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    Illumination system or projection lens of a microlithographic exposure system
    1.
    发明授权
    Illumination system or projection lens of a microlithographic exposure system 有权
    微光曝光系统的照明系统或投影透镜

    公开(公告)号：US08031326B2

    公开(公告)日：2011-10-04

    申请号：US12042621

    申请日：2008-03-05

    申请人： Michael Totzeck ,  Susanne Beder ,  Wilfried Clauss ,  Heiko Feldmann ,  Daniel Kraehmer ,  Aurelian Dodoc

    发明人： Michael Totzeck ,  Susanne Beder ,  Wilfried Clauss ,  Heiko Feldmann ,  Daniel Kraehmer ,  Aurelian Dodoc

    IPC分类号： G03B27/54 ,  G03B27/72

    CPC分类号： G02B5/3083 ,  G02B27/286 ,  G03F7/70566 ,  G03F7/70966

    摘要： In some embodiments, the disclosure provides an optical system, in particular an illumination system or a projection lens of a microlithographic exposure system, having an optical system axis and at least one element group including three birefringent elements each of which includes optically uniaxial material and having an aspheric surface, wherein a first birefringent element of the group has a first orientation of its optical crystal axis, a second birefringent element of the group has a second orientation of its optical crystal axis, wherein the second orientation can be described as emerging from a rotation of the first orientation, the rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof, and a third birefringent element of the group has a third orientation of its optical crystal axis, wherein the third orientation can be described as emerging from a rotation of the second orientation, the rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof.

    摘要翻译： 在一些实施例中，本公开提供了一种光学系统，特别是微光刻曝光系统的照明系统或投影透镜，其具有光学系统轴线和包括三个双折射元件的至少一个元件组，每个元件组包括光学单轴材料并具有 非球面表面，其中该组的第一双折射元件具有其光学晶体轴的第一取向，该组的第二双折射元件具有其光学晶轴的第二取向，其中第二取向可被描述为从 第一取向的旋转，旋转不对应于围绕光学系统轴的旋转90°的角度或其整数倍，并且该组的第三双折射元件具有其光学晶轴的第三取向，其中， 可以将第三取向描述为从第二取向旋转而出现，旋转不对准 以围绕光学系统轴旋转90°的角度或其整数倍。

    PROJECTION LENS OF A MICROLITHOGRAPHIC EXPOSURE SYSTEM
    2.
    发明申请
    PROJECTION LENS OF A MICROLITHOGRAPHIC EXPOSURE SYSTEM 审中-公开
    微波曝光系统的投影镜头

    公开(公告)号：US20090021830A1

    公开(公告)日：2009-01-22

    申请号：US12132796

    申请日：2008-06-04

    申请人： Michael Totzeck ,  Susanne Beder ,  Wilfried Clauss ,  Heiko Feldmann ,  Daniel Kraehmer ,  Aurelian Dodoc

    发明人： Michael Totzeck ,  Susanne Beder ,  Wilfried Clauss ,  Heiko Feldmann ,  Daniel Kraehmer ,  Aurelian Dodoc

    IPC分类号： G02B17/08 ,  G02B27/28 ,  G02B27/18

    CPC分类号： G02B5/3083 ,  G02B27/286 ,  G03F7/70308 ,  G03F7/70566 ,  G03F7/70966

    摘要： In some embodiments, the disclosure provides a projection lens configured to configured to image radiation from an object plane of the projection lens to an image plane of the projection lens. The projection lens can, for example, be used in a microlithographic projection exposure apparatus. The projection lens includes a last lens on the image plane side. The last lens includes at least one intrinsically birefringent material. The material can be, for example, magnesium oxide, a garnet, lithium barium fluoride and/or a spinel. The last lens can have a thickness d which satisfies the condition 0.8*y0, max

    摘要翻译： 在一些实施例中，本公开提供一种投影透镜，其被配置为被配置为将来自投影透镜的物平面的辐射成像到投影透镜的像平面。 投影透镜例如可以用在微光刻投影曝光装置中。 投影透镜在图像平面侧包括最后一个透镜。 最后一个透镜包括至少一个本质上双折射材料。 该材料可以是例如氧化镁，石榴石，氟化锂钡和/或尖晶石。 最后一个透镜可以具有满足条件0.8 * y0，max

    ILLUMINATION SYSTEM OR PROJECTION LENS OF A MICROLITHOGRAPHIC EXPOSURE SYSTEM
    3.
    发明申请
    ILLUMINATION SYSTEM OR PROJECTION LENS OF A MICROLITHOGRAPHIC EXPOSURE SYSTEM 有权
    微观曝光系统的照明系统或投影镜头

    公开(公告)号：US20080204877A1

    公开(公告)日：2008-08-28

    申请号：US12042621

    申请日：2008-03-05

    申请人： Michael Totzeck ,  Susanne Beder ,  Wilfried Clauss ,  Heiko Feldmann ,  Daniel Kraehmer ,  Aurelian Dodoc

    发明人： Michael Totzeck ,  Susanne Beder ,  Wilfried Clauss ,  Heiko Feldmann ,  Daniel Kraehmer ,  Aurelian Dodoc

    IPC分类号： G02B27/28

    CPC分类号： G02B5/3083 ,  G02B27/286 ,  G03F7/70566 ,  G03F7/70966

    摘要： In some embodiments, the disclosure provides an optical system, in particular an illumination system or a projection lens of a microlithographic exposure system, having an optical system axis and at least one element group including three birefringent elements each of which includes optically uniaxial material and having an aspheric surface, wherein a first birefringent element of the group has a first orientation of its optical crystal axis, a second birefringent element of the group has a second orientation of its optical crystal axis, wherein the second orientation can be described as emerging from a rotation of the first orientation, the rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof, and a third birefringent element of the group has a third orientation of its optical crystal axis, wherein the third orientation can be described as emerging from a rotation of the second orientation, the rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof.

