Halogenated Compositions
    21.
    发明申请
    Halogenated Compositions 审中-公开
    卤化组合物

    公开(公告)号:US20070027349A1

    公开(公告)日:2007-02-01

    申请号:US11192832

    申请日:2005-07-28

    IPC分类号: C07C21/18 C07C17/266

    CPC分类号: C07C19/10

    摘要: Compositions are provided that can include RF(RT)nQ, and/or RCl(RT)nH. The RF group can have four fluorine atoms, the RT group can include a C-2 group having a pendant —CF3 group, n can be at least 1, the R1 group can include a carbon atom, the RCl, group can be —CCl3, and the Q group can include one or more atoms of the periodic table of elements. Telomerization processes are also provided.

    摘要翻译: 提供的组合物可以包括R 1,R 2和R 3(R 3) n H H。 R 1 F可以具有四个氟原子,R T可以包括具有-CF 3 N侧基的C-2基团, n可以至少为1,R 1可以包括碳原子,R 1可以是-CCl 3,和 Q基团可以包括元素周期表中的一个或多个原子。 还提供了调聚过程。

    Halogenated compositions
    22.
    发明申请

    公开(公告)号:US20080071123A1

    公开(公告)日:2008-03-20

    申请号:US11981857

    申请日:2007-10-31

    IPC分类号: C07C19/08

    CPC分类号: C07C19/10

    摘要: Compositions are provided that can include RF(RT)nQ, and/or RCl(RT)nH. The RF group can have four fluorine atoms, the RT group can include a C-2 group having a pendant —CF3 group, n can be at least 1, the R1 group can include a carbon atom, the RCl group can be —CCl3, and the Q group can include one or more atoms of the periodic table of elements. Telomerization processes are also provided.

    Telomerization processes
    23.
    发明申请
    Telomerization processes 审中-公开
    凝聚过程

    公开(公告)号:US20080076948A1

    公开(公告)日:2008-03-27

    申请号:US11986222

    申请日:2007-11-20

    IPC分类号: C07C21/18 A01K31/02 A01N29/02

    摘要: Compositions are provided that can include RF(RT)nQ, formula I (I), formula II (II), and/or RCl(RT)nH. The RF group can have four fluorine atoms, the RT group can include a C-2 group having a pendant —CF3 group, n can be at least 1, the R1 group can include a carbon atom, the RCl group can be —CCI3, and the Q group can include one or more atoms of the periodic table of elements. Telomerization processes are also provided.

    摘要翻译: 提供的组合物可以包括R 1,R 2,R 2,R 3,R 3, 或R C(R T)H H。 R 1 F可以具有四个氟原子,R T可以包括具有-CF 3 N侧基的C-2基团, n可以至少为1,R 1可以包括碳原子,R 1可以是-CCl 3,并且 Q基团可以包括元素周期表的一个或多个原子。 还提供了调聚过程。

    Telomer compositions and production processes
    24.
    发明申请
    Telomer compositions and production processes 审中-公开
    调节剂组合物和生产工艺

    公开(公告)号:US20080076892A1

    公开(公告)日:2008-03-27

    申请号:US11890082

    申请日:2007-08-03

    IPC分类号: C08F12/20

    摘要: Telomer compositions are provided that can include at least one taxogen unit and a telogon unit, the taxogen unit being one or more of TFP, PFP, VDF, TFMA, PMVE, VF, TFE, CTFE, BrTFE, HFP, dichlorodifluoroethylene, chlorodifluoroethylene, bromodifluoroethylene, ethylenealkyl ether, ethylene, and propylene; the telogen unit being one or more of RFQ or RClQ, wherein the RF group can be an alkyl group having at least four fluorine atoms, the RCl group can be —CCl3, and the Q group can be H, Br, or I. Chemical production processes are also provided that can include exposing a taxogen to a telogen to form a telomer.

