公开(公告)号：US08220930B2

公开(公告)日：2012-07-17

申请号：US12411308

申请日：2009-03-25

Applicant: Deming Tang

Inventor： Deming Tang

IPC: G03B21/14 ,  H01J40/14 ,  G02F1/01 ,  H01L31/00

CPC classification number: G01J1/32 ,  G01J1/04 ,  G01J1/0414 ,  G01J1/42 ,  G02F1/136277 ,  G03B21/14 ,  G03B21/2066 ,  G03B21/2073

Abstract: An integrated opto-electronic device, a portable reflective projection system and a method for in situ monitoring and adjusting light illumination are provided. The device includes a reflective polarizing composite film (150) configured to receive a source light (210) at a desired non-normal incident angle (221), polarizes and reflects a first portion (211) of said source light (210) as polarized illumination light (16) at a reciprocal angle (222) to said desired non-normal incident angle (221); and a photovoltaic cell (180), adhered to an opposite side of said reflective polarizing composite film (150) to said source light (210), configured to receive a second portion (212) of said source light (210) that passes through said reflective polarizing composite film (150) and transform said second portion (212) to photogenerated charge. Unused illumination can be collected in order to re-store and reuse recovered energy.

Abstract translation: 提供集成光电装置，便携式反射投影系统和用于原位监测和调节光照的方法。 该装置包括被配置为以期望的非正常入射角（221）接收源光（210）的反射偏振复合膜（150），偏振并将所述源光（210）的第一部分（211）反射为偏振 照明光（16）以相对的角度（222）延伸到所述期望的非正常入射角（221）; 以及光电池（180），其粘附到所述反射型偏振复合膜（150）与所述源光（210）的相对侧，被配置为接收穿过所述源光（210）的所述源光（210）的第二部分（212） 反射偏振光复合膜（150），并将所述第二部分（212）转换成光生电荷。 可以收集未使用的照明，以便重新储存和重新利用回收的能量。

公开(公告)号：US20090275203A1

公开(公告)日：2009-11-05

申请号：US12435835

申请日：2009-05-05

Applicant: Deming Tang

Inventor： Deming Tang

IPC: H01L21/302 ,  H01L21/31

CPC classification number: B81C1/0015

Abstract: A method for processing a thin film micro device on a substrate includes: 1) depositing a carbon film on the substrate as a sacrificial layer; 2) photolithographically defining a first predetermined pattern in the carbon film; 3) etching an unwanted portion of the carbon film outside the first predetermined pattern; 4) depositing a structural film including a single or multiple layers of solid state materials; 5) photolithographically defining a second predetermined pattern in the structural film; 6) etching the discarded portion of the structural film outside the second predetermined pattern; 7) selectively removing the remaining portion of the sacrificial carbon film by using a selective etch process gas in a reactor chamber, so that the overlapped portion of the remaining structural element with the first predetermined pattern is suspended above an underneath cavity above the substrate.

Abstract translation: 一种在衬底上处理薄膜微器件的方法包括：1）在衬底上沉积碳膜作为牺牲层; 2）光刻地限定碳膜中的第一预定图案; 3）在第一预定图案之外蚀刻碳膜的不想要的部分; 4）沉积包括单层或多层固态材料的结构膜; 5）光刻地限定结构膜中的第二预定图案; 6）在第二预定图案之外蚀刻结构膜的废弃部分; 7）通过在反应器室中使用选择性蚀刻工艺气体来选择性地去除牺牲碳膜的剩余部分，使得具有第一预定图案的剩余结构元件的重叠部分悬浮在衬底上方的下方空腔的上方。

公开(公告)号：US08841155B2

公开(公告)日：2014-09-23

申请号：US13882337

申请日：2011-05-19

Applicant: Jianhong Mao ,  Deming Tang

Inventor： Jianhong Mao ,  Deming Tang

IPC: H01L21/00 ,  B81C1/00 ,  G01P15/08 ,  H03H3/007

Abstract: A method for manufacturing a micro-electro-mechanical system (MEMS) device is provided. The method comprises: providing a semiconductor substrate, the semiconductor substrate having a metal interconnection structure (100) formed therein; forming a first sacrificial layer (201) on the surface of the semiconductor substrate, the material of the first sacrificial layer is amorphous carbon; etching the first sacrificial layer to form a first recess (301); covering and forming a first dielectric layer (401) on the surface of the first sacrificial layer; thinning the first dielectric layer by a chemical mechanical polishing (CMP) process, until exposing the first sacrificial layer; forming a micromechanical structure layer (500) on the surface of the first sacrificial layer and exposing the first sacrificial layer, wherein a part of the micromechanical structure layer is connected to the first dielectric layer. The method avoids polishing the amorphous carbon, shortens the period of production, and improves the production efficiency.

