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21.发明授权Lithography projection objective, and a method for correcting image defects of the same 有权平版印刷投影物镜，以及用于校正图像缺陷的方法公开(公告)号：US09316922B2
公开(公告)日：2016-04-19
申请号：US14315577
申请日：2014-06-26
申请人： Carl Zeiss SMT GmbH
CPC分类号： G03F7/70341 , G03F7/7015
摘要： A lithography projection objective for imaging a pattern in an object plane onto a substrate in an image plane. The projection objective comprises a multiplicity of optical elements along an optical axis. The optical elements comprise a first group of optical elements following the object plane, and a last optical element, following the first group and next to the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis. A positioning device is provided that positions at least the last optical element during immersion operation such that aberrations induced by disturbance are at least partially compensated.
摘要翻译： 一种用于将物平面中的图案成像到图像平面中的基板上的光刻投影物镜。 投影物镜包括沿着光轴的多个光学元件。 光学元件包括跟随物平面的第一组光学元件和最后一个光学元件，跟随第一组并且靠近图像平面。 投影物镜相对于像差是可调谐的或调谐的，在最后的光学元件和像面之间的体积由折射率基本上大于1的浸没介质填充的情况下。最后一个光学元件的位置是可调节的 沿光轴的方向。 提供了一种定位装置，其在浸入操作期间至少定位最后一个光学元件，使得由干扰引起的像差至少部分地被补偿。
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公开(公告)号：US09964859B2
公开(公告)日：2018-05-08
申请号：US15099172
申请日：2016-04-14
申请人： Carl Zeiss SMT GmbH
CPC分类号： G03F7/70341 , G03F7/7015
摘要： A lithography projection objective for imaging a pattern in an object plane onto a substrate in an image plane. The projection objective comprises a multiplicity of optical elements along an optical axis. The optical elements comprise a first group of optical elements following the object plane, and a last optical element, following the first group and next to the image plane. The projection objective is tunable or tuned with respect to aberrations for the case that the volume between the last optical element and the image plane is filled by an immersion medium with a refractive index substantially greater than 1. The position of the last optical element is adjustable in the direction of the optical axis. A positioning device is provided that positions at least the last optical element during immersion operation such that aberrations induced by disturbance are at least partially compensated.
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公开(公告)号：US20170363963A1
公开(公告)日：2017-12-21
申请号：US15638567
申请日：2017-06-30
申请人： Carl Zeiss SMT GmbH
发明人： Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
CPC分类号： G03F7/70058 , G02B17/06 , G02B17/08 , G02B17/0804 , G02B17/0892 , G03F7/7015 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective has a first objective part, defining a first part of the optical axis and imaging an object field to form a first real intermediate image. It also has a second, catadioptric objective part forming a second real intermediate image using the radiation from the first objective part. The second objective part has a concave mirror and defines a second part of the optical axis. A third objective part images the second real intermediate image into the image plane and defines a third part of the optical axis. Folding mirrors deflect the radiation from the object plane towards the concave mirror; and deflect the radiation from the concave mirror towards the image plane. The first part of the optical axis defined by the first objective part is laterally offset from and aligned parallel with the third part of the optical axis.
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公开(公告)号：US20160274343A1
公开(公告)日：2016-09-22
申请号：US14948490
申请日：2015-11-23
申请人： Carl Zeiss SMT GmbH
发明人： David R. Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Murai Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
CPC分类号： G02B17/0816 , G02B13/16 , G02B13/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G02B21/02 , G02B21/33 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first Intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1
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公开(公告)号：US20160131980A1
公开(公告)日：2016-05-12
申请号：US14852824
申请日：2015-09-14
申请人： Carl Zeiss SMT GmbH
发明人： Aurelian Dodoc , Karl-Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski
IPC分类号： G03F7/20
摘要： A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.
