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    Projection objective of a microlithographic projection exposure apparatus
    22.
    发明授权
    Projection objective of a microlithographic projection exposure apparatus 有权
    微光刻投影曝光装置的投影目标

    公开(公告)号：US07982969B2

    公开(公告)日：2011-07-19

    申请号：US12330980

    申请日：2008-12-09

    申请人： Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

    发明人： Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

    IPC分类号： G02B15/14

    CPC分类号： G03F7/70341 ,  G02B5/3091 ,  G02B27/0025 ,  G03F7/70308

    摘要： A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element with an index of refraction greater than 1.6. This element has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.

    摘要翻译： 微光刻投影曝光装置的投影物镜具有折射率大于1.6的高折射率折射光学元件。 该元件具有在体积上变化的体积和材料相关的光学性质。 该光学特性的变化导致物镜的像差。 在一个实施例中，提供至少4个光学表面，其布置在与折射光学元件的体积光学共轭的至少一个体积中。 每个光学表面包括至少一个校正装置，例如具有局部变化特性的表面变形或双折射层，其至少部分地校正由光学性质的变化引起的像差。

    PROJECTION LENS OF A MICROLITHOGRAPHIC EXPOSURE SYSTEM
    24.
    发明申请
    PROJECTION LENS OF A MICROLITHOGRAPHIC EXPOSURE SYSTEM 审中-公开
    微波曝光系统的投影镜头

    公开(公告)号：US20090021830A1

    公开(公告)日：2009-01-22

    申请号：US12132796

    申请日：2008-06-04

    申请人： Michael Totzeck ,  Susanne Beder ,  Wilfried Clauss ,  Heiko Feldmann ,  Daniel Kraehmer ,  Aurelian Dodoc

    发明人： Michael Totzeck ,  Susanne Beder ,  Wilfried Clauss ,  Heiko Feldmann ,  Daniel Kraehmer ,  Aurelian Dodoc

    IPC分类号： G02B17/08 ,  G02B27/28 ,  G02B27/18

    CPC分类号： G02B5/3083 ,  G02B27/286 ,  G03F7/70308 ,  G03F7/70566 ,  G03F7/70966

    摘要： In some embodiments, the disclosure provides a projection lens configured to configured to image radiation from an object plane of the projection lens to an image plane of the projection lens. The projection lens can, for example, be used in a microlithographic projection exposure apparatus. The projection lens includes a last lens on the image plane side. The last lens includes at least one intrinsically birefringent material. The material can be, for example, magnesium oxide, a garnet, lithium barium fluoride and/or a spinel. The last lens can have a thickness d which satisfies the condition 0.8*y0, max

    摘要翻译： 在一些实施例中，本公开提供一种投影透镜，其被配置为被配置为将来自投影透镜的物平面的辐射成像到投影透镜的像平面。 投影透镜例如可以用在微光刻投影曝光装置中。 投影透镜在图像平面侧包括最后一个透镜。 最后一个透镜包括至少一个本质上双折射材料。 该材料可以是例如氧化镁，石榴石，氟化锂钡和/或尖晶石。 最后一个透镜可以具有满足条件0.8 * y0，max

    ILLUMINATION SYSTEM OR PROJECTION LENS OF A MICROLITHOGRAPHIC EXPOSURE SYSTEM
    25.
    发明申请
    ILLUMINATION SYSTEM OR PROJECTION LENS OF A MICROLITHOGRAPHIC EXPOSURE SYSTEM 有权
    微观曝光系统的照明系统或投影镜头

    公开(公告)号：US20080204877A1

    公开(公告)日：2008-08-28

    申请号：US12042621

    申请日：2008-03-05

    申请人： Michael Totzeck ,  Susanne Beder ,  Wilfried Clauss ,  Heiko Feldmann ,  Daniel Kraehmer ,  Aurelian Dodoc

    发明人： Michael Totzeck ,  Susanne Beder ,  Wilfried Clauss ,  Heiko Feldmann ,  Daniel Kraehmer ,  Aurelian Dodoc

    IPC分类号： G02B27/28

    CPC分类号： G02B5/3083 ,  G02B27/286 ,  G03F7/70566 ,  G03F7/70966

    摘要： In some embodiments, the disclosure provides an optical system, in particular an illumination system or a projection lens of a microlithographic exposure system, having an optical system axis and at least one element group including three birefringent elements each of which includes optically uniaxial material and having an aspheric surface, wherein a first birefringent element of the group has a first orientation of its optical crystal axis, a second birefringent element of the group has a second orientation of its optical crystal axis, wherein the second orientation can be described as emerging from a rotation of the first orientation, the rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof, and a third birefringent element of the group has a third orientation of its optical crystal axis, wherein the third orientation can be described as emerging from a rotation of the second orientation, the rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof.

