公开(公告)号：US5597669A

公开(公告)日：1997-01-28

申请号：US524546

申请日：1995-09-07

申请人： Yuichi Hamada ,  Meguru Kashida ,  Yoshihiro Kubota

发明人： Yuichi Hamada ,  Meguru Kashida ,  Yoshihiro Kubota

IPC分类号： G03F1/62 ,  H01L21/027 ,  G03F9/00

CPC分类号： G03F1/62 ,  Y10T428/3154 ,  Y10T428/31544

摘要： Proposed is a frame-supported pellicle for dustproof protection of a photomask in the photolithographic patterning work for the manufacture of fine electronic devices having excellent mechanical properties and durability of the pellicle membrane against air blow and ultraviolet irradiation. The advantages of the inventive frame-supported pellicle is obtained by the use of, in place of conventional cellulose-based polymers and fluorocarbon-based resins, a norbornene-based plastic resin as the material of the pellicle membrane spread over and adhesively bonded to one end surface of a rigid frame in a slack-free fashion.

摘要翻译： 提出了用于制造具有优异的机械性能和防护薄膜的空气吹扫和紫外线照射的耐久性的精细电子器件的光刻图案工作中的光掩模防尘保护的框架支撑防护薄膜。 通过使用代替常规纤维素类聚合物和氟碳类树脂的降冰片烯系塑料树脂作为防护薄膜的材料，分散在其上并与其粘接，得到本发明的框架式防护薄膜组件的优点。 刚性框架的端面以无松弛的方式。

公开(公告)号：US5378514A

公开(公告)日：1995-01-03

申请号：US103925

申请日：1993-08-06

申请人： Yuichi Hamada ,  Yoshihiko Nagata ,  Meguru Kashida ,  Yoshihiro Kubota

发明人： Yuichi Hamada ,  Yoshihiko Nagata ,  Meguru Kashida ,  Yoshihiro Kubota

IPC分类号： G03F1/62 ,  H01L21/027 ,  B32B3/00

CPC分类号： G03F1/62 ,  G03F1/64 ,  Y10S156/922 ,  Y10T156/11 ,  Y10T428/3154 ,  Y10T428/31544

摘要： Proposed is a novel frame-supported pellicle for dust-proof protection of a photomask used in the photolithographic patterning work in the manufacture of semiconductor devices and the like. The frame-supported pellicle of the invention consists of a pellicle membrane made from a specific fluorocarbon-containing polymer which is adhesively bonded in a slack-free fashion to a surface of a rigid pellicle frame by means of a hot-melt adhesive which is a fluorocarbon-containing polymer of the same type as or similar to the fluorocarbon-containing polymer of the membrane so that no problems are involved in the adhesive bonding relative to the compatibility between the adhesive and the membrane which otherwise is poorly susceptible to adhesive bonding.

摘要翻译： 提出了一种用于半导体器件等的制造中的光刻图案工作中使用的光掩模的防尘保护用新颖的框架式防护薄膜。 本发明的框架式防护薄膜组件由一种由特定含氟烃聚合物制成的防护薄膜组件，该防护薄膜组件通过热熔粘合剂以一种无松弛的方式与刚性防护薄膜框架的表面粘合， 与含氟碳化物的聚合物相同或相似的含碳氟化合物的聚合物相对于粘合剂和膜之间的相容性而言，粘合剂粘合没有涉及问题，否则粘合剂与胶粘剂粘合性差。

公开(公告)号：US5348919A

公开(公告)日：1994-09-20

申请号：US77425

申请日：1993-06-15

申请人： Haruyoshi Kuwabara ,  Akio Otsuka ,  Yasuyuki Maki ,  Meguru Kashida

发明人： Haruyoshi Kuwabara ,  Akio Otsuka ,  Yasuyuki Maki ,  Meguru Kashida

IPC分类号： C01B21/068 ,  C04B35/584 ,  C04B35/626 ,  C04B35/58

CPC分类号： C04B35/584 ,  C01B21/0682 ,  C01B21/0687 ,  C01P2004/30 ,  C01P2004/54 ,  C01P2004/62 ,  C01P2006/10 ,  C01P2006/12 ,  C01P2006/22

摘要： High-packing silicon nitride powder is prepared by reacting metallic silicon powder having a mean particle size of 1 to 10 .mu.m and a purity of at least 99% directly with nitrogen for forming silicon nitride powder, milling the silicon nitride powder in a dry attritor until the tap density exceeds 0.9 g/cm.sup.3 and the content of particles having an aspect ratio of up to 3 exceeds 95% by weight, and further milling the silicon nitride powder in a wet attritor for finely dividing coarse particles having a particle size of at least 2 .mu.m. The silicon nitride powder has a tap density of at least 0.9 g/cm.sup.3 and a mean particle size of 0.4 to 0.6 .mu.m and contains at least 95% by weight of particles having an aspect ratio of up to 3 and up to 5% by weight of coarse particles having a particle size of at least 2 .mu.m. The powder is moldable into a high density compact, from which a sintered part having improved dimensional precision and strength is obtained.

