Abstract:
Provided are an apparatus and method for calibrating an extreme ultraviolet (EUV) spectrometer in which a wavelength of a spectrum of EUV light used for EUV lithography and mask inspection technology can be measured accurately.
Abstract:
An optical logic gate includes: a DNA based nanostructure including DNA and metal nanoparticles coupled to the DNA, the DNA based nanostructure being configured to rotate a polarization plane of an incident light; a polarizer to which light passing through the DNA based nanostructure is incident, the polarizer being configured to extract a component in a direction of a predetermined reference axis from light whose polarization plane is rotated by the DNA based nanostructure; and a detection unit to which light passing through the polarizer is incident, the detection unit being configured to generate a logic signal based on a result obtained by comparing the intensity of the component in the reference axis direction extracted by the polarizer with a predetermined threshold value.
Abstract:
Provided is a pulse laser apparatus for generating laser light. The apparatus includes a first mirror and a second mirror which are disposed at both ends of a resonator and configured to reflect the laser light, a gain medium disposed between the first and second mirrors and configured to amplify and output light incident from an outside, an etalon configured to adjust a pulse width of the laser light, and an acousto-optic modulator disposed between the first and second mirrors and configured to form a mode-locked and Q-switched signal from the laser light, in which some of the laser light is output through either the first or second mirror to outside the resonator.