公开(公告)号：US07442486B2

公开(公告)日：2008-10-28

申请号：US10544758

申请日：2004-02-20

申请人： Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Michael Flugel

发明人： Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Michael Flugel

IPC分类号： G03C1/76 ,  G03C1/492 ,  G03C1/494 ,  G03C5/00 ,  G03C1/00

CPC分类号： G03F7/029 ,  G03F7/031

摘要： Radiation-sensitive element comprising: (a) one or more types of monomers each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (b) at least one sensitizer, (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from the following classes of compounds: metallocenes; 1,3,5-triazine derivatives with one to three CX3 groups, wherein X represents chlorine or bromine; peroxides; hexaarylbiimidazoles; oxime ethers; oxime esters; N-aryl glycines and derivatives thereof; thiol compounds; N-aryl, S-aryl and O-aryl polycarboxylic acids with at least 2 carboxyl groups of which at least one is bonded to the N, S or O atom of the aryl unit; alkyltriarylborates; benzoin ethers; benzoin esters; trihalogenomethylarylsulfones; amines; N,N-dialkylaminobenzoic acid esters; aromatic sulfonyl halides; trihalogenomethylsulfones; imides; diazosulfonates; 9,10-dihydroanthracene derivatives; a-hydroxy and a-amino acetophenones; and (d) optionally one or more components selected from alkali-soluble binders, colorants, exposure indicators, plasticizers, chain transfer agents, leuco dyes, surfactants, inorganic fillers and thermopolymerization inhibitors characterized in that the at least one sensitizer is an oxazole derivative of the formula (I), wherein each R1, R2 and R3 is independently selected from a halogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, which may also be fused, an optionally substituted aralkyl group, a group —NR4R5 and a group —OR6, wherein R4 and R5 are independently selected from a hydrogen atom, an alkyl, aryl or ralkyl group, R6 is an alkyl, aryl or aralkyl group or a hydrogen atom and k, m and n are independently 0 or an integer from 1 to 5.

公开(公告)号：US20060234155A1

公开(公告)日：2006-10-19

申请号：US10544758

申请日：2004-02-20

申请人： Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Michael Flugel

发明人： Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Michael Flugel

IPC分类号： G03C1/00

CPC分类号： G03F7/029 ,  G03F7/031

摘要： Radiation-sensitive element comprising: (a) one or more types of monomers each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (b) at least one sensitizer, (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from the following classes of compounds: metallocenes; 1,3,5-triazine derivatives with one to three CX3 groups, wherein X represents chlorine or bromine; peroxides; hexaarylbiimidazoles; oxime ethers; oxime esters; N-aryl glycines and derivatives thereof; thiol compounds; N-aryl, S-aryl and O-aryl polycarboxylic acids with at least 2 carboxyl groups of which at least one is bonded to the N, S or O atom of the aryl unit; alkyltriarylborates; benzoin ethers; benzoin esters; trihalogenomethylarylsulfones; amines; N,N-dialkylaminobenzoic acid esters; aromatic sulfonyl halides; trihalogenomethylsulfones; imides; diazosulfonates; 9,10-dihydroanthracene derivatives; a-hydroxy and a-amino acetophenones; and (d) optionally one or more components selected from alkali-soluble binders, colorants, exposure indicators, plasticizers, chain transfer agents, leuco dyes, surfactants, inorganic fillers and thermopolymerization inhibitors characterized in that the at least one sensitizer is an oxazole derivative of the formula (I), wherein each R1, R2 and R3 is independently selected from a halogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, which may also be fused, an optionally substituted aralkyl group, a group —NR4R5 and a group —OR6, wherein R4 and R5 are independently selected from a hydrogen atom, an alkyl, aryl or ralkyl group, R6 is an alkyl, aryl or aralkyl group or a hydrogen atom and k, m and n are independently 0 or an integer from 1 to 5.

公开(公告)号：US07615323B2

公开(公告)日：2009-11-10

申请号：US11718809

申请日：2005-11-11

申请人： Bernd Strehmel ,  Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Axel Draber ,  Michael Mursal

发明人： Bernd Strehmel ,  Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Axel Draber ,  Michael Mursal

IPC分类号： G03F7/028 ,  G03F7/029 ,  G03F7/031 ,  G03F7/11 ,  G03F7/38 ,  G03F7/40 ,  B41C1/10

CPC分类号： G03F7/029 ,  G03F7/031 ,  Y10S430/116 ,  Y10S430/117 ,  Y10S430/121 ,  Y10S430/123 ,  Y10S430/127 ,  Y10S522/904 ,  Y10S522/913

摘要： Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free radical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein π1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R1 and R2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group —NR3R4 and a group —OR5, each R3, R4 and R5 is independently selected from an alkyl, aryl, alkylaryl and aralkyl group, a and b independently represent 0 or an integer from 1 to 4, n has a value of >1 and AS is an aliphatic spacer.

