公开(公告)号：US20140233004A1

公开(公告)日：2014-08-21

申请号：US14266591

申请日：2014-04-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Richard Joseph Bruls ,  Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Ronald Walther Jeanne Severijns ,  Sergei Shulepov ,  Herman Boom ,  Timotheus Franciscus Sengers

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

公开(公告)号：US11327404B2

公开(公告)日：2022-05-10

申请号：US16544283

申请日：2019-08-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Sjoerd Nicolaas Lambertus Donders ,  Bob Streefkerk ,  Martinus Hendrikus Antonius Leenders

IPC: G03F7/20

Abstract: An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.

公开(公告)号：US10684554B2

公开(公告)日：2020-06-16

申请号：US16511809

申请日：2019-07-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Michel Riepen

IPC: G03F7/20

Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

公开(公告)号：US10649349B2

公开(公告)日：2020-05-12

申请号：US16226731

申请日：2018-12-20

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Martinus Hendrikus Antonius Leenders ,  Sjoerd Nicolaas Lambertus Donders ,  Harry Sewell ,  Louis John Markoya ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Diane Elaine Markoya

IPC: G03F7/20

Abstract: A new way of drying and/or wetting a surface, such as a top surface of a substrate, is disclosed which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.

公开(公告)号：US10530111B2

公开(公告)日：2020-01-07

申请号：US15903392

申请日：2018-02-23

Applicant: ASML Netherlands B.V.

Inventor： Sudhir Srivastava ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen ,  Nan Lin ,  Sjoerd Nicolaas Lambertus Donders ,  Krijn Frederik Bustraan ,  Petrus Wilhelmus Smorenburg ,  Gerrit Jacobus Hendrik Brussaard

IPC: G03F7/20 ,  H01S3/00 ,  H05G2/00 ,  G03F1/84 ,  G01N21/956 ,  G02F1/35 ,  G01N21/88

Abstract: Disclosed is gas delivery system which is suitable for a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a gas delivery element delivers gas in a first direction. The gas delivery element has an optical input and an optical input, defining an optical path running in a second direction. The first direction is arranged relative to the second direction at an angle that is not perpendicular or parallel. Also disclosed is a gas delivery element having a gas jet shaping device, or a pair of gas delivery elements, one of which delivers a second gas, such that the gas jet shaping device or second gas is operable to modify a flow profile of the gas such that the number density of the gas falls sharply.

公开(公告)号：US20190294058A1

公开(公告)日：2019-09-26

申请号：US16438765

申请日：2019-06-12

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Nicolaas Rudolf Kemper ,  Henrikus Herman Marie Cox ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Franciscus Johannes Herman Maria Teunissen ,  Jan-Gerard Cornelis Van Der Toorn ,  Martinus Cornelis Maria Verhagen ,  Stefan Philip Christiaan Belfroid ,  Johannes Petrus Maria Smeulers ,  Herman Vogel

IPC: G03F7/20

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

公开(公告)号：US20190212657A1

公开(公告)日：2019-07-11

申请号：US16351771

申请日：2019-03-13

Applicant: ASML Netherlands B.V.

Inventor： Sudhir SRIVASTAVA ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen ,  Nan Lin ,  Sjoerd Nicolaas Lambertus Donders ,  Krijn Frederik Bustraan ,  Petrus Wilhelmus Smorenburg ,  Gerrit Jacobus Hendrik Brussaard

IPC: G03F7/20 ,  G01N21/956 ,  G03F1/84

CPC classification number: G03F7/7085 ,  G01N21/8806 ,  G01N21/956 ,  G02F2001/354 ,  G03F1/84 ,  G03F7/70616 ,  G03F7/7065 ,  G03F7/70883 ,  H01S3/00 ,  H01S3/0092 ,  H05G2/008

Abstract: Disclosed is a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a pump radiation source is operable to emit pump radiation at a high harmonic generation gas medium thereby exciting the high harmonic generation gas medium within a pump radiation interaction region so as to generate the high harmonic radiation and an ionization radiation source is operable to emit ionization radiation at the high harmonic generation gas medium to ionize a gas at an ionization region between the pump radiation interaction region and an optical output of the illumination source.

公开(公告)号：US10338478B2

公开(公告)日：2019-07-02

申请号：US14800493

申请日：2015-07-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens

IPC: G03F7/20 ,  G03F9/00

Abstract: In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.

公开(公告)号：US10146143B2

公开(公告)日：2018-12-04

申请号：US15795227

申请日：2017-10-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Timotheus Franciscus Sengers ,  Sjoerd Nicolaas Lambertus Donders ,  Hans Jansen ,  Arjen Boogaard

IPC: G03B27/42 ,  G03F7/20

Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.

公开(公告)号：US10120292B2

公开(公告)日：2018-11-06

申请号：US15297001

申请日：2016-10-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Adrianus Hendrik Koevoets ,  Sjoerd Nicolaas Lambertus Donders ,  Menno Fien ,  Antonius Franciscus Johannes De Groot ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Martijn Houben ,  Jan Steven Christiaan Westerlaken ,  Jim Vincent Overkamp ,  Maarten Van Beijnum

IPC: G03B27/32 ,  G03F7/20

Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.