摘要翻译： 通过使平均粒径为1-10μm的金属硅粉末和氮气直接与氮气直接反应形成氮化硅粉末制备高填充氮化硅粉末，将氮化硅粉末在干磨机中研磨 直到振实密度超过0.9g / cm 3，并且纵横比高达3的颗粒的含量超过95重量％，并且将氮化硅粉末进一步研磨在湿式磨碎机中，以将细粒度为 至少2亩。 氮化硅粉末的振实密度为至少0.9g / cm 3，平均粒径为0.4-0.6μm，并且包含至少95重量％的长宽比高达3和高达5％的颗粒 重量的粒径至少为2μm的粗颗粒。 该粉末可模塑成高密度压块，从而得到具有改善的尺寸精度和强度的烧结部件。

公开(公告)号：US4895761A

公开(公告)日：1990-01-23

申请号：US239496

申请日：1988-09-01

申请人： Meguru Kashida ,  Yasuaki Hara

发明人： Meguru Kashida ,  Yasuaki Hara

IPC分类号： C08L83/07 ,  B05D7/04 ,  B05D7/24 ,  C09D183/04 ,  C09D183/05 ,  C09D183/07 ,  C09J7/02

CPC分类号： C09J7/0228 ,  C09J7/0232 ,  C09J2400/226 ,  C09J2400/283 ,  C09J2483/005 ,  Y10T428/265 ,  Y10T428/27 ,  Y10T428/31504 ,  Y10T428/31663

摘要： The invention provides a method for improving the stability of the surface-releasing performance of a silicone-coated release paper so as to minimize the changes in the peeling resistance between the release paper and an adhesive surface bonded thereto even after lapse of time from preparation of the release paper to bonding of the adhesive surface or from bonding of the adhesive surface to peeling thereof. The method comprises providing an overcoating layer of an organotin compound such as dibutyl tin diacetate on the surface of a cured coating layer of an organopolysiloxane composition comprising a vinyl-containing organopolysiloxane, an organohydrogenpolysiloxane and a platinum catalyst to promote the addition reaction between the silicon-bonded vinyl groups and the silicon-bonded hydrogen atoms.

摘要翻译： 本发明提供了一种提高硅氧烷涂布的剥离纸的表面释放性能的稳定性的方法，以便尽可能减少剥离纸与粘结在其上的粘合剂表面之间的抗剥离性的变化，即使在制备 粘合剂表面的粘合或粘合剂表面的粘合剥离纸。 该方法包括在包含含乙烯基的有机聚硅氧烷，有机氢聚硅氧烷和铂催化剂的有机聚硅氧烷组合物的固化涂层的表面上提供有机锡化合物如二乙酸二丁基锡的外涂层，以促进硅 - 键合的乙烯基和与硅键合的氢原子。

公开(公告)号：US07211353B2

公开(公告)日：2007-05-01

申请号：US11278267

申请日：2006-03-31

申请人： Meguru Kashida ,  Satoru Miyawaki ,  Mikio Aramata ,  Shoji Ichinohe

发明人： Meguru Kashida ,  Satoru Miyawaki ,  Mikio Aramata ,  Shoji Ichinohe

IPC分类号： H01M10/08 ,  C09J7/00

CPC分类号： H01M10/0567 ,  H01M10/0525

摘要： A non-aqueous electrolytic solution is provided comprising a non-aqueous solvent, an electrolyte salt, and a siloxane-modified polyoxyalkylene compound having (poly)organosiloxane structures at both ends of polyoxyalkylene. A secondary battery using the same has improved temperature characteristics and high-output characteristics.