    摘要翻译： 在一些实施例中，本公开提供了一种光学系统，特别是微光刻曝光系统的照明系统或投影透镜，其具有光学系统轴线和包括三个双折射元件的至少一个元件组，每个元件组包括光学单轴材料并具有 非球面表面，其中该组的第一双折射元件具有其光学晶体轴的第一取向，该组的第二双折射元件具有其光学晶轴的第二取向，其中第二取向可被描述为从 第一取向的旋转，旋转不对应于围绕光学系统轴的旋转90°的角度或其整数倍，并且该组的第三双折射元件具有其光学晶轴的第三取向，其中， 可以将第三取向描述为从第二取向旋转而出现，旋转不对准 以围绕光学系统轴旋转90°的角度或其整数倍。

    Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection
    28.
    发明申请
    Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection 有权
    用于模拟高光圈成像系统的显微镜成像系统和方法，特别是用于掩模检查

    公开(公告)号：US20060012873A1

    公开(公告)日：2006-01-19

    申请号：US10917626

    申请日：2004-08-13

    申请人： Michael Totzeck ,  Heiko Feldmann ,  Toralf Grunder ,  Karl-Heinz Schuster ,  Joern Greif-Wuestenbecker ,  Thomas Scheruebl ,  Wolfgang Harnisch ,  Norbert Rosenkranz ,  Ulrich Stroessner

    发明人： Michael Totzeck ,  Heiko Feldmann ,  Toralf Grunder ,  Karl-Heinz Schuster ,  Joern Greif-Wuestenbecker ,  Thomas Scheruebl ,  Wolfgang Harnisch ,  Norbert Rosenkranz ,  Ulrich Stroessner

    IPC分类号： G02B21/06

    CPC分类号： G03F7/70566 ,  G02B5/3025 ,  G02B21/0016 ,  G03F7/70666 ,  Y10S359/90

    摘要： The present invention is directed to an optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing. With the proposed solution, it is possible in particular to examine lithography masks for defects by means of inspection microscopes in spite of increasingly smaller structures and increasingly higher image-side numerical apertures of the imaging systems. Realistic images of the scanner systems can be generated by emulating the occurring vector effects.

    摘要翻译： 本发明涉及一种用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。 用于模拟高光圈成像系统的显微镜成像系统包括成像光学器件，检测器和评估单元，其中偏振光学元件选择性地布置在照明光束路径中，用于产生照明光束和/或成像光束的不同偏振状态 用于选择成像光束的不同偏振分量的路径，具有偏振相关强度衰减功能的光学元件可以被引入到成像光束路径中，掩模和/或采样的图像被检测器接收用于不同偏振光束分量， 被传送到评估单元进行进一步处理。 利用所提出的解决方案，尽管越来越小的结构和成像系统的图像侧数值孔径越来越高，但是可以通过检查显微镜检查用于缺陷的光刻掩模。 可以通过模拟出现的矢量效应来生成扫描仪系统的现实图像。

    METHOD OF MANUFACTURING A PROJECTION OBJECTIVE AND PROJECTION OBJECTIVE
    29.
    发明申请
    METHOD OF MANUFACTURING A PROJECTION OBJECTIVE AND PROJECTION OBJECTIVE 有权
    制作投影目标和投影目标的方法

    公开(公告)号：US20120134016A1

    公开(公告)日：2012-05-31

    申请号：US13364565

    申请日：2012-02-02

    申请人： Heiko Feldmann ,  Toralf Gruner ,  Alexander Epple

    发明人： Heiko Feldmann ,  Toralf Gruner ,  Alexander Epple

    IPC分类号： G02B17/08

    CPC分类号： G03F7/70891 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/705 ,  G03F7/70983

    摘要： The disclosure relates to a method of manufacturing a projection objective, and a projection objective, such as a projection objective configured to be used in a microlithographic process. The method can include defining an initial design for the projection objective and optimizing the design using a merit function. The method can be used in the manufacturing of projection objectives which may be used in a microlithographic process of manufacturing miniaturized devices.

    摘要翻译： 本公开涉及一种制造投影物镜的方法，以及投影物镜，例如被配置为在微光刻工艺中使用的投影物镜。 该方法可以包括定义投影物镜的初始设计，并使用优值函数优化设计。 该方法可用于制造可用于制造小型化装置的微光刻工艺中的投影物镜。

    Projection objective and projection exposure apparatus including the same
    30.
    发明授权
    Projection objective and projection exposure apparatus including the same 有权
    投影物镜与投影曝光装置相同

    公开(公告)号：US07965453B2

    公开(公告)日：2011-06-21

    申请号：US12651829

    申请日：2010-01-04

    申请人： Wilhelm Ulrich ,  Aurelian Dodoc ,  Heiko Feldmann ,  Hans-Juergen Rostalski

    发明人： Wilhelm Ulrich ,  Aurelian Dodoc ,  Heiko Feldmann ,  Hans-Juergen Rostalski

    IPC分类号： G02B13/14 ,  G02B17/08

    CPC分类号： G02B17/0812 ,  G02B13/143 ,  G03F7/70225

    摘要： A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |β|

    摘要翻译： 用于投影光刻的缩小投影物镜具有多个光学元件，其被配置为将布置在投影物镜的物体表面中的有效物场成像为以缩小倍率|＆bgr布置在投影物镜的图像表面中的有效图像场 ; | <1。 光学元件形成干燥物镜，其适用于具有折射率n'<1.01的气体介质的像差，填充投影物镜的出射表面和图像表面之间的有限厚度的图像空间。 光学元件包括具有最大透镜直径Dmax的最大透镜，并且被配置为在具有最大图像场高度Y'的有效图像场中提供图像侧数值孔径NA <1。 COMP = Dmax /（Y'·（NA / n'）2）条件COMP <15.8成立。 优选实施例具有相对较小的透镜总数，这允许以相对低的材料消耗制造尺寸相对较小的投影物镜，产生用于干式光刻的高性能，重量轻，紧凑的缩小投影物镜。