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公开(公告)号：US08722306B2
公开(公告)日：2014-05-13
申请号：US12602769
申请日：2008-05-26
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/30 , C08F2220/1808 , G03F7/0045 , G03F7/0392
摘要： A radiation-sensitive resin composition includes a resin (A1) that includes a repeating unit shown by the following formula (1-1) and a repeating unit shown by the following formula (1-2), and a radiation-sensitive acid generator (B). The radiation-sensitive resin composition exhibits excellent sensitivity, and can reduce a mask error factor (MEEF). wherein R1, R2, and R3 individually represent a linear or branched alkyl group having 1 to 4 carbon atoms, R4 represents a hydrogen atom, a linear or branched alkyl group having 2 to 4 carbon atoms, a linear or branched fluoroalkyl group having 1 to 4 carbon atoms, or a linear or branched alkoxy group having 1 to 4 carbon atoms, and q represents an integer from 0 to 3.
摘要翻译： 辐射敏感性树脂组合物包括含有下述式（1-1）表示的重复单元和下述式（1-2）所示的重复单元的树脂（A1）和放射线敏感性酸发生剂 B）。 辐射敏感性树脂组合物显示出优异的灵敏度，并且可以降低掩模误差因子（MEEF）。 其中R1，R2和R3分别表示碳原子数为1〜4的直链或支链烷基，R4表示氢原子，碳原子数2〜4的直链或支链烷基，具有1〜 4个碳原子，或具有1〜4个碳原子的直链或支链烷氧基，q表示0〜3的整数。
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公开(公告)号：US08530146B2
公开(公告)日：2013-09-10
申请号：US13357618
申请日：2012-01-25
申请人： Hirokazu Sakakibara , Hiromu Miyata , Koji Ito , Taiichi Furukawa
发明人： Hirokazu Sakakibara , Hiromu Miyata , Koji Ito , Taiichi Furukawa
IPC分类号： G03F7/26
CPC分类号： G03F7/20 , G03F7/0046 , G03F7/0397 , G03F7/2041 , G03F7/325
摘要： A radiation-sensitive resin composition includes an acid-labile group-containing polymer and photoacid generator. The radiation-sensitive resin composition is used to form a resist pattern using a developer that includes an organic solvent in an amount of 80 mass % or more. The radiation-sensitive resin composition has a contrast value γ of 5.0 to 30.0. The contrast value γ is calculated from a resist dissolution contrast curve obtained when developing the radiation-sensitive resin composition using the organic solvent.
摘要翻译： 辐射敏感性树脂组合物包括含酸不稳定基团的聚合物和光酸产生剂。 辐射敏感性树脂组合物用于使用包含80质量％以上的有机溶剂的显影剂形成抗蚀剂图案。 辐射敏感性树脂组合物的对比度值γ值为5.0〜30.0。 从使用有机溶剂显影辐射敏感性树脂组合物时获得的抗蚀剂溶出度对比曲线计算对比度值γ。
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公开(公告)号：US20120045719A1
公开(公告)日：2012-02-23
申请号：US13288963
申请日：2011-11-04
CPC分类号： C07C65/10 , C08F8/12 , C08F12/22 , C08F212/14 , C09D125/18 , G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/122 , Y10S430/126 , C08F2220/1891 , C08F220/18
摘要： A radiation-sensitive resin composition includes an acid-dissociable group-containing resin, and a compound shown by the following general formula (1). wherein Z− represents a monovalent anion shown by a general formula (2), M+ represents a monovalent onium cation, R1 represents a linear or branched alkyl group having 1 to 12 carbon atoms substituted or unsubstantiated with a fluorine atom, or a linear or branched alkoxy group having 1 to 12 carbon atoms, and n is 1 or 2.
摘要翻译： 辐射敏感性树脂组合物包含含酸解离基团的树脂和由以下通式（1）表示的化合物。 其中Z-表示由通式（2）表示的一价阴离子，M +表示一价鎓阳离子，R1表示碳原子数1〜12的被氟原子取代或未取代的直链或支链烷基，或直链或支链 具有1至12个碳原子的烷氧基，n为1或2。
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公开(公告)号：US20100178608A1
公开(公告)日：2010-07-15
申请号：US12602769
申请日：2008-05-26
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/30 , C08F2220/1808 , G03F7/0045 , G03F7/0392
摘要： A radiation-sensitive resin composition includes a resin (A1) that includes a repeating unit shown by the following formula (1-1) and a repeating unit shown by the following formula (1-2), and a radiation-sensitive acid generator (B). The radiation-sensitive resin composition exhibits excellent sensitivity, and can reduce a mask error factor (MEEF). wherein R1, R2, and R3 individually represent a linear or branched alkyl group having 1 to 4 carbon atoms, R4 represents a hydrogen atom, a linear or branched alkyl group having 2 to 4 carbon atoms, a linear or branched fluoroalkyl group having 1 to 4 carbon atoms, or a linear or branched alkoxy group having 1 to 4 carbon atoms, and q represents an integer from 0 to 3.
摘要翻译： 辐射敏感性树脂组合物包括含有下述式（1-1）表示的重复单元和下述式（1-2）所示的重复单元的树脂（A1）和放射线敏感性酸发生剂 B）。 辐射敏感性树脂组合物显示出优异的灵敏度，并且可以降低掩模误差因子（MEEF）。 其中R1，R2和R3分别代表具有1-4个碳原子的直链或支链烷基，R4代表氢原子，具有2至4个碳原子的直链或支链烷基，具有1〜 4个碳原子，或具有1〜4个碳原子的直链或支链烷氧基，q表示0〜3的整数。
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