摘要翻译： 微光刻投影曝光装置包括用于产生投影光（13）和投影透镜（20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120）的照明系统（12） 能够布置在投影透镜的物平面（22）中的光源（24）可以被成像到能够被布置在投影透镜的像平面（28）中的感光层（26）上。 投影透镜被设计用于浸没模式，其中在像侧的投影透镜的最终透镜元件（L5; L205; L605; L705; L805; L905; L1005; L1105）浸没在浸没液体（34; 334a ; 434a; 534a）。 关于投影光（13）透明的终端元件（44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144）被紧固在图像侧的最终透镜元件与光 敏感层。
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公开(公告)号：US09146475B2
公开(公告)日：2015-09-29
申请号：US13786134
申请日：2013-03-05
申请人： Carl Zeiss SMT GmbH
发明人： Paul Gräupner , Olaf Conradi , Christoph Zaczek , Wilhelm Ulrich , Helmut Beierl , Toralf Gruner , Volker Graeschus
CPC分类号： G03F7/70191 , G03F7/70308
摘要： A projection exposure system includes an illumination system configured to illuminate a mask with radiation. The projection exposure system also includes a projection objective configured to project an image of a pattern of the mask onto a radiation-sensitive substrate. The projection exposure system further includes an angle-selective filter arrangement arranged at or close to a field surface of the projection objective in a projection beam path optically downstream of the object surface. The angle-selective filter arrangement is effective to filter radiation incident on the filter arrangement according to an angle-selective filter function.
摘要翻译： 投影曝光系统包括被配置为用辐射照射掩模的照明系统。 投影曝光系统还包括被配置为将掩模的图案的图像投影到辐射敏感基板上的投影物镜。 投影曝光系统还包括在物镜表面光学下游的投影光束路径中布置在投影物镜的场表面处或其附近的角度选择滤光器装置。 角度选择滤波器装置可以根据角度选择滤波器功能对入射到滤波器装置上的辐射进行滤波。
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公开(公告)号：US09134618B2
公开(公告)日：2015-09-15
申请号：US14143000
申请日：2013-12-30
申请人： Carl Zeiss SMT GmbH
发明人： Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
CPC分类号： G03F7/70058 , G02B17/06 , G02B17/08 , G02B17/0804 , G02B17/0892 , G03F7/7015 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective has a first objective part, defining a first part of the optical axis and imaging an object field to form a first real intermediate image. It also has a second, catadioptric objective part forming a second real intermediate image using the radiation from the first objective part. The second objective part has a concave mirror and defines a second part of the optical axis. A third objective part images the second real intermediate image into the image plane and defines a third part of the optical axis. Folding mirrors deflect the radiation from the object plane towards the concave mirror; and deflect the radiation from the concave mirror towards the image plane. The first part of the optical axis defined by the first objective part is laterally offset from and aligned parallel with the third part of the optical axis.
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公开(公告)号：US20140118713A1
公开(公告)日：2014-05-01
申请号：US14143000
申请日：2013-12-30
申请人： Carl Zeiss SMT GmbH
发明人： Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
CPC分类号： G03F7/70058 , G02B17/06 , G02B17/08 , G02B17/0804 , G02B17/0892 , G03F7/7015 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective has a first objective part, defining a first part of the optical axis and imaging an object field to form a first real intermediate image. It also has a second, catadioptric objective part forming a second real intermediate image using the radiation from the first objective part. The second objective part has a concave mirror and defines a second part of the optical axis. A third objective part images the second real intermediate image into the image plane and defines a third part of the optical axis. Folding mirrors deflect the radiation from the object plane towards the concave mirror; and deflect the radiation from the concave mirror towards the image plane. The first part of the optical axis defined by the first objective part is laterally offset from and aligned parallel with the third part of the optical axis.
摘要翻译： 反射折射投射物镜具有第一物镜部分，限定光轴的第一部分并对物场进行成像以形成第一实际中间像。 它还具有使用来自第一目标部分的辐射形成第二实际中间图像的第二反射折射物镜部分。 第二目标部分具有凹面镜并且限定光轴的第二部分。 第三目标部分将第二实际中间图像成像到图像平面中并且限定光轴的第三部分。 折叠镜将物体平面上的辐射偏转到凹面镜; 并将来自凹面镜的辐射偏转到图像平面。 由第一物镜部分限定的光轴的第一部分横向偏移并平行于光轴的第三部分。
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公开(公告)号：US08632195B2
公开(公告)日：2014-01-21
申请号：US13657091
申请日：2012-10-22
申请人： Carl Zeiss SMT GmbH
发明人： Hans-Juergen Mann , David Shafer , Wilhelm Ulrich
CPC分类号： G03F7/70233 , G02B13/143 , G02B17/061 , G02B17/0652 , G02B17/0657
摘要： In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.
摘要翻译： 通常，在一个方面，本发明的特征在于设置成将从物体平面到图像平面的辐射成像的目标，包括布置成将来自物体平面的辐射引导到图像平面的多个元件，其中物镜具有图像 侧面数值孔径大于0.55，最大像侧场尺寸大于1 mm，目标是一个反射目标。
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