公开(公告)号：US07121799B2

公开(公告)日：2006-10-17

申请号：US10748230

申请日：2003-12-31

申请人： Jin Baek Kim ,  Hyoung-Mo Koo ,  Weon-Seok Choi ,  Yong Seok Kim

发明人： Jin Baek Kim ,  Hyoung-Mo Koo ,  Weon-Seok Choi ,  Yong Seok Kim

IPC分类号： F04D29/30

CPC分类号： F04D29/023 ,  F04D29/282 ,  F05D2300/43

摘要： A mold to mold an integral turbofan having a rotating plate joined to a drive motor, an outer ring concentrically disposed outside of the rotating plate with a spacing therebetween, a plurality of blades radially arranged on a front face of the rotating plate and integrally connected at rear ends thereof to the rotating plate and the outer ring, and a shroud integrally formed with front ends of the blades. The mold includes a first half having first, second and third front parts forming a front face of the rotating plate, the shroud and the outer ring, respectively, and a second half combining with the first half, and including a first rear part forming a rear face of the rotating plate, a plurality of second rear parts forming a rear face of the shroud and the blades, and a third rear part forming a rear face of the outer ring.

摘要翻译： 一种用于模制整体式涡扇风扇的模具，其具有连接到驱动电动机的旋转板，同心地设置在所述旋转板的外侧并具有间隔的外环;多个叶片，径向地布置在所述旋转板的前表面上并且一体地连接在 其后端到旋转板和外环，以及与叶片的前端一体形成的护罩。 模具包括具有分别形成旋转板的前面，护罩和外圈的第一，第二和第三前部的第一半部以及与前半部结合的第二半部，并且包括形成第一后部的第一后部 旋转板的后表面，形成护罩和刀片的后表面的多个第二后部，以及形成外圈的后表面的第三后部。

公开(公告)号：US5750680A

公开(公告)日：1998-05-12

申请号：US713085

申请日：1996-09-12

申请人： Jin Baek Kim ,  Min Ho Jung ,  Kyeong Ho Chang

发明人： Jin Baek Kim ,  Min Ho Jung ,  Kyeong Ho Chang

IPC分类号： G03F7/039 ,  C07D205/08 ,  C07D207/26 ,  C07D207/273 ,  C07D207/277 ,  C07D211/74 ,  C07D223/10 ,  C07D405/12 ,  C07F7/10 ,  C07F9/553 ,  C08F26/00 ,  C08F26/06 ,  C08F26/10 ,  G03F7/004 ,  G03F7/038 ,  C08F30/08 ,  G03C1/60

CPC分类号： C07D207/273 ,  C07D207/277 ,  C07D223/10 ,  C07D405/12 ,  C08F26/06 ,  C08F26/10 ,  G03F7/0045 ,  G03F7/0387 ,  G03F7/039

摘要： N-vinyllactam derivatives protected at the 3-position are provided and represented by the following formula (I). These are polymerized into homo- and copolymers for use in microlithography of semiconductor manufacture. The polymers are used as a photoresist material suitable for a deep UV process so that pictures of high sensitivity and high resolution can be obtained. In addition, ultrafine circuits can be formed and an exceptional improvement in pattern formation can be accomplished through the use of the photoresist of the invention. ##STR1##

摘要翻译： 提供保护在3-位的N-乙烯基内酰胺衍生物并由下式（I）表示。 它们被聚合成用于半导体制造的微光刻的均聚物和共聚物。 聚合物被用作适用于深UV工艺的光致抗蚀剂材料，从而可获得高灵敏度和高分辨率的照片。 此外，可以形成超细电路，并且可以通过使用本发明的光致抗蚀剂来实现图案形成的特别改进。 （一）

公开(公告)号：US07241326B2

公开(公告)日：2007-07-10

申请号：US11050805

申请日：2005-02-07

申请人： Jae Oh Han ,  Jin Baek Kim ,  Weon Seok Choi ,  Jai Kwon Lee

发明人： Jae Oh Han ,  Jin Baek Kim ,  Weon Seok Choi ,  Jai Kwon Lee

IPC分类号： B01D46/00

CPC分类号： B01D46/10 ,  B01D46/0021 ,  B01D2265/05 ,  B01D2273/30

摘要： An air purifier including: a filter which removes contaminants from air passing therethrough; a fan which generates a flow force to pass air through the filter; and a rotating body rotatably mounted in the air purifier and defining a flow path around the fan, a discharge direction of the flow path being varied by rotation of the rotating body.