摘要翻译： 提供非水电解液，其包含非水溶剂，电解质盐和在聚氧化烯两端具有（多）有机硅氧烷结构的硅氧烷改性的聚氧化烯化合物。 使用该二次电池的二次电池具有改善的温度特性和高输出特性。

公开(公告)号：US20070059597A1

公开(公告)日：2007-03-15

申请号：US11519849

申请日：2006-09-13

申请人： Tetsuo Nakanishi ,  Meguru Kashida ,  Satoru Miyawaki

发明人： Tetsuo Nakanishi ,  Meguru Kashida ,  Satoru Miyawaki

IPC分类号： H01M6/14 ,  C08G77/04 ,  C08L83/04

CPC分类号： H01M10/0567 ,  C08G77/04 ,  C08G77/045 ,  C08G77/14 ,  H01M10/0525 ,  Y02T10/7011

摘要： A siloxane modified with a cyclic carbonate of the formula: is combined with a non-aqueous solvent and an electrolyte salt to form a non-aqueous electrolytic solution, which is used to construct a secondary battery having improved temperature and cycle characteristics.

摘要翻译： 用下式的环状碳酸酯改性的硅氧烷与非水溶剂和电解质盐组合以形成非水电解液，其用于构建具有改善的温度和循环特性的二次电池。

公开(公告)号：US20060046150A1

公开(公告)日：2006-03-02

申请号：US11202167

申请日：2005-08-12

申请人： Meguru Kashida ,  Satoru Miyawaki ,  Tetsuo Nakanishi ,  Mikio Aramata

发明人： Meguru Kashida ,  Satoru Miyawaki ,  Tetsuo Nakanishi ,  Mikio Aramata

IPC分类号： H01M6/14 ,  C08L83/04 ,  C08G77/04

CPC分类号： H01M10/0567 ,  H01M10/0525 ,  H01M10/42

摘要： A non-aqueous electrolytic solution is provided comprising a non-aqueous solvent, an electrolyte salt, and a siloxane modified with ether bond-bearing organic group. A non-aqueous electrolyte secondary battery using the same has improved characteristics both at low temperatures and at high outputs.

摘要翻译： 提供一种非水电解液，其包含非水溶剂，电解质盐和用含醚键的有机基团改性的硅氧烷。 使用其的非水电解质二次电池在低温和高输出下具有改进的特性。

公开(公告)号：US5723860A

公开(公告)日：1998-03-03

申请号：US673257

申请日：1996-06-28

申请人： Yuichi Hamada ,  Meguru Kashida

发明人： Yuichi Hamada ,  Meguru Kashida

IPC分类号： G02F1/1333 ,  G03F1/64 ,  H01L21/027 ,  H01J5/02

CPC分类号： G03F1/64 ,  Y10T428/249985

摘要： Proposed is an improvement in a frame-supported pellicle, which is a device for dust-proof protection of a photomask used in the photolithographic patterning works in the manufacture of fine electronic devices, consisting of a rigid pellicle frame, a highly transparent membrane of a plastic resin spread over and adhesively bonded to one end surface of the pellicle frame in a slack-free fashion and a layer of a pressure-sensitive adhesive formed on the other end surface of the pellicle frame to facilitate mounting of the frame-supported pellicle on the surface of a photomask and to secure the same at the correct position. The improvement comprises forming the layer of the pressure-sensitive adhesive on the end surface of the pellicle frame to have an outwardly convex surface, for example, in the form of a barrel vault instead of the flat surface in the prior art so that the troubles in the prior art due to occurrence of air gaps between the surface of the adhesive layer and the surface of the photomask unavoidable in mounting of the conventional frame-supported pellicle can be prevented to ensure completely air-tight sealing thereby. The adverse influence on the pellicle membrane due to the air-tightness of sealing by the pressure difference between the outer and inner surfaces can be overcome by providing a penetrating opening for air escape in the pellicle frame covered with a filter sheet.

摘要翻译： 提出了框架支撑防护薄膜的改进，该防护薄膜组件是用于制造精细电子装置的光刻图案工艺中使用的光掩模的防尘保护装置，其由刚性防护薄膜框架，高透明度的膜 塑料树脂铺展并以无松弛的方式粘附在防护薄膜组件框架的一个端面上，并且形成在防护膜框架的另一端表面上的压敏粘合剂层，以便将框架支撑的防护薄膜组件安装在 光掩模的表面并将其固定在正确的位置。 改进之处在于，在防护薄膜组件框架的端面上形成压敏粘合剂层以具有向外凸起的表面，例如以现有技术中的平坦表面为例，而不是平坦表面，从而使故障 在现有技术中，由于在粘合剂层的表面与常规的框架支撑的防护薄膜组件的安装中不可避免的光掩模的表面之间的气隙的发生，可以防止由此发生完全不透气的密封。 可以通过在被过滤片覆盖的防护薄膜组件框架中设置用于空气逸出的穿透开口来克服由于外表面和内表面之间的压力差导致的密封气密性对防护薄膜的不利影响。