    摘要翻译: 提供了可以包括至少一个taxogen单元和telogon单元的调聚物组合,该taxogen单元是TFP,PFP,VDF,TFMA,PMVE,VF,TFE,CTFE,BrTFE,HFP,二氯二氟乙烯,氯二氟乙烯,溴二氟乙烯中的一种或多种 ,亚烷基烷基醚,乙烯和丙烯; 所述开环单元是R 1或Q 2 Q Q中的一个或多个,其中R F 1基团可以是至少具有至少 四个氟原子,R Cl基团可以是-CCl 3,并且Q基团可以是H,Br或I.也提供了化学生产方法,其可以包括 将税务学家暴露给一个前辈,形成一个调聚。

    Halogenated compositions
    25.
    发明申请
    Halogenated compositions 审中-公开
    卤化组合物

    公开(公告)号:US20080114194A1

    公开(公告)日:2008-05-15

    申请号:US11982247

    申请日:2007-10-31

    IPC分类号: C07C17/263

    CPC分类号: C07C19/10

    摘要: Compositions are provided that can include RF(RT)nQ, and/or RCl(RT)nH. The RF group can have four fluorine atoms, the RT group can include a C-2 group having a pendant —CF3 group, n can be at least 1, the R1 group can include a carbon atom, the RCl group can be —CCl3, and the Q group can include one or more atoms of the periodic table of elements. Telomerization processes are also provided.

    摘要翻译: 提供的组合物可以包括R 1,R 2和R 3(R 3) n H H。 R 1 F可以具有四个氟原子,R T可以包括具有-CF 3 N侧基的C-2基团, n可以至少为1,R 1可以包括碳原子,R 1可以是-CCl 3,并且 Q基团可以包括元素周期表的一个或多个原子。 还提供了调聚过程。

    Halogenated compositions
    26.
    发明申请
    Halogenated compositions 审中-公开
    卤化组合物

    公开(公告)号:US20070197840A1

    公开(公告)日:2007-08-23

    申请号:US11784447

    申请日:2007-04-05

    IPC分类号: C07C19/08

    CPC分类号: C07C19/10

    摘要: Compositions are provided that can include RF(RT)nQ, The RF group can have four fluorine atoms, the RT group can include a C-2 group having a pendant —CF3 group, n can be at least 1, the R1 group can include a carbon atom, the RCl group can be —CCl3, and the Q group can include one or more atoms of the periodic table of elements. Telomerization processes are also provided.

    摘要翻译: 提供的组合物可以包括R 1,R 2,R 3,R 3,R 3,R 3, 氟原子的基团可以包括具有-CF 3 N侧基团的C-2基团,n可以是至少1个,R 1, / SUB>基团可以包括碳原子,R Cl基团可以是-CCl 3,并且Q基团可以包括元素周期表的一个或多个原子 。 还提供了调聚过程。

    Telomerization processes
    27.
    发明申请
    Telomerization processes 审中-公开
    凝聚过程

    公开(公告)号:US20070197769A1

    公开(公告)日:2007-08-23

    申请号:US11784446

    申请日:2007-04-05

    IPC分类号: C07C17/20

    CPC分类号: C07C19/10

    摘要: Compositions are provided that can include RF(RT)nQ, and/or RCl(RT)nH. The RF group can have four fluorine atoms, the RT group can include a C-2 group having a pendant —CF3 group, n can be at least 1, the R1 group can include a carbon atom, the RCl group can be —CCl3, and the Q group can include one or more atoms of the periodic table of elements. Telomerization processes are also provided.

    摘要翻译: 提供的组合物可以包括R 1,R 2和R 3(R 3) n H H。 R 1 F可以具有四个氟原子,R T可以包括具有-CF 3 N侧基的C-2基团, n可以至少为1,R 1可以包括碳原子,R 1可以是-CCl 3,且 Q基团可以包括元素周期表的一个或多个原子。 还提供了调聚过程。