摘要:
Provided is a display substrate, a manufacturing method thereof and a display panel. The display substrate includes a base substrate, a display region and a bonding region located at a side of the display region on the base substrate, wherein the bonding region includes a first protective layer and a bonding electrode disposed on the base substrate; the first protective layer is provided with a groove; the bonding electrode is at least partially disposed in the groove; in a direction parallel to the base substrate, the groove, the bonding electrode and the first protective layer extend to an edge of the bonding region in a direction away from the display region; and a material of the first protective layer is less hard than a material of the bonding electrode.
摘要:
A phase shift mask includes a transparent substrate and light-shielding portions. The light-shielding portions include a first light-shielding portion, and over one side of it, a first compensating light-shielding portion, which has a first distance to the first light-shielding portion and a first width smaller than a resolution of an exposing machine utilized for an exposure process using the phase shift mask. The light-shielding portions can further include a second compensating light-shielding portion, having a second distance to another side of the first light-shielding portion and a second width smaller than the resolution of the exposing machine. The first distance and the second distance respectively allow the first and the second compensating light-shielding portion to reduce an exposure at a region corresponding to two sides of the first light-shielding portion during the exposure process. A method manufacturing an electronic component utilizing the phase shift mask is also provided.
摘要:
The present disclosure provides a display substrate, a method for preparing the same, and a display device. The display substrate includes: a base substrate; a metal pattern located on the base substrate, and an anti-reflection pattern located on a surface of the metal pattern proximate to the base substrate, in which a difference between a first slope angle of the anti-reflection pattern and a second slope angle of the metal pattern is less than a first threshold, and a distance between a first edge of a side surface of the anti-reflection pattern proximate to the metal pattern and a second edge of a side surface of the metal pattern proximate to the anti-reflection pattern is less than a second threshold.
摘要:
A display panel includes a method of fabricating an array substrate. The method includes forming a metal layer (1) on a substrate, and patterning the metal layer (1) using a phase shift mask to form a pattern of metal wiring. The phase shift mask includes a substrate and a wiring light shielding portion (02) on the substrate (01). The wiring light shielding portion (02) includes a light shielding region (021) and a phase shift region (022). In a direction perpendicular to the extending direction of the wiring light shielding portion (02) a width of the light shielding region (021) is larger than a width of the pattern of the metal wiring formed by the wiring light shielding portion (02).
摘要:
An array substrate includes a base substrate, a plurality of signal lines disposed at a side of the base substrate, and an organic layer disposed at a side of the plurality of signal lines facing away from the base substrate. The organic layer includes at least one auxiliary portion and a reference portion surrounding the at least one auxiliary portion, and a thickness of each auxiliary portion is less than a thickness of the reference portion.
摘要:
Disclosed are a manufacturing method of a phase shift mask and a phase shift mask. The manufacturing method of a phase shift mask includes: forming a pattern of metal shielding layer on a base substrate; forming a phase shift layer and a first photoresist layer in sequence on the pattern of metal shielding layer; patterning the first photoresist layer with the pattern of metal shielding layer serving as a mask to form a pattern of first photoresist layer; and etching the phase shift layer with the pattern of first photoresist layer serving as a mask to form a pattern of phase shift layer.
摘要:
There are provided a method of manufacturing a display substrate, a method of manufacturing a display device, and a display substrate. The method of manufacturing a display substrate comprises: providing a base substrate; forming a thin film transistor on the base substrate; forming a first conductive layer on the base substrate on which the thin film transistor is formed, the first conductive layer being electrically connected to a drain of the thin film transistor; forming a light-emitting material block; and transferring the light-emitting material block to a surface of the first conductive layer.
摘要:
A manufacturing method of a metal layer, a functional substrate and a manufacturing method thereof, and a display device are provided. The manufacturing method of a metal layer includes: forming an insulating layer on a base substrate; forming an etching buffer layer on the insulating layer; patterning the etching buffer layer and the insulating layer to form a plurality of recessed microstructures in the insulating layer; stripping the etching buffer layer; and forming a metal layer on the insulating layer, a surface of the metal layer adjacent to the insulating layer is formed with a plurality of protruded portions which are filled into the plurality of recessed microstructures. The manufacturing method of a metal layer may form a metal layer with anti-reflection effect.
摘要:
The present application discloses a shift register unit for outputting a gate driving signal to control image display in an operation cycle including sequentially an input phase, an output phase, an output-suspending phase, the shift register unit including a first node-control circuit connected to a pull-up node and a first pull-down node; a second node-control circuit connected to a pull-down control node and the pull-up node; a pull-up circuit connected to the pull-up node, a first input terminal for receiving a first clock signal, and an output terminal for outputting the gate driving signal, and configured to control the first clock signal to be passed from the first input terminal to the output terminal when the pull-up node is at a first potential level; a third node-control circuit connected to the pull-up node, the first pull-down node, the pull-down control node, and a second input terminal for receiving a second clock signal; and configured to control the first pull-down node to receive the second clock signal from the second input terminal when the pull-down control node is at the first potential level; a first pull-down circuit connected to the first pull-down node and the output terminal to control a second potential level to be passed to the output terminal when the first pull-down node is at the first potential level; a fourth node-control circuit connected to a second pull-down node and the pull-down control node to control the second pull-down node at the second potential level during the input phase and the output phase and to maintain an inverted potential level between the second pull-down node and the first pull-down node during the output-suspending phase; and a second pull-down circuit connected to the second pull-down node and the output terminal to yield a second potential level at the output terminal when the second pull-down node is at the first potential level, the first node-control circuit being further connected to the second pull-down node to control the pull-up node at the second potential level when the second pull-down node is at the first potential level.
摘要:
An UV curing mask plate, comprising: a mask layer, wherein: the mask layer is arranged on the substrate, and has a position corresponding to alignment marks, selection marks and an area not covered by the sealing frame glue to be cured; the material of the mask layer is a material with the function of blocking UV light.