公开(公告)号：US09176392B2

公开(公告)日：2015-11-03

申请号：US14190147

申请日：2014-02-26

Applicant: ASML Netherlands B.V.

Inventor： Kars Zeger Troost ,  Arno Jan Bleeker

IPC: G03F7/20

CPC classification number: G03F7/70058 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70383 ,  G03F7/70425

Abstract: A system and method are used to manufacture a device using at least one exposure step. Each exposure step projects a patterned beam of radiation onto a substrate. The patterned beam includes a plurality of pixels. Each pixel delivers a radiation dose no greater than a predetermined normal maximum dose to the target portion in the exposure step and/or at least one selected pixel delivers an increased radiation dose, greater than the normal maximum dose. The increased dose may be delivered to compensate for the effect of a defective element at a known position in the array on a pixel adjacent a selected pixel or compensate for underexposure of the target portion at the location of a selected pixel resulting from exposure of that location to a pixel affected by a known defective element in another exposure step.

Abstract translation: 使用系统和方法来制造使用至少一个曝光步骤的装置。 每个曝光步骤将图案化的辐射束投射到衬底上。 图案化的波束包括多个像素。 每个像素在曝光步骤中向目标部分提供不大于预定正常最大剂量的辐射剂量，和/或至少一个所选择的像素传递大于正常最大剂量的增加的辐射剂量。 可以递送增加的剂量以补偿阵列中与已选择像素相邻的像素处的已知位置处的有缺陷元件的影响，或者补偿由于该位置的曝光导致的所选像素的位置处的目标部分的曝光不足 涉及在另一曝光步骤中受已知缺陷元件影响的像素。

公开(公告)号：US20150062547A1

公开(公告)日：2015-03-05

申请号：US14382229

申请日：2013-02-05

Applicant: ASML Netherlands B.V.

Inventor： Martinus Hendricus Henricus Hoeks ,  Arno Jan Bleeker

IPC: G03F7/20

CPC classification number: G03F7/20 ,  G03F7/70191 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/704

Abstract: There is disclosed an exposure apparatus, a device manufacturing method and a method of manufacturing an attenuator. According to an embodiment, the exposure apparatus includes a programmable patterning device configured to provide a plurality of individually controllable radiation beams; a projection system configured to project each of the radiation beams onto a respective location on a target; and an attenuator configured to reduce a standard deviation in maximum radiation flux or background exposure level that can be applied to the target by the radiation beams as a function of position on the target.

Abstract translation: 公开了一种曝光装置，装置制造方法和衰减器的制造方法。 根据实施例，曝光装置包括可编程图案形成装置，其被配置为提供多个可单独控制的辐射束; 投影系统，被配置为将每个辐射束投射到目标上的相应位置; 以及衰减器，其被配置为减少可以作为靶上的位置的函数的辐射束可以施加到目标的最大辐射通量或背景曝光水平的标准偏差。

公开(公告)号：US20150034788A1

公开(公告)日：2015-02-05

申请号：US14382228

申请日：2013-01-30

Applicant: ASML Netherlands B.V.

Inventor： Arno Jan Bleeker ,  Thomas Josephus Maria Castenmill ,  Pieter Willem Herman De Jager ,  Heine Melle Mulder ,  Koen Jacobus Johannes Maria Zaal ,  Theodorus Petrus Maria Cadee ,  Danny Maria Hubertus Philips ,  Ruud Antonius Catharina Maria Beere ,  Roger Anton Marie Timmermans

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/20 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70366 ,  G03F7/70383 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70425 ,  G03F7/70475

Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame (8) configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction. Provisions are made to prevent moments to be exerted on the lens held by the rotatable frame.

Abstract translation: 配置成将辐射束投影到目标上的投影系统包括可旋转的框架（8），其被配置为围绕限定切线方向和径向方向的轴线旋转，其中可旋转框架保持配置成将辐射束聚焦在 只有切向或径向; 以及固定部分，其包括基本上固定的透镜，其被配置为仅将所述辐射束聚焦在所述切向或径向方向中的另一个中。 作出规定以防止在由可旋转框架保持的镜片上施加力矩。

公开(公告)号：US20140354970A1

公开(公告)日：2014-12-04

申请号：US14361256

申请日：2012-12-20

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus Tinnemans ,  Arno Jan Bleeker

IPC: G03F7/20

CPC classification number: G03F7/70058 ,  G03F7/70358 ,  G03F7/70366 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70525 ,  G03F7/70558

Abstract: A lithographic or exposure apparatus has a projection system and a controller. The projection system includes a stationary part and a moving part. The projection system is configured to project a plurality of radiation beams onto locations on a target. The locations are selected based on a pattern. The controller is configured to control the apparatus to operate in a first mode or a second mode. In the first mode the projection system delivers a first amount of energy to the selected locations. In the second mode the projection system delivers a second amount of energy to the selected locations. The second amount of energy is greater than the first amount of energy.

Abstract translation: 光刻或曝光装置具有投影系统和控制器。 投影系统包括固定部分和移动部分。 投影系统被配置为将多个辐射束投影到目标上的位置上。 基于模式选择位置。 控制器被配置为控制设备以第一模式或第二模式操作。 在第一模式中，投影系统向选定位置传送第一量的能量。 在第二模式中，投影系统将第二量的能量传送到所选择的位置。 第二量的能量大于第一能量。

公开(公告)号：US20140285782A1

公开(公告)日：2014-09-25

申请号：US14356124

申请日：2012-11-14

Applicant: ASML Netherlands B.V.

Inventor： Antonius Johannes Josephus Van Dijsseldonk ,  Arno Jan Bleeker

IPC: G03F7/20

CPC classification number: G03F7/70425 ,  G02B27/126 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/704

Abstract: An exposure apparatus having a projection system configured to project a plurality of radiation beams onto a target and an image slicer. The image slicer is arranged in an inverted configuration such that, if an input image formed of a plurality of separated image regions were provided to the image slicer, it would output an output image formed from the plurality of image regions, each arranged to adjoin an adjacent image region. The exposure apparatus is configured such that each of the radiation beams is input into the image slicer at a location corresponding to a respective one of the separated image regions.

Abstract translation: 具有投影系统的曝光装置，其配置为将多个辐射束投射到目标物和图像限幅器上。 图像限幅器被布置成反向配置，使得如果由多个分离的图像区域形成的输入图像被提供给图像限幅器，则其将输出由多个图像区域形成的输出图像，每个图像区域布置成邻接 相邻图像区域。 曝光装置被配置为使得每个辐射束在对应于分离的图像区域中的相应一个的位置处被输入到图像限幅器中。