摘要翻译： 一种空气净化器，包括：过滤器，其从通过其的空气中除去污染物; 产生使空气通过过滤器的流动力的风扇; 以及可旋转地安装在所述空气净化器中并且限定围绕所述风扇的流动路径的旋转体，所述流路的排出方向由所述旋转体的旋转而变化。

公开(公告)号：US07066712B2

公开(公告)日：2006-06-27

申请号：US10748229

申请日：2003-12-31

申请人： Jin Baek Kim ,  Hyoung-Mo Koo ,  Weon-Seok Choi

发明人： Jin Baek Kim ,  Hyoung-Mo Koo ,  Weon-Seok Choi

IPC分类号： F25D17/04

CPC分类号： F24F1/0007 ,  F04D17/165 ,  F04D25/082 ,  F04D29/281 ,  F24F1/0022 ,  F24F13/24 ,  F24F2001/0037

摘要： A turbofan to reduce noise through a suppression of turbulent air flow at an outlet thereof and also to guide the air discharged from the outlet in a specific discharging direction, and an air conditioner equipped with the turbofan to improve an efficiency of a heat exchange. The turbofan includes a rotating plate coupled to a shaft of a drive motor, a plurality of blades radially arranged on a peripheral area of a front face of the rotating plate, a ring-shaped shroud joining to ends of the plurality of blades, and a flow guide rib extending from a peripheral edge of the rotating plate in a rearward direction to guide the air discharged from the turbofan.

摘要翻译： 一种涡轮风扇，其通过抑制其出口处的湍流空气流而减少噪声，并且还引导在特定排出方向上从出口排出的空气，以及配备有涡轮风扇以提高热交换效率的空调。 涡轮风扇包括联接到驱动马达的轴的旋转板，径向布置在旋转板的前表面的周边区域上的多个叶片，连接到多个叶片的端部的环形罩，以及 导流肋从旋转板的周缘沿向后方向延伸以引导从涡轮风扇排出的空气。

公开(公告)号：US06258508B1

公开(公告)日：2001-07-10

申请号：US09514220

申请日：2000-02-25

申请人： Jin Baek Kim ,  Bum Wook Lee

发明人： Jin Baek Kim ,  Bum Wook Lee

IPC分类号： G03F7004

CPC分类号： C08F32/08 ,  G03F7/0045 ,  G03F7/039

摘要： The present invention relates to a polymer prepared by synthesizing monomer having a derivative of cholic acid, deoxycholic acid or lithocholic acid bonded to norbornene, and then homopolymerizing these monomer, copolymerizing these monomer with maleic anhydride, or copolymerizing these monomer, maleic anhydride and 2-hydroxyethyl 5-norbornene-2-carboxylate and/or 5-norbornene-2carboxylic acid, and its use as a photoresist. The polymer synthesized according to the present invention is dissolved in a solvent, together with a photo-acid generator, and filtered through a filter to make a photoresist solution which can be used to produce a lithographic image on a silicon wafer.

摘要翻译： 本发明涉及通过合成具有与降冰片烯键合的胆酸，脱氧胆酸或石胆酸衍生物的单体制备的聚合物，然后使这些单体均聚，将这些单体与马来酸酐共聚，或使这些单体，马来酸酐和2- 5-降冰片烯-2-羧酸羟乙酯和/或5-降冰片烯-2-羧酸，以及其作为光致抗蚀剂的用途。 将根据本发明合成的聚合物与光酸发生剂一起溶解在溶剂中，并通过过滤器过滤以制备可用于在硅晶片上产生平版印刷图像的光致抗蚀剂溶液。

公开(公告)号：US6103448A

公开(公告)日：2000-08-15

申请号：US149953

申请日：1998-09-09

申请人： Jin Baek Kim ,  Hyun Woo Kim

发明人： Jin Baek Kim ,  Hyun Woo Kim

IPC分类号： C07F7/12 ,  G03F7/07 ,  G03F7/075 ,  G03C1/492

CPC分类号： G03F7/0758 ,  G03F7/0755

摘要： Organometal-containing acrylate or methacrylate derivatives and photoresists comprising the polymers thereof. Unlike conventional matrix polymers of photoresist, the polymers induce a difference in silicon content between exposed regions and unexposed regions of photoresists by releasing their silicon-containing side chains with the aid of acid in a chemical amplification manner. The difference in silicon content causes the exposed regions to be etched at a different rate from that of the unexposed regions under oxygen plasma. Thus, the photoresist material makes it possible to use a microlithographic process comprising a dry development step which can advantageously prevent the deformation or collapse of patterns which is aggravated as their aspect ratio increases, as well as the photoresist is economically more favorable than a top surface imaging system to which silylation on its top surface or a multi-level resist system to which wet development on its top layer must be applied, because the microlithographic process is very simple and no solvent is released.

摘要翻译： 含有机金属的丙烯酸酯或甲基丙烯酸酯衍生物和含有其聚合物的光致抗蚀剂。 与光致抗蚀剂的常规基质聚合物不同，聚合物通过以化学放大方式释放其含硅侧链而在曝光区域和光致抗蚀剂的未曝光区域之间引起硅含量的差异。 硅含量的差异导致暴露区域以与氧等离子体下的未曝光区域不同的速率被蚀刻。 因此，光致抗蚀剂材料使得可以使用包括干显影步骤的微光刻工艺，其可以有利地防止随着其纵横比增加而加剧的图案的变形或塌陷，以及光致抗蚀剂在经济上比顶表面更有利 由于微光刻工艺非常简单并且没有溶剂释放，因此其顶表面上的甲硅烷基化或其顶层上的湿显影必须被施加到其上的多层抗蚀剂体系的成像系统。