摘要:
An image display device is provided, which includes a first substrate having a cold-cathode electron-emission element which emits electrons, and a second substrate which is spaced from and opposed to the first substrate. The second substrate has a transparent substrate, a light-emitting layer provided on the transparent substrate and including phosphor particles containing zinc sulfide as a base material, a boron nitride film disposed on a surface of the light-emitting layer, and an anode applying a voltage to the light-emitting layer.
摘要:
A luminescent material is provided, which includes a carbide oxynitride-based compound having a composition represented by formula 1: (M1−wRw)uAl1−xSi1+vOzNtCy formula 1 wherein M is at least one metal element excluding Si and Al, and R is a luminescent central element. w, u, x, v, z, t and y satisfy following relationships: 0.001
摘要:
A luminescent material is provided, which includes a carbide oxynitride-based compound having a composition represented by formula 1: (M1−wRw)uAl1−xSi1+vOzNtCy formula 1 wherein M is at least one metal element excluding Si and Al, and R is a luminescent central element. w, u, x, v, z, t and y satisfy following relationships: 0.001
摘要:
According to one embodiment, the luminescent material exhibits a luminescence peak in a wavelength ranging from 500 to 600 nm when excited with light having an emission peak in a wavelength ranging from 250 to 500 nm. The luminescent material has a composition represented by Formula 1 below: (M1-xCex)2yAlzSi10-zOuNw Formula 1 wherein M represents Sr and a part of Sr may be substituted by at least one selected from Ba, Ca, and Mg; x, y, z, u, and w satisfy following conditions: 0
摘要:
According to one embodiment, the luminescent material exhibits a luminescence peak in a wavelength ranging from 500 to 600 nm when excited with light having an emission peak in a wavelength ranging from 250 to 500 nm. The luminescent material has a composition represented by Formula 1 below: (M1-xCex)2yAlzSi10-zOuNw Formula 1 wherein M represents Sr and a part of Sr may be substituted by at least one selected from Ba, Ca, and Mg; x, y, z, u, and w satisfy following conditions: 0
摘要:
A phosphor film structure comprising a substrate and a phosphor film formed on the substrate, wherein the phosphor film comprises ultrafine phosphor particles having an average diameter of 200 nm or less, and obtained by heating a phosphor material to vaporize and rapidly quenching to solidify, and a haze of the phosphor film to a luminous flux of 380-760 nm in wavelength is 50% or less.
摘要:
Disclosed is a phosphor suitable for use in a cathode-ray tube, a fluorescent lamp, a radiation intensifying screen, which comprises transparent spherical particles having an average particle size of 0.5 to 20 .mu.m and a ratio of the major diameter to the minor diameter of individual particles in the range of 1.0 to 1.5, and ultrafine particles having a diameter of 0.2 .mu.m or less in an amount of 5 wt % or less.
摘要:
Disclosed is a phosphor suitable for use in a cathode-ray tube, a fluorescent lamp, a radiation intensifying screen, which comprises transparent spherical particles having an average particle size of 0.5 to 20 .mu.m and a ratio of the major diameter to the minor diameter of individual particles in the range of 1.0 to 1.5, and ultrafine particles having a diameter of 0.2 .mu.m or less in an amount of 5 wt % or less.
摘要:
In the method, apparatus and the substance produced thereby: a plasma flame 1 is produced by a plasma torch 11; the plasma flame 1 is passed through a plasma flame furnace 21 which controls the heat of the plasma flame 1; then, the plasma flame 1 is injected into a reactor column 31 to heat the substance. The substance may be a particle. The plasma flame 1 has a wide flame area in which a temperature of flame is uniform.
摘要:
In the method, apparatus and the substance produced thereby: a plasma flame 1 is produced by a plasma torch 11; the plasma flame 1 is passed through a plasma flame furnace 21 which controls the heat of the plasma flame 1; then, the plasma flame 1 is injected into a reactor column 31 to heat the substance. The substance may be a particle. The plasma flame 1 has a wide flame area in which a temperature of flame is uniform.