷的印版前体

    公开(公告)号：US06420089B1

    公开(公告)日：2002-07-16

    申请号：US09568673

    申请日：2000-05-11

    Applicant: Harald Baumann ,  Udo Dwars

    Inventor： Harald Baumann ,  Udo Dwars

    IPC: G03F711

    CPC classification number: G03F7/091

    Abstract: The present invention relates to a printing plate precursor with an overcoat, where the printing plate precursor is preferably developable on a printing press after imagewise exposure. The printing plate precursor comprises the following components: (a) at least one polymeric organic binder, soluble in water or in organic solvents having a water content of at least 50 wt.-% based on the total solvent content, (b) at least one radiation-absorbing component wherein the absorption maximum with the longest wavelength of the radiation-absorbing component of the overcoat is at or below 550 nm, the radiation-absorbing component absorbs in the range on the long wavelength side of the maximum of the absorption band of the photoactive system of the printing plate precursor and the difference between the absorption maximum with the longest wavelength of the radiation-absorbing component of the overcoat and the absorption maximum with the longest wavelength of the radiation-absorbing layer of the printing plate precursor is in the range of 5 to 200 nm, and (c) optionally at least one additive selected from an adhesive, a wetting agent, an inhibitor, a filler, a plasticizer, a flow improver, a thickener and an antifoaming agent.

    Abstract translation: 本发明涉及具有外涂层的印版前体，其中印版前体优选在成像曝光后在印刷机上显影。 印版前体包括以下组分：（a）至少一种可溶于水或有机溶剂的聚合物有机粘合剂，其含水量基于总溶剂含量至少为50重量％，（b）至少 一种辐射吸收组分，其中外涂层的辐射吸收组分的最长波长的吸收最大值在550nm以下，辐射吸收组分吸收在吸收带的最大值的长波长侧的范围 的印刷版前体的光活性体系和外涂层的辐射吸收组分的最长波长的吸收最大值与印版前体的辐射吸收层的最长波长的吸收最大值之间的差异在 5至200nm的范围，和（c）任选的至少一种添加剂，其选自粘合剂，润湿剂，抑制剂，填料，增塑剂，流动 改进剂，增稠剂和消泡剂。

    METHOD FOR MAKING LITHOGRAPHIC PRINTING PLATES
    26.
    发明申请
    METHOD FOR MAKING LITHOGRAPHIC PRINTING PLATES 有权
    制作平版印刷版的方法

    公开(公告)号：US20160077437A1

    公开(公告)日：2016-03-17

    申请号：US14484333

    申请日：2014-09-12

    Applicant: Christopher D. Simpson ,  Harald Baumann ,  Michael Flugel ,  Saija Werner ,  Oliver Piestert ,  Udo Dwars

    Inventor： Christopher D. Simpson ,  Harald Baumann ,  Michael Flugel ,  Saija Werner ,  Oliver Piestert ,  Udo Dwars

    IPC: G03F7/38 ,  B41C1/10

    CPC classification number: G03F7/38 ,  B41C1/1008 ,  G03F7/32

    Abstract: Lithographic printing plates are provided by imagewise exposing negative-working lithographic printing plate precursors having a negative-working radiation-sensitive imageable layer, followed by contacting with a processing solution that has a pH of at least 7 and up to and including 11. This processing solution also includes component (1) that is a nitrogen-containing base having an atmospheric pressure melting point of at least 40° C.; component (2) that is a non-ionic surfactant that independently has an atmospheric pressure melting point, glass transition temperature, or pour point of at least 40° C.; component (3) that is a hydroxy-containing solution promoter; and component (4) that is a hydrophilic surface protective compound. The method is carried out in a manner such that the exposed and processed precursor is not further treated with any liquid (such as gumming or rinsing solution) between processing and mounting onto a printing press.