公开(公告)号：US08134109B2

公开(公告)日：2012-03-13

申请号：US12613209

申请日：2009-11-05

Applicant: Deming Tang

Inventor： Deming Tang

IPC: H01L27/00

CPC classification number: G03B35/26 ,  G02B5/3058 ,  G02B27/26 ,  G02B27/283 ,  H04N9/3167 ,  H04N13/363 ,  H04N13/365

Abstract: An optical projection engine device uses a symmetrical wire grid polarizing beam splitter (PBS) that splits incident illumination to a symmetrical pair of polarized light beams in two orthogonal polarization states, one by reflection and the other by transmission, for illuminating a pair of reflective modulation imagers respectively. In identical geometric configuration, the two synchronized reflective modulation imagers polarization modulate polarized light beams as received, and reflect them back towards the PBS, which through transmission and reflection respectively, combines and projects two modulated light beams through a projection lens system to form a pair of spatially overlapped illumination images of aligned pixels with the same image in two orthogonal polarization states on a projection screen. The device jointly provides improvement optical efficiency and expanded function to three dimensional stereoscopic displays.

Abstract translation: 光学投影引擎装置使用对称的线栅偏振分束器（PBS），其将入射照明分成两对正交偏振状态的对称偏振光束，一个通过反射而另一个通过透射来照射一对反射调制 成像仪分别。 在相同的几何结构中，两个同步的反射调制成像器极化地调制收到的偏振光束，并将其反射回PBS，通过透射和反射分别通过投影透镜系统组合投影两个调制光束，形成一对 在投影屏幕上的两个正交偏振状态下具有相同图像的对准像素的空间重叠照明图像。 该设备联合为三维立体显示提供光学效率和扩展功能。

公开(公告)号：US07880953B2

公开(公告)日：2011-02-01

申请号：US12613227

申请日：2009-11-05

Applicant: Deming Tang

Inventor： Deming Tang

IPC: G02B26/00

CPC classification number: G02B26/0841

Abstract: A spatial optical modulation array device includes regularly packed micro optical-electrical-mechanical pixels in a planner configuration on a semiconductor substrate, each pixel electrically actuated independently and thus operated optically in the binary modes, reflection and diffraction to incident illumination. Subject to the electrostatic contraction or compulsion driven by a pixel circuitry, the top metal reflector is placed accurately at the minimum or maximum spacing from the static bottom metal reflector in an odd or even integral multiple of a quarter wavelength within visual light spectrum, so that diffraction or reflection in destructive or constructive interference is achieved respectively and thus incident illumination modulated independently in closely binary modes at each micro optical-electrical-mechanical pixel.

Abstract translation: 空间光调制阵列器件包括在半导体衬底上的规划器配置中的规则包装的微光电机械像素，每个像素独立电驱动，从而以二进制模式光学操作，对入射照明进行反射和衍射。 受到由像素电路驱动的静电收缩或强制的影响，顶部金属反射器被精确地放置在距离静态底部金属反射器的最小或最大间距处，在视觉光谱内的四分之一波长的奇数或偶数整数倍，使得 分别实现了破坏性或建设性干扰的衍射或反射，从而在每个微光电机械像素处以独立的二进制模式独立地进行入射照明。

公开(公告)号：US20100110528A1

公开(公告)日：2010-05-06

申请号：US12613227

申请日：2009-11-05

Applicant: Deming Tang

Inventor： Deming Tang

IPC: G02B26/00 ,  H01L21/44

CPC classification number: G02B26/0841

Abstract: A spatial optical modulation array device includes regularly packed micro optical-electrical-mechanical pixels in a planner configuration on a semiconductor substrate, each pixel electrically actuated independently and thus operated optically in the binary modes, reflection and diffraction to incident illumination. Subject to the electrostatic contraction or compulsion driven by a pixel circuitry, the top metal reflector is placed accurately at the minimum or maximum spacing from the static bottom metal reflector in an odd or even integral multiple of a quarter wavelength within visual light spectrum, so that diffraction or reflection in destructive or constructive interference is achieved respectively and thus incident illumination modulated independently in closely binary modes at each micro optical-electrical-mechanical pixel.

Abstract translation: 空间光调制阵列器件包括在半导体衬底上的规划器配置中的规则包装的微光电机械像素，每个像素独立电驱动，从而以二进制模式光学操作，对入射照明进行反射和衍射。 受到由像素电路驱动的静电收缩或强制的影响，顶部金属反射器被精确地放置在距离静态底部金属反射器的最小或最大间距处，在视觉光谱内的四分之一波长的奇数或偶数整数倍，使得 分别实现了破坏性或建设性干扰的衍射或反射，从而在每个微光电机械像素处以独立的二进制模式独立地进行入射照明。