摘要翻译： 该平版印刷版原版包括（a）具有亲水表面的平版印刷基材和（b）亲水表面上的辐射敏感涂层，其包含（i）一种或多种类型的单体和/或低聚物和/或聚合物， 至少一种可自由基聚合的烯键式不饱和基团，（ii）至少一种敏化剂和至少一种能够与敏化剂（ii）一起形成自由基的共引发剂; 其特征在于所述至少一种敏化剂是包含以下结构单元（式（I））的低聚或聚合化合物，其中p1是芳族或杂芳族单元或两者的组合，使得共轭的n体系存在于 结构（I）中的两个基团Z，每个Z独立地表示杂原子，每个R 1和R 2独立地选自卤素原子，烷基，芳基，烷基芳基或芳烷基，基团-NR 3 R 4和基团-OR 5，各自 R 3，R 4和R 5独立地选自烷基，芳基，烷基芳基和芳烷基，a和b独立地表示0或1-4的整数，n的值> 1，AS是脂肪族间隔基。

公开(公告)号：US07955776B2

公开(公告)日：2011-06-07

申请号：US11995213

申请日：2006-07-03

申请人： Harald Baumann ,  Bernd Strehmel ,  Detlef Pietsch ,  Udo Dwars ,  Tanja Ebhardt ,  Axel Draber

发明人： Harald Baumann ,  Bernd Strehmel ,  Detlef Pietsch ,  Udo Dwars ,  Tanja Ebhardt ,  Axel Draber

IPC分类号： G03F7/26 ,  G03F7/00

CPC分类号： G03F7/027 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/368 ,  B41M5/41 ,  B41M5/42 ,  B41M2205/40

摘要： Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X1, X2 and X3 are independently selected from straight-chain or cyclic C4-C12 alkylene and C6-C10 arylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R1, R2 and R3 are independently selected from (II) and (III) with the proviso that (1) n=0 in at least one of the groups R1, R2 and R3, and (2) n>2 in at least one of the groups R1, R2 and R3, and (3) at least one group R6 is different from H in formula (III).

摘要翻译： 辐射敏感元件包括（a）基底和（b）辐射敏感性涂层，其包含（i）至少一种选自光引发剂和敏化剂/共引发剂体系的组分，其吸收在250至1,200nm范围内的波长的辐射; （ii）式（I）的至少一种低聚物A，其中X 1，X 2和X 3独立地选自直链或环状的C 4 -C 12亚烷基和C 6 -C 10亚芳基，杂环基，杂芳族基团和两个或多个 上述更多的R 1，R 2和R 3独立地选自（II）和（III），条件是（1）在R1，R2和R3中的至少一个中n = 0，和（2）n> 2中的至少一个基团R 1，R 2和R 3中的至少一个，和（3）至少一个基团R 6与式（III）中的H不同。

公开(公告)号：US20080248424A1

公开(公告)日：2008-10-09

申请号：US11995213

申请日：2006-07-03

申请人： Harald Baumann ,  Bernd Strehmel ,  Detlef Pietsch ,  Udo Dwars ,  Tanja Ebhardt ,  Axel Draber

发明人： Harald Baumann ,  Bernd Strehmel ,  Detlef Pietsch ,  Udo Dwars ,  Tanja Ebhardt ,  Axel Draber

IPC分类号： G03F7/004 ,  G03F7/26

CPC分类号： G03F7/027 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/368 ,  B41M5/41 ,  B41M5/42 ,  B41M2205/40

摘要： Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X1, X2 and X3 are independently selected from straight-chain or cyclic C4-C12 alkylene and C6-C10 arylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R1, R2 and R3 are independently selected from (II) and (III) with the proviso that (1) n=0 in at least one of the groups R1, R2 and R3, and (2) n>2 in at least one of the groups R1, R2 and R3, and (3) at least one group R6 is different from H in formula (III).

摘要翻译： 辐射敏感元件包括（a）基底和（b）辐射敏感性涂层，其包含（i）至少一种选自光引发剂和敏化剂/共引发剂体系的组分，其吸收在250至1,200nm范围内的波长的辐射; （ii）至少一种式（I）的低聚物A，其中X 1，X 2和X 3 3独立地选自直链 或环C 4 -C 12亚烷基和C 6 -C 10亚芳基，杂环基，杂芳族 基团和上述两个或多个的组合，R 1，R 2和R 3独立地选自（II）和（III ），条件是在基团R 1，R 2和R 3 3中的至少一个中（1）n = 0，和（ 2）在R 1，R 2和R 3中的至少一个中n≥2，和（3）至少一个基团 R 6不同于式（III）中的H。

公开(公告)号：US20070269745A1

公开(公告)日：2007-11-22

申请号：US11718809

申请日：2005-11-11

申请人： Bernd Strehmel ,  Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Axel Draber ,  Michael Mursal