    Abstract translation: 平版印刷版通过成像曝光具有负性辐射敏感可成像层的负性平版印刷版原版提供，然后与pH至少为7且高达11并且包括11的处理溶液接触。这种处理 溶液还包括作为大气压熔点至少为40℃的含氮碱的组分（1）。 组分（2），其是独立地具有至少40℃的大气压熔点，玻璃化转变温度或倾点的非离子表面活性剂。 作为含羟基溶液促进剂的组分（3）; 和作为亲水性表面保护性化合物的成分（4）。 该方法以这样的方式进行，使得在处理和安装到印刷机上之前，曝光和加工的前体不被任何液体（例如上胶或漂洗溶液）进一步处理。

    NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR
    27.
    发明申请
    NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR 有权
    负离子平版印刷机前驱板

    公开(公告)号：US20150099229A1

    公开(公告)日：2015-04-09

    申请号：US14044912

    申请日：2013-10-03

    Applicant: Christopher D. Simpson ,  Harald Baumann ,  Udo Dwars ,  Michael Flugel

    Inventor： Christopher D. Simpson ,  Harald Baumann ,  Udo Dwars ,  Michael Flugel

    IPC: G03F7/033 ,  G03F7/20

    CPC classification number: G03F7/033 ,  B41C1/1008 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/24 ,  G03F7/0388 ,  G03F7/20

    Abstract: Negative-working lithographic printing plate precursors have improved bakeability and good shelf life and can be imaged using either UV or infrared radiation. These precursors have a negative-working imageable layer that has a unique polymeric binder comprising a polymeric backbone and further comprising at least (a) and (b) pendant groups distributed in random order along the polymeric backbone. The (a) pendant groups are ethylenically unsaturated polymerizable groups, and the (b) pendant groups are defined by Structures (I), (II), and (III) described in the disclosure.

    Abstract translation: 负性平版印刷版前体具有改善的烘烤性和良好的保质期，并且可以使用UV或红外辐射成像。 这些前体具有负性可成像层，其具有包含聚合物主链的独特聚合物粘合剂，并且还包含至少（a）和（b）沿聚合物主链以随机顺序分布的侧基。 （a）侧基是烯属不饱和可聚合基团，（b）侧基由本发明中描述的结构（I），（II）和（III）定义。

    Photopolymer composition usable for lithographic plates
    30.
    发明授权
    Photopolymer composition usable for lithographic plates 有权
    可用于平版印刷版的光聚合物组合物

    公开(公告)号：US08119331B2

    公开(公告)日：2012-02-21

    申请号：US12159287

    申请日：2007-01-02

    Applicant: Harald Baumann ,  Bernd Strehmel ,  Udo Dwars ,  Ursula Muller

    Inventor： Harald Baumann ,  Bernd Strehmel ,  Udo Dwars ,  Ursula Muller

    IPC: G03F7/09 ,  G03F7/30 ,  G03F7/004

    CPC classification number: G03F7/027 ,  B41C1/1008 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/368

    Abstract: Radiation-sensitive element comprising a substrate and a radiation-sensitive coating comprising (a) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (b) at least one free-radical polymerizable oligomer A having an average molecular weight in the range of 3,500 to 9,000 determined by GPC, obtainable by reacting a triisocyanate with (i) at least one acrylic or methacrylic monomer with two free OH groups and at least one (meth)acrylic group and (ii) at least one compound comprising one OH group, at least one (meth)acrylic group and at least one poly(alkyleneoxide) chain in the molecule, wherein the (meth)acrylic monomer (i) is present in an amount of 2 to 20 mole-%, based on the total amount of (meth)acrylic compounds with OH functionality.

    Abstract translation: 辐射敏感元件包括基材和辐射敏感涂层，其包含（a）选自光引发剂和敏化剂/共引发剂体系中的至少一种成分，其吸收波长在250-1200nm范围内的辐射; （b）由三异氰酸酯与（i）至少一种丙烯酸或甲基丙烯酸单体与两个游离OH基团反应得到的至少一种平均分子量在3,500-9,000范围内的可自由基聚合的低聚物A， 至少一种（甲基）丙烯酸基和（ii）分子中至少一种含有一个OH基，至少一个（甲基）丙烯酸基和至少一个聚（环氧烷）链的化合物，其中（甲基）丙烯酸单体 基于具有OH官能度的（甲基）丙烯酸酯化合物的总量，i）的存在量为2至20摩尔％。

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