公开(公告)号：US20180188660A1

公开(公告)日：2018-07-05

申请号：US15737399

申请日：2016-04-28

Applicant: ASML Netherlands B.V.

Inventor： Thomas POIESZ

IPC: G03F7/20

CPC classification number: G03F7/70783 ,  G03F7/70525 ,  G03F7/707

Abstract: The present invention relates to a substrate support (1), comprising: •a support body (2) forming a support surface configured to support a substrate, wherein said support surface comprises a support surface part configured to support a substrate area of the substrate, •at least one actuator (6) arranged on the support body at a location aligned with the support surface part and configured to contract or extend in a direction substantially parallel to a main plane of the support surface,

公开(公告)号：US20180149983A1

公开(公告)日：2018-05-31

申请号：US15569135

申请日：2016-05-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Abraham Alexander SOETHOUDT ,  Thomas POIESZ

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  B01D53/346 ,  B01D53/56 ,  B01D53/79 ,  B01D2251/2062 ,  B01D2251/2067 ,  B01D2257/402 ,  B01D2257/404 ,  B01D2258/0283 ,  B01D2259/124 ,  B05B13/0278 ,  B05B13/041 ,  B05B13/0627 ,  B05B15/656 ,  B05B15/68 ,  F23J15/003 ,  F23J2219/20 ,  G03F7/707 ,  G03F7/70783 ,  Y02C20/10

Abstract: A lithographic apparatus includes a support table and a gas extraction system. The gas extraction system is configured to extract gas from a gap between a base surface of the support table and a substrate through at least one gas extraction opening when the substrate is being lowered onto the support table. The lithographic apparatus is configured such that gas is extracted from the gap at a first loading flow rate when the distance between the substrate and the support plane is greater than a threshold distance and gas is extracted from the gap at a second loading flow rate when the distance between the substrate and the support plane is less than the threshold distance, wherein the second loading flow rate is lower than the first loading flow rate.

公开(公告)号：US20160334710A1

公开(公告)日：2016-11-17

申请号：US15111455

申请日：2014-11-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Martijn HOUBEN ,  Thomas POIESZ

IPC: G03F7/20

CPC classification number: G03F7/707 ,  G03F7/70783 ,  H01L21/6831 ,  H01L21/68742 ,  H01L21/6875

Abstract: A substrate table (WT) supports a substrate holder (WH) to which a substrate (W) is clamped for exposure. The substrate table (WT) has a plurality of e-pins (30) spaced apart from and distributed around the center of the substrate holder for receiving and lowering a substrate onto the substrate holder prior to exposure and raising a substrate off the substrate holder after exposure. Tip portions of the e-pins (30) and the corresponding apertures (24) in the substrate holder (WH) have a shape in plan including at least one re-entrant, e.g. a cross shape.

Abstract translation: 衬底台（WT）支撑衬底保持器（WH），衬底（W）夹在其上用于曝光。 衬底台（WT）具有与衬底保持器的中心间隔开并分布在衬底保持器的中心的多个e形销（30），用于在曝光之前将衬底接收和降低到衬底保持器上，并且在衬底保持器之后将衬底从衬底保持器上抬起， 曝光。 e形销（30）的顶端部分和衬底保持器（WH）中的对应的孔（24）具有平面形状，包括至少一个入口，例如， 十字形。