公开(公告)号：US06096135A

公开(公告)日：2000-08-01

申请号：US120005

申请日：1998-07-21

申请人： Xin Sheng Guo ,  Shin-Hung Li ,  Lawrence Lei

发明人： Xin Sheng Guo ,  Shin-Hung Li ,  Lawrence Lei

IPC分类号： C23C16/44 ,  C23C16/455 ,  H01L21/00 ,  H01L21/205 ,  H01L21/68 ,  H01L21/683 ,  C23C16/00

CPC分类号： C23C16/45521 ,  C23C16/455 ,  H01L21/67109 ,  H01L21/68 ,  H01L21/6838

摘要： Method and apparatus for reducing contamination of a substrate in a substrate processing system. The apparatus has a substrate support, a gas directing shield circumscribing the substrate support and a shadow ring disposed vertically above the substrate support and gas directing shield for retaining the substrate. The gas directing shield and substrate support define an annular channel that is provided with an edge purge gas. The edge purge gas imparts a force at the edge of a substrate resting on the substrate support the lifts it off the substrate supports and against the shadow ring. The shadow ring further has a plurality of conduits extending from its upper surface to its sidewall to provide a path for the edge purge gas to vent and to impede the flow of process gases under the backside and around the edge of the substrate. The method includes the steps of providing a substrate upon the substrate support, applying a first flow of gas to a first set of ports to lift the substrate off of the substrate support, centering the substrate upon the substrate support and applying a second flow of gas to a second set of ports to establish and maintain thermal control of the substrate.

摘要翻译： 用于减少衬底处理系统中衬底污染的方法和装置。 该装置具有衬底支撑件，围绕衬底支撑件的气体导向屏蔽件和垂直设置在衬底支撑件上方的阴影环和用于保持衬底的气体导向屏蔽件。 气体导向屏蔽和衬底支撑件限定了设置有边缘吹扫气体的环形通道。 边缘吹扫气体在搁置在基板支撑件上的基板的边缘处施加力，将其从基板支撑件提升并抵靠阴影环。 阴影环还具有从其上表面延伸到其侧壁的多个导管，以提供用于边缘吹扫气体排出并阻止在衬底的背侧和周围的处理气体流动的路径。 该方法包括以下步骤：在衬底支撑件上提供衬底，将第一气体流施加到第一组端口以将衬底提升离开衬底支撑件，使衬底对准衬底支撑件并施加第二气体流 到第二组端口以建立和保持基板的热控制。

公开(公告)号：US6050446A

公开(公告)日：2000-04-18

申请号：US893410

申请日：1997-07-11

申请人： Lawrence Lei ,  Son Trinh ,  Gwo-Chuan Tzu ,  Mark Johnson

发明人： Lawrence Lei ,  Son Trinh ,  Gwo-Chuan Tzu ,  Mark Johnson

IPC分类号： H01L21/00 ,  B65D43/24

CPC分类号： H01L21/67017

摘要： A lid assembly for a process chamber. The lid assembly includes a hinge having a hinge mount affixed to the chamber and a hinge arm. A pin extends from the hinge mount through an elongated slot in the hinge arm allowing both rotational and longitudinal motion of the hinge arm relative to the hinge mount. A support frame attached to the hinge arm has two side arms that extend perpendicularly from the hinge arms toward the front of the chamber. The lid is pivotally connected to the side arms by a pivot connection aligned with the center of mass of the lid. A detent extends from the lid through a slot in the side arm at a position offset from the pivot connection. The detent and slot serve to limit the allowable rotation of the lid relative to the lid support frame. Thus, the lid is allowed to float over the opening of the chamber as the lid is closed so that the lid may be positioned in parallel alignment relative to the opening of the chamber before being secured to the chamber.

摘要翻译： 用于处理室的盖组件。 盖组件包括铰链，铰链具有固定到腔室的铰链座和铰链臂。 销从铰链座延伸通过铰链臂中的细长槽，允许铰链臂相对于铰链座的旋转和纵向运动。 附接到铰链臂的支撑框架具有从铰链臂朝向腔室的前部垂直延伸的两个侧臂。 盖通过与盖的质心对准的枢转连接件枢转地连接到侧臂。 制动器在从枢轴连接偏离的位置处从盖子延伸穿过侧臂中的狭槽。 制动器和狭槽用于限制盖相对于盖支撑框架的允许旋转。 因此，当盖被关闭时，允许盖在室的开口上浮动，使得盖可以在被固定到室之前相对于室的开口平行对准地定位。

公开(公告)号：US5968276A

公开(公告)日：1999-10-19

申请号：US893859

申请日：1997-07-11

申请人： Lawrence Lei ,  Son Trinh ,  Mark Johnson

发明人： Lawrence Lei ,  Son Trinh ,  Mark Johnson

IPC分类号： H01L21/205 ,  C23C16/44 ,  C23C16/455 ,  H01L21/285 ,  C23C16/00

CPC分类号： C23C16/45565 ,  C23C16/455 ,  C23C16/45572

摘要： The present invention provides a method and apparatus for improving thermal management of gas being delivered to a chemical vapor deposition chamber. Thermal management is accomplished using a heat transfer fluid in thermal communication with the deposition gas passageways delivering the gases to the chamber for deposition. The gas injection manifold includes gas passageways and coolant liquid passageways, wherein the gas passageways extend through a constant voltage gradient gas feedthrough and the coolant liquid passageways extend through a gas input manifold coupled to the inlet end of the constant voltage gradient gas feedthrough. This arrangement provides for increase coolant liquid flow and allows maintenance or disassembly of the constant voltage gradient gas feedthrough without breaking the seal on the coolant liquid system.

摘要翻译： 本发明提供一种用于改善被输送到化学气相沉积室的气体的热管理的方法和装置。 使用与沉积气体通道热连通的传热流体将气体输送到室以进行沉积来实现热管理。 气体注入歧管包括气体通道和冷却剂液体通道，其中气体通道延伸通过恒定电压梯度气体馈通，并且冷却剂液体通道延伸通过耦合到恒定电压梯度气体馈通的入口端的气体输入歧管。 这种布置提供了增加冷却剂液体流量并允许恒定电压梯度气体馈通的维护或拆卸而不破坏冷却剂液体系统上的密封。