发明人： Bernd Strehmel ,  Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Axel Draber ,  Michael Mursal

IPC分类号： G03C1/00

CPC分类号： G03F7/029 ,  G03F7/031 ,  Y10S430/116 ,  Y10S430/117 ,  Y10S430/121 ,  Y10S430/123 ,  Y10S430/127 ,  Y10S522/904 ,  Y10S522/913

摘要： Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a freeradical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein π1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R1 and R2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group —NR3R4 and a group —OR5, each R3, R4 and R5 is independently selected from an alkyl, aryl, alkylaryl and aralkyl group, a and b independently represent 0 or an integer from 1 to 4, n has a value of >1 and AS is an aliphatic spacer

摘要翻译： 该平版印刷版原版包括（a）具有亲水表面的平版印刷基材和（b）亲水表面上的辐射敏感涂层，其包含（i）一种或多种类型的单体和/或低聚物和/或聚合物， 至少一种可自由聚合的烯属不饱和基团，（ii）至少一种敏化剂，和至少一种能够与敏化剂（ii）一起形成自由基的共引发剂; 其特征在于，所述至少一种敏化剂是包含以下结构单元（式（I））的低聚或聚合化合物，其中p 1是芳族或杂芳族单元或两者的组合，使得 在结构（I）中的两个基团Z之间存在共轭n系，每个Z独立地表示杂原子，每个R 1和R 2独立地选自 卤素原子，烷基，芳基，烷基芳基或芳烷基，基团-NR 3 R 4和基团-OR 5，各R R 4，R 4和R 5独立地选自烷基，芳基，烷基芳基和芳烷基，a和b独立地表示0或 1〜4的整数，n的值为1，AS为脂肪族间隔物

公开(公告)号：US09329485B2

公开(公告)日：2016-05-03

申请号：US14484333

申请日：2014-09-12

申请人： Christopher D. Simpson ,  Harald Baumann ,  Michael Flugel ,  Saija Werner ,  Oliver Piestert ,  Udo Dwars

发明人： Christopher D. Simpson ,  Harald Baumann ,  Michael Flugel ,  Saija Werner ,  Oliver Piestert ,  Udo Dwars

IPC分类号： G03F7/32 ,  G03F7/38 ,  B41C1/10

CPC分类号： G03F7/38 ,  B41C1/1008 ,  G03F7/32

摘要： Lithographic printing plates are provided by imagewise exposing negative-working lithographic printing plate precursors having a negative-working radiation-sensitive imageable layer, followed by contacting with a processing solution that has a pH of at least 7 and up to and including 11. This processing solution also includes component (1) that is a nitrogen-containing base having an atmospheric pressure melting point of at least 40° C.; component (2) that is a non-ionic surfactant that independently has an atmospheric pressure melting point, glass transition temperature, or pour point of at least 40° C.; component (3) that is a hydroxy-containing solution promoter; and component (4) that is a hydrophilic surface protective compound. The method is carried out in a manner such that the exposed and processed precursor is not further treated with any liquid (such as gumming or rinsing solution) between processing and mounting onto a printing press.

摘要翻译： 平版印刷版通过成像曝光具有负性辐射敏感可成像层的负性平版印刷版原版提供，然后与pH至少为7且高达11并且包括11的处理溶液接触。这种处理 溶液还包括作为大气压熔点至少为40℃的含氮碱的组分（1）。 组分（2），其是独立地具有至少40℃的大气压熔点，玻璃化转变温度或倾点的非离子表面活性剂。 作为含羟基溶液促进剂的组分（3）; 和作为亲水性表面保护性化合物的成分（4）。 该方法以这样的方式进行，使得在处理和安装到印刷机上之前，曝光和加工的前体不被任何液体（例如上胶或漂洗溶液）进一步处理。

