Abstract:
A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.
Abstract:
A touch device according to the embodiment includes a display panel; and a touch panel disposed on the display panel and including a curved surface, wherein an air gap is formed between the display panel and the touch panel. Thus, erosion and defects of components caused by the moisture penetrating into the air gap can be prevented so that the touch device according to the embodiments can improve the durability and the reliability.
Abstract:
A touch window according to an embodiment includes a substrate; a sensing electrode disposed on the substrate; and a wire electrode disposed on the substrate, wherein the at least one of the sensing electrode and the wire electrode is arranged in a form of a mesh.
Abstract:
Disclosed is a lighting device capable of reducing UGR (Unified Glare Rating). in a illuminating member, reflection efficiency of light significantly scattering to the left and right among light applied to the air gap through the diffusion plate is increased using the adhesion material pattern layer of periphery surrounding an air gap, and simultaneously, the UGR may be reduced by removing the process disposing the pattern with a specific structure and increasing the process efficiency.