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    SUBSTRATE HANDLING DEVICE WITH ADJUSTABLE JOINTS
    21.
    发明申请
    SUBSTRATE HANDLING DEVICE WITH ADJUSTABLE JOINTS 有权

    公开(公告)号：US20210287928A1

    公开(公告)日：2021-09-16

    申请号：US17189787

    申请日：2021-03-02

    Applicant: ASM IP Holding B.V.

    Inventor： KiHyun Kim ,  Sam Kim ,  Rutvij Naik

    IPC: H01L21/687 ,  B65G47/90

    Abstract: The present disclosure is directed to an adjustable joint for insertion into a linkage of a substrate handler utilized for substrate processing. The adjustable joint allows for adjusting the pitch and roll of an attached link. Such adjustment may permit aligning a pickup surface of an end effector to a desired plane. Once adjusted, the joint may be fixed to maintain the desired orientation of the attached link. The adjustable joint allows for correcting deflection of a pickup surface of an end effector relative to a desired pickup plane due to, for example, drooping caused by high temperature usage, mechanical tolerances and/or installation errors.

    CVD APPARATUS AND FILM FORMING METHOD
    24.
    发明申请
    CVD APPARATUS AND FILM FORMING METHOD 有权

    公开(公告)号：US20220367151A1

    公开(公告)日：2022-11-17

    申请号：US17739493

    申请日：2022-05-09

    Applicant: ASM IP Holding B.V.

    Inventor： Koei Aida ,  Sam Kim

    IPC: H01J37/32 ,  C23C16/44 ,  C23C16/458 ,  C23C16/455 ,  C23C16/50

    Abstract: A CVD apparatus includes a chamber, a susceptor, an entry/takeout port for a substrate, and a gate valve provided at the entry/takeout port, in which the susceptor has a mounting plate and a support, the entry/takeout port is provided on a part of a side of the chamber, and is provided in a range from an inner bottom surface of the chamber to a position corresponding to the lower surface of the mounting plate when the susceptor is located at an upper end in the vertical direction, and the inner bottom surface of the chamber, the range from the inner bottom surface of the chamber to the position corresponding to the lower surface of the mounting plate when the susceptor is located at the upper end in the vertical direction, the lower surface of the mounting plate, and the outer side surface of the support are coated with ceramic liners.

    Substrate handling device with adjustable joints
    25.
    发明授权
    Substrate handling device with adjustable joints 有权

    公开(公告)号：US11488854B2

    公开(公告)日：2022-11-01

    申请号：US17189787

    申请日：2021-03-02

    Applicant: ASM IP Holding B.V.

    Inventor： KiHyun Kim ,  Sam Kim ,  Rutvij Naik

    IPC: H01L21/677 ,  H01L21/68 ,  H01L21/687 ,  B65G47/90

    Abstract: An adjustable joint for insertion into a linkage of a substrate handler utilized for substrate processing. The adjustable joint allows for adjusting the pitch and roll of an attached link. Such adjustment may permit aligning a pickup surface of an end effector to a desired plane. Once adjusted, the joint may be fixed to maintain the desired orientation of the attached link. The adjustable joint allows for correcting deflection of a pickup surface of an end effector relative to a desired pickup plane due to, for example, drooping caused by high temperature usage, mechanical tolerances and/or installation errors.

    SUSCEPTOR ASSEMBLY FOR PLASMA APPARATUS
    27.
    发明申请
    SUSCEPTOR ASSEMBLY FOR PLASMA APPARATUS 有权

    公开(公告)号：US20220084786A1

    公开(公告)日：2022-03-17

    申请号：US17471339

    申请日：2021-09-10

    Applicant: ASM IP Holding B.V.

    Inventor： Sam Kim ,  Koji Tanaka

    IPC: H01J37/32

    Abstract: A susceptor assembly for a reactor system may provide various plasma control benefits. The susceptor assembly includes a body, a heater element, a first electrode, and a second electrode, according to various embodiments. The body may have a top surface, a side surface, and a bottom surface, wherein the top surface is a substrate support surface. The heater element may be embedded within the body. The first and second electrodes may also be embedded within the body of the susceptor assembly, with the first electrode disposed between the heater element and the top surface of the body. The second electrode may be generally disposed proximate at least one of the side surface and the bottom surface.

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