公开(公告)号：US5693382A

公开(公告)日：1997-12-02

申请号：US647140

申请日：1996-05-09

申请人： Yuichi Hamada ,  Satoshi Kawakami ,  Toru Shirasaki ,  Yoshihiko Nagata ,  Meguru Kashida ,  Yoshihiro Kubota

发明人： Yuichi Hamada ,  Satoshi Kawakami ,  Toru Shirasaki ,  Yoshihiko Nagata ,  Meguru Kashida ,  Yoshihiro Kubota

IPC分类号： C09J127/12 ,  G03F1/62 ,  G03F1/64 ,  G03F7/20 ,  H01L21/027 ,  A47G1/12

CPC分类号： G03F1/64 ,  G03F1/62 ,  Y10T428/3154 ,  Y10T428/31544

摘要： Disclosed is a frame-supported pellicle, which is an integral body consisting of a rigid frame and a transparent plastic film adhesively bonded to one end surface of the frame in a slack-free fashion, for dustproof protection of a photomask used in a photolithographic patterning work in the manufacture of fine electronic devices such as LSIs and liquid crystal display panels. The frame-supported pellicle is prepared by bonding the frame and plastic film with an adhesive having a glass transition temperature substantially lower than that of the polymeric resin forming the film and the adhesive bonding work is performed at a temperature higher than the glass transition temperature of the adhesive but lower than that of the polymeric resin of the film so that excellent adhesive bonding strength can be obtained between the frame and the resin film still without causing any adverse influences on the resin film such as distortion and crease formation.

摘要翻译： 公开了一种框架支撑的防护薄膜，其是由刚性框架和透明塑料薄膜组成的整体，所述刚性框架和透明塑料薄膜以无松弛的方式粘合到所述框架的一个端面上，以防止光刻图案中使用的光掩模的防尘保护 在制造诸如LSI和液晶显示面板的精细电子器件中工作。 框架支撑的防护薄膜组件是用玻璃化转变温度基本上低于形成薄膜的聚合物树脂的玻璃化转变温度的粘合剂将框架和塑料薄膜粘合而制成的，并且粘合剂在高于玻璃化转变温度 粘合剂但低于膜的聚合物树脂的粘合剂，从而在框架和树脂膜之间仍然可以获得优异的粘合强度，而不会对树脂膜造成任何不利影响，例如变形和折痕形成。

公开(公告)号：US5419972A

公开(公告)日：1995-05-30

申请号：US287778

申请日：1994-08-09

申请人： Sakae Kawaguchi ,  Yuichi Hamada ,  Toru Shirasaki ,  Yoshihiko Nagata ,  Meguru Kashida ,  Yoshihiro Kubota

发明人： Sakae Kawaguchi ,  Yuichi Hamada ,  Toru Shirasaki ,  Yoshihiko Nagata ,  Meguru Kashida ,  Yoshihiro Kubota

IPC分类号： G03F1/64 ,  G03F7/20 ,  H01L21/027 ,  G03B27/58

CPC分类号： G03F1/64 ,  G03F7/70866 ,  Y10T428/12569 ,  Y10T428/12736 ,  Y10T428/12743 ,  Y10T428/1275 ,  Y10T428/12764

摘要： An improvement is proposed for a frame-supported pellicle for dustproof protection of a photomask, which consists of a rigid frame and a transparent plastic membrane adhesively bonded to one end surface of the frame in a slack-free fashion, used in the photolithographic patterning work for the manufacture of fine electronic parts and devices. The improvement is obtained by providing the whole surface of the pellicle frame made from an alluminum alloy with a metallic plating layer of nickel or chromium so as to completely solve the heretofore unavoidable problem by the dust particle deposition on the pellicle membrane during transportation and handling as a consequence of dust particle formation by contacting with the inner surface of the holder case by virtue of the extremely high smoothness of the metal-plated frame surface.

摘要翻译： 提出了一种用于光掩模防尘保护的框架式防护薄膜组件的改进，该光掩模由刚性框架和透明塑料膜组成，该透明塑料膜以无松弛的方式粘合到框架的一个端面上，用于光刻图案工作 用于制造精密电子零件和装置。 通过提供由铝合金制成的防护薄膜组件的整个表面由镍或铬的金属镀层提供，从而完全解决了在运输和处理过程中防尘薄膜上的灰尘颗粒沉积在防尘薄膜上的不可避免的问题 由于金属镀层的框架表面的平滑度极高，因此与保持器壳体的内表面接触而形成粉尘颗粒的结果。