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公开(公告)号:US11795549B2
公开(公告)日:2023-10-24
申请号:US17688129
申请日:2022-03-07
Applicant: LG INNOTEK CO., LTD.
Inventor: Dong Mug Seong , Jong Min Yun , Su Hyeon Cho , Hae Sik Kim , Tae Hoon Han , Hyo Won Son , Sang Yu Lee , Sang Beum Lee
IPC: H10K71/16 , C23C14/04 , C23F1/02 , H01L21/027 , H01L21/203 , H01L21/475 , H10K71/00 , H10K99/00 , C23F1/28
CPC classification number: H10K71/166 , C23C14/04 , C23C14/042 , C23F1/02 , H01L21/027 , H01L21/203 , H01L21/475 , H10K71/00 , H10K99/00 , C23F1/28 , Y10T428/12854 , Y10T428/24917
Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.
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公开(公告)号:US11732364B2
公开(公告)日:2023-08-22
申请号:US17574128
申请日:2022-01-12
Applicant: LG INNOTEK CO., LTD.
Inventor: Dong Mug Seong , Jong Min Yun , Su Hyeon Cho , Hae Sik Kim , Tae Hoon Han , Hyo Won Son , Sang Yu Lee , Sang Beum Lee
IPC: H10K71/16 , C23C14/04 , C23F1/02 , H01L21/027 , H01L21/203 , H01L21/475 , H10K71/00 , H10K99/00 , C23F1/28
CPC classification number: H10K71/166 , C23C14/04 , C23C14/042 , C23F1/02 , H01L21/027 , H01L21/203 , H01L21/475 , H10K71/00 , H10K99/00 , C23F1/28 , Y10T428/12854 , Y10T428/24917
Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.
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公开(公告)号:US11335854B2
公开(公告)日:2022-05-17
申请号:US16832282
申请日:2020-03-27
Applicant: LG INNOTEK CO., LTD.
Inventor: Dong Mug Seong , Jong Min Yun , Su Hyeon Cho , Hae Sik Kim , Tae Hoon Han , Hyo Won Son , Sang Yu Lee , Sang Beum Lee
IPC: B32B15/00 , H01L51/00 , C23C14/04 , C23F1/02 , H01L21/027 , H01L21/203 , H01L51/56 , H01L21/475 , C23F1/28
Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.
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公开(公告)号:US10727409B2
公开(公告)日:2020-07-28
申请号:US16332910
申请日:2017-08-22
Applicant: LG INNOTEK CO., LTD.
Inventor: Dong Mug Seong , Jong Min Yun , Su Hyeon Cho , Hae Sik Kim , Tae Hoon Han , Hyo Won Son , Sang Yu Lee , Sang Beum Lee
IPC: B32B15/00 , H01L51/00 , C23C14/04 , C23F1/02 , H01L21/027 , H01L21/203 , H01L51/56 , H01L21/475 , C23F1/28
Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.
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公开(公告)号:US09499103B2
公开(公告)日:2016-11-22
申请号:US14035985
申请日:2013-09-25
Applicant: LG INNOTEK CO., LTD.
Inventor: Tae Hoon Han
CPC classification number: B60R1/12 , B60R1/04 , B60R1/088 , B60R2001/1253 , G02F1/157
Abstract: Provided is a display room mirror, including a room mirror disposed in an inner part of a vehicle to detect a rear situation of the vehicle; and an organic light emitting diode (OLED) panel formed in a part or an entire part of a front surface of the room mirror, thereby improving a contrast and a reaction velocity and reducing a thickness and a weight of the room mirror.
Abstract translation: 提供了一种显示室镜,其包括设置在车辆内部的房间镜,以检测车辆的后方情况; 以及形成在室内反射镜的前表面的一部分或全部的有机发光二极管(OLED)面板,从而提高对比度和反应速度,并减小房间反射镜的厚度和重量。
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