Abstract:
A lighting apparatus that includes a light source and a phosphor composition radiationally coupled to the light source is presented. The phosphor composition includes a first phosphor that includes a phase of general formula (I): L3ZO4(Br2-nXn):Eu2+ wherein 0≦n≦1; L is Zn, Mg, Ca, Sr, Ba, or combinations thereof; Z is Si, Ge, or a combination thereof; and X is F, Cl, I, or combinations thereof.
Abstract:
A method includes mixing a first fluoride phosphor powder that is doped with tetravalent manganese with a treatment solution for a designated period of time, stopping the mixing to allow the fluoride phosphor powder to settle, removing at least some liquid that has separated from the first fluoride phosphor powder, repeating (a) the mixing, (b) the stopping of the mixing, and (c) removing at least some of the liquid during one or more additional cycles, and obtaining a second fluoride phosphor powder following the repeating of the mixing, the stopping of the mixing, and the removing of at least some of the liquid. The second fluoride phosphor powder includes a reduced amount of the manganese relative to the first fluoride phosphor powder.
Abstract:
Coating systems suitable for use in generating fluorescent visible light, and lamps provided with such coating systems. The coating systems includes a phosphor-containing coating that contains at least a first phosphor that is predominantly excited by ultraviolet radiation of a first wavelength to emit visible light and absorbs but is less efficiently excited by ultraviolet radiation of a second wavelength. The coating system further includes a second phosphor that absorbs the ultraviolet radiation of the second wavelength and little if any of the ultraviolet radiation of the first wavelength.
Abstract:
Coating systems suitable for use in fluorescent lamps, particularly as scattering agents within a UV-reflecting coating for the purpose of improving fluorescent lamp luminosity. Such a coating system is provided on a transparent or translucent substrate and includes a phosphor coating and a scattering agent that scatters UV rays. The scattering agent includes an inorganic powder present in a separate UV-reflecting layer adjacent the phosphor coating and/or dispersed in the phosphor coating so that the scattered UV rays are absorbed by the phosphor coating and cause the phosphor coating to emit visible light. The inorganic powder exhibits low or no absorption to UV rays having wavelengths of 185 nm and 254 nm and is not reactive with mercury.
Abstract:
A process for preparing a color stable Mn4+ doped complex fluoride phosphor of formula I includes Ax(M(1−m), Mnm)Fy (I) contacting a first aqueous HF solution comprising (1−m) parts of a compound of formula HxMFy, and a second aqueous HF solution comprising m*n parts of a compound of formula Ax[MnFy], with a third aqueous HF solution comprising (1−n) parts of the compound of formula Ax[MnFy] and a compound of formula AaX, to yield a precipitate comprising the color stable Mn4+ doped complex fluoride phosphor; wherein A is Li, Na, K, Rb, Cs, NR4 or a combination thereof; M is Si, Ge, Sn, Ti, Zr, Al, Ga, In, Sc, Hf, Y, La, Nb, Ta, Bi, Gd, or a combination thereof; R is H, lower alkyl, or a combination thereof; X is an anion; a is the absolute value of the charge of the X anion; x is the absolute value of the charge of the [MFy] ion; y is 5, 6 or 7; 0
Abstract translation:制备式I的颜色稳定的Mn4 +掺杂复合氟化物荧光体的方法包括与包含(1-m)份式H x M F y的化合物的第一HF水溶液接触的M 1(M(1-m),Mnm) 和包含m * n个分子式Ax [MnFy]化合物的第二HF水溶液与包含(1-n)份式Ax [MnF y]化合物和式AaX化合物的第一HF水溶液 以产生包含颜色稳定的Mn4 +掺杂的复合氟化物荧光体的沉淀物; 其中A为Li,Na,K,Rb,Cs,NR4或其组合; M是Si,Ge,Sn,Ti,Zr,Al,Ga,In,Sc,Hf,Y,La,Nb,Ta,Bi,Gd或它们的组合; R是H,低级烷基或它们的组合; X是阴离子; a是X阴离子电荷的绝对值; x是[MFy]离子的电荷的绝对值; y为5,6或7; 0
Abstract:
A process for preparing a Mn+4 doped phosphor of formula I Ax[MFy]:Mn+4 I includes gradually adding a first solution to a second solution and periodically discharging the product liquor from the reactor while volume of the product liquor in the reactor remains constant; wherein A is Li, Na, K, Rb, Cs, or a combination thereof; M is Si, Ge, Sn, Ti, Zr, Al, Ga, In, Sc, Y, La, Nb, Ta, Bi, Gd, or a combination thereof; x is the absolute value of the charge of the [MFy] ion; y is 5, 6 or 7. The first solution includes a source of M and HF and the second solution includes a source of Mn to a reactor in the presence of a source of A.