    摘要翻译： 在一些实施例中，本公开提供了一种光学系统，特别是微光刻曝光系统的照明系统或投影透镜，其具有光学系统轴线和包括三个双折射元件的至少一个元件组，每个元件组包括光学单轴材料并具有 非球面表面，其中该组的第一双折射元件具有其光学晶体轴的第一取向，该组的第二双折射元件具有其光学晶轴的第二取向，其中第二取向可被描述为从 第一取向的旋转，旋转不对应于围绕光学系统轴的旋转90°的角度或其整数倍，并且该组的第三双折射元件具有其光学晶轴的第三取向，其中， 可以将第三取向描述为从第二取向旋转而出现，旋转不对准 以围绕光学系统轴旋转90°的角度或其整数倍。

    Projection objective of a microlithographic projection exposure apparatus
    5.
    发明授权
    Projection objective of a microlithographic projection exposure apparatus 有权
    微光刻投影曝光装置的投影目标

    公开(公告)号：US08325426B2

    公开(公告)日：2012-12-04

    申请号：US13156819

    申请日：2011-06-09

    申请人： Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

    发明人： Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

    IPC分类号： G02B15/14

    CPC分类号： G03F7/70341 ,  G02B5/3091 ,  G02B27/0025 ,  G03F7/70308

    摘要： A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element with an index of refraction greater than 1.6. This element has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.

    摘要翻译： 微光刻投影曝光装置的投影物镜具有折射率大于1.6的高折射率折射光学元件。 该元件具有在体积上变化的体积和材料相关的光学性质。 该光学特性的变化导致物镜的像差。 在一个实施例中，提供至少4个光学表面，其布置在与折射光学元件的体积光学共轭的至少一个体积中。 每个光学表面包括至少一个校正装置，例如具有局部变化特性的表面变形或双折射层，其至少部分地校正由光学性质的变化引起的像差。

    Projection objective of a microlithographic projection exposure apparatus
    7.
    发明授权
    Projection objective of a microlithographic projection exposure apparatus 有权
    微光刻投影曝光装置的投影目标

    公开(公告)号：US07982969B2

    公开(公告)日：2011-07-19

    申请号：US12330980

    申请日：2008-12-09

    申请人： Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

    发明人： Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

    IPC分类号： G02B15/14

    CPC分类号： G03F7/70341 ,  G02B5/3091 ,  G02B27/0025 ,  G03F7/70308

    摘要： A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element with an index of refraction greater than 1.6. This element has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.

    摘要翻译： 微光刻投影曝光装置的投影物镜具有折射率大于1.6的高折射率折射光学元件。 该元件具有在体积上变化的体积和材料相关的光学性质。 该光学特性的变化导致物镜的像差。 在一个实施例中，提供至少4个光学表面，其布置在与折射光学元件的体积光学共轭的至少一个体积中。 每个光学表面包括至少一个校正装置，例如具有局部变化特性的表面变形或双折射层，其至少部分地校正由光学性质的变化引起的像差。

    Method of determining lens materials for a projection exposure apparatus
    8.
    发明授权
    Method of determining lens materials for a projection exposure apparatus 有权
    确定投影曝光装置的透镜材料的方法

    公开(公告)号：US07239450B2

    公开(公告)日：2007-07-03

    申请号：US11181694

    申请日：2005-07-14

    申请人： Vladimir Kamenov ,  Daniel Kraehmer ,  Michael Totzeck ,  Toralf Gruner ,  Aurelian Dodoc

    发明人： Vladimir Kamenov ,  Daniel Kraehmer ,  Michael Totzeck ,  Toralf Gruner ,  Aurelian Dodoc

    IPC分类号： G02B3/00

    CPC分类号： G03F7/70891 ,  G02B1/02 ,  G02B1/08 ,  G02B17/0812 ,  G02B17/0892 ,  G03F7/70966

    摘要： A method of determining materials of lenses contained in an optical system of a projection exposure apparatus is described. First, for each lens of a plurality of the lenses, a susceptibility factor KLT/LH is determined. This factor is a measure of the susceptibility of the respective lens to deteriorations caused by at least one of lifetime effects and lens heating effects. Then a birefringent fluoride crystal is selected as a material for each lens for which the susceptibility factor KLT/LH is above a predetermined threshold. Theses lenses are assigned to a first set of lenses. For these lenses, measures are determined for reducing adverse effects caused by birefringence inherent to the fluoride crystals.

    摘要翻译： 描述了确定投影曝光装置的光学系统中所包含的透镜的材料的方法。 首先，对于多个透镜的每个透镜，确定敏感度因子K LT / LH 。 该因子是由寿命效应和透镜加热效果中的至少一种引起的各透镜对恶化的敏感性的量度。 然后选择双折射氟化物晶体作为敏感度因子K LT / LH <>高于预定阈值的每个透镜的材料。 这些镜头被分配到第一组透镜。 对于这些透镜，确定了减少由氟化物晶体固有的双折射引起的不利影响的措施。