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公开(公告)号:US09040354B2
公开(公告)日:2015-05-26
申请号:US14184856
申请日:2014-02-20
Applicant: Infineon Technologies AG
Inventor: Gunther Mackh , Gerhard Leschik , Adolf Koller , Harald Seidl
CPC classification number: H01L21/78 , G06F17/5068 , H01L21/82 , H01L23/585 , H01L2924/0002 , H01L2924/00
Abstract: A chip includes a dielectric layer and a fill structure in the dielectric layer, wherein the fill structure extends along a dicing edge of the chip, with the fill structure abutting the dicing edge.
Abstract translation: 芯片包括电介质层中的电介质层和填充结构,其中填充结构沿芯片的切割边缘延伸,填充结构邻接切割边缘。
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公开(公告)号:US20140338827A1
公开(公告)日:2014-11-20
申请号:US13895241
申请日:2013-05-15
Applicant: Infineon Technologies AG
Inventor: Adolf Koller , Franco Mariani , Katharina Umminger
IPC: H01L21/683
CPC classification number: H01L21/6836 , H01L21/67115 , H01L21/67132 , H01L2221/68327 , H01L2221/68381 , Y10T156/1917 , Y10T156/1994
Abstract: Methods and apparatuses are provided where a parting agent is applied to at least one portion of a substrate. The at least one portion of the substrate is removed from a carrier.
Abstract translation: 提供了将分离剂施加到基底的至少一部分的方法和装置。 将衬底的至少一部分从载体上去除。
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