公开(公告)号：US07574959B2

公开(公告)日：2009-08-18

申请号：US10580357

申请日：2004-11-18

申请人： Harald Baumann ,  Udo Dwars ,  Michael Flugel

发明人： Harald Baumann ,  Udo Dwars ,  Michael Flugel

IPC分类号： G03C1/73 ,  B32B17/06 ,  C08J7/04 ,  B41N1/00

CPC分类号： G03F7/031 ,  Y10T428/31591

摘要： Radiation-sensitive composition comprising (a) at least one photopolymerizable compound with at least one ethylenically unsaturated group accessible to a free-radical polymerization, wherein the at least one photopolymerizable compound has a molecular weight of 3,000 or less and can be obtained by reacting a diisocyanate with (I) an ethylenically unsaturated compound with a hydroxy group, and at the same time (ii) a saturated organic compound with an NH group and an OH group, wherein the reactants are used in amounts according to the following condition: Number of moles of isocyanate groups ≦number of moles of OH plus NH groups; (b) at least one sensitizer which absorbs radiation from the wavelength range of 250 to 450 nm of the electromagnetic spectrum and is selected from: dihydropyridines of formula (I) and oxazole derivatives of formula (II): (II) (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from 2,2′,4,4′,5′5-hexaarylbiimidazoles, compounds with at least one photolytically cleavable trihalogenmethyl group, diaryliodonium salts, triarylsulfonium salts and N-heterocyclic compounds with at least one nitrogen atom in the ring, having an oxy substituent at least one ring nitrogen atom, and mixtures of the above compounds; and (d) optionally one or more components selected from alkali-soluble binders, colorants, exposure indicators, plasticizers, chain transfer agents, leuco dyes, surfactants, inorganic fillers and thermopolymerization inhibitors; with the proviso that the radiation-sensitive composition does not comprise a metallocene.

摘要翻译： 辐射敏感性组合物，其包含（a）至少一种可光聚合化合物与至少一种可自由基聚合的烯键式不饱和基团，其中所述至少一种可光聚合化合物的分子量为3,000以下，可以通过使 二异氰酸酯与（I）具有羟基的烯属不饱和化合物，同时（ii）具有NH基和OH基的饱和有机化合物，其中反应物的用量按照以下条件使用： 异氰酸酯基团的摩尔数= OH加NH基团的摩尔数; （b）至少一种吸收来自电磁波谱的波长范围为250至450nm的辐射的敏化剂，并选自：式（I）的二氢吡啶和式（II）的恶唑衍生物：（II）（c） 能够与敏化剂（b）一起形成自由基的至少一种共引发剂，并选自2,2'，4,4'，5,5'-六芳基联咪唑，具有至少一个可光解裂解的三卤代甲基的化合物，二芳基碘鎓盐，三芳基锍盐 和环中具有至少一个氮原子的N-杂环化合物，至少一个环氮原子具有氧取代基，以及上述化合物的混合物; 和（d）任选的一种或多种选自碱溶性粘合剂，着色剂，曝光指示剂，增塑剂，链转移剂，无色染料，表面活性剂，无机填料和热聚合抑制剂的组分; 条件是辐射敏感组合物不包含金属茂。

公开(公告)号：US07285372B2

公开(公告)日：2007-10-23

申请号：US10536514

申请日：2003-11-28

申请人： Harald Baumann ,  Michael Flugel ,  Udo Dwars ,  Eduard Kottmair

发明人： Harald Baumann ,  Michael Flugel ,  Udo Dwars ,  Eduard Kottmair

IPC分类号： G03F7/028 ,  G03F7/029 ,  G03F7/027

CPC分类号： B41M5/46 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24 ,  G03F7/029 ,  Y10S430/118

摘要： Radiation-sensitive element comprising (a) a substrate with at least one hydrophilic surface and (b) a radiation-sensitive coating on at least one hydrophilic surface of the substrate, wherein the coating comprises: (i) at least one free-radical polymerizable monomer and/or oligomer and/or polymer with at least one ethylenically unsaturated group each, (ii) at least one absorber selected from photoinitiators and sensitizers, which is capable of absorbing radiation of a wavelength in the range of 250 to 1,200 nm and (iii) at least one stabilizer comprising in its molecule at least one group capable of inhibiting free-radical polymerization, and at least one other group capable of sorption at the hydrophilic surface of the substrate.

摘要翻译： 辐射敏感元件包括（a）具有至少一个亲水表面的基底和（b）基底的至少一个亲水表面上的辐射敏感涂层，其中所述涂层包括：（i）至少一种可自由基聚合的 具有至少一个烯键式不饱和基团的单体和/或低聚物和/或聚合物，（ii）至少一种选自光引发剂和敏化剂的吸收剂，其能够吸收波长在250-1200nm范围内的辐射和（ iii）至少一种稳定剂在其分子中包含至少一个能够抑制自由基聚合的基团，以及至少一种能够在基材亲水表面吸附的其它基团。

公开(公告)号：US07169534B2

公开(公告)日：2007-01-30

申请号：US10536510

申请日：2003-11-28

申请人： Harald Baumann ,  Michael Flugel ,  Udo Dwars ,  Hans-Horst Glatt

发明人： Harald Baumann ,  Michael Flugel ,  Udo Dwars ,  Hans-Horst Glatt

IPC分类号： G03F7/027

CPC分类号： G03F7/027 ,  C08G18/6715 ,  C08G18/7831

摘要： Radiation-sensitive elements are described whose radiation-sensitive coating comprises both a photopolymerizable oligomer with a biuret structural unit and a photopolymerizable phosphazene oligomer.

摘要翻译： 描述了辐射敏感元件，其辐射敏感性涂层包括具有缩二脲结构单元的光聚合低聚物和可光聚合的磷腈低聚物。