摘要:
A setting for white balance used by a camera during image-capturing can be reflected in a printer, thereby preventing, during printing, execution of such correction as negates an atmosphere of a light source in a recorded image in which the atmosphere has been intentionally allowed to remain. A camera used for a system of the present invention is a digital camera having a white balance process function of allowing the atmosphere of a photographing light source to remain in an image. During image-capturing, WB adaptation rate information indicative of a level of white balance correction is recorded on a recording medium as additional information. A printer reads the WB adaptation rate information for the camera via the recording medium to control white balance in accordance with the setting for the WB adaptation rate. For example, if the WB adaptation rate is less than 100%, then an AWB process executed by the printer is turned off to print the recorded image without changing its tints.
摘要:
A setting for white balance used by a camera during image-capturing can be reflected in a printer, thereby preventing, during printing, execution of such correction as negates an atmosphere of a light source in a recorded image in which the atmosphere has been intentionally allowed to remain. A camera used for a system of the present invention is a digital camera having a white balance process function of allowing the atmosphere of a photographing light source to remain in an image. During image-capturing, WB adaptation rate information indicative of a level of white balance correction is recorded on a recording medium as additional information. A printer reads the WB adaptation rate information for the camera via the recording medium to control white balance in accordance with the setting for the WB adaptation rate. For example, if the WB adaptation rate is less than 100%, then an AWB process executed by the printer is turned off to print the recorded image without changing its tints.
摘要:
Disclosed is a spring steel which contains, by mass, 1.2% or less C; 0.1% to 2% Mn; 0.2% to 3% Si; 0.0003% to 0.005% Al; to 8 ppm Li; 30 ppm or less (excluding 0 ppm) Ca; and 10 ppm or less (excluding 0 ppm) Mg. The steel contains oxide inclusions satisfying the following conditions (1) to (3) in a number of 1×10−4 or more per square millimeter: (1) containing a total of 80 percent by mass or more of Al2O3 and SiO2 based on the inclusion composition excluding Li2O; (2) having a ratio by mass of Al2O3 to SiO2 of from 1:4 to 2:3; and (3) containing lithium (Li). The spring steel gives a spring that exhibits superior fatigue properties without strict control of the average composition of inclusions.
摘要:
The present invention provides a steel for machine and structural use which sustains mechanical properties such as strength by reducing S content, and exerts excellent machinability (in particular, tool life) in both of intermittent cutting with HSS tools and continuous cutting with carbide tools. The invention relates to a steel for machine and structural use which contains an oxide inclusion containing, wherein a total mass of an average composition of the oxide inclusions is 100%: CaO: 10 to 55 mass %; SiO2: 20 to 70 mass %; Al2O3: more than 0 and 35 mass % or less; MgO: more than 0 and 20 mass % or less; MnO: more than 0 and 5 mass % or less; and one or more members selected from the group consisting of Li2O, Na2O, K2O, BaO, SrO and TiO2: 0.5 to 20 mass % in total.
摘要:
High cleanliness spring steel useful in manufacturing a spring with SiO2-based inclusions being extremely controlled and excellent in fatigue properties is provided.High cleanliness spring steel which is steel containing;C: 1.2% (means mass %, hereafter the same with respect to the component) or below (not inclusive of 0%), Si: 1.2-4%, Mn: 0.1-2.0%, Al: 0.01% or below (not inclusive of 0%), and the balance comprising iron with inevitable impurities, wherein; the total of oxide-based inclusions of 4 or above of L (the large diameter of an inclusion)/D (the short diameter of an inclusion) and 25 μm or above of D and oxide-based inclusions of less than 4 L/D and 25 μm or above of L, in the oxide-based inclusions of 25 mass % or above of oxygen concentration and 70% (means mass %, hereafter the same with respect to inclusions) or above of SiO2 content when Al2O3+MgO+CaO+SiO2+MnO=100% is presumed, out of inclusions in the steel, is 20 nos./500 g or below.
摘要:
A Si-killed steel wire rod for obtaining a spring excellent in fatigue properties and a spring excellent in fatigue properties obtained from such steel wire rod are provided. In the Si-killed steel wire rod of the present invention, oxide-based inclusions present in the wire rod contain SiO2: 30-90%, Al2O3: 2-35%, MgO: 35% or below (not inclusive of 0%), CaO: 50% or below (not inclusive of 0%), MnO: 20% or below (not inclusive of 0%) and BaO: 0.2-20% respectively, and total content of (CaO+MgO) is 3% or above.
摘要翻译:提供一种用于获得疲劳特性优异的弹簧和由这种钢线棒获得的疲劳特性优异的弹簧的Si镇静钢线材。 在本发明的Si镇静钢线材中,线材中存在的氧化物系夹杂物含有SiO 2:30〜90%,Al 2 O 3:2-35%,MgO:35%以下(不包括0%) ,CaO:50%以下(不包括0%),MnO:20%以下(不包括0%)和BaO:0.2〜20%,(CaO + MgO)的总含量为3% 以上。
摘要:
An image pickup apparatus includes an automatic exposure controller automatically controls ISO sensitivity in response to the output signal of an exposure metering circuit, and controls the exposure so that exposure setting is determined based on the brightness values of both the central photometry area and the remaining photometry area of an imaging frame. The automatic exposure controller controls the exposure setting so that when the ISO sensitivity is set to its higher value, the weighting factor of the central photometry area is higher than that of the remaining photometry area. The automatic exposure controller further determines whether or not a light source is behind an object, and, if it is the case, reduces the adjusted exposure setting so as to increase the amount of light incident on the image pickup apparatus.
摘要:
In order to detect an abnormality of semiconductor manufacturing apparatus, a biaxial coordinate system having first and second axes respectively assigned two different monitoring parameters selected from plural apparatus status parameters representing statuses of semiconductor manufacturing apparatus is prepared. As monitoring parameters, for example, a cumulative film thickness for deposition processes that have previously been performed in deposition apparatus and an opening of the pressure control valve located in a vacuum exhaust path to control the internal pressure of a reaction vessel are selected. Values of monitoring parameters obtained when the semiconductor manufacturing apparatus was normally operating are plotted on the biaxial coordinate system. A boundary between a normal condition and an abnormality status is set around a plot group. Values of monitoring parameters obtained during present operation of the semiconductor manufacturing apparatus are plotted on the biaxial coordinate system to determine whether or not there exists an abnormality and identify a type of abnormality based on a positional relation between the plots and the boundary.
摘要:
An image processing system includes: an image capturing apparatus for obtaining an image of a subject, having a setting unit, which sets an obtaining condition for the image according to user's operation, and an outputting unit, which outputs the obtaining condition in association with the image; and an image processing apparatus for performing an image processing for the image, having a receiving unit, which receives the image and the obtaining condition, an image processing unit, which performs an image processing for the image, and a controlling unit, which controls the image processing unit based on the obtaining conditions.
摘要:
In a system in which an editing server and a plurality of client computers are capable of communicating with one another, an edited image can be generated by the plurality of client computers.When image data is transmitted from the image server to the client computer, the resolution of image data to be transmitted is reduced in correspondence with the resolution of a monitor display device connected to the client computer. Further, the number of colors of an image represented by the image data is decreased in correspondence with the number of colors which can be displayed on the monitor display device. The data quantity of the image data to be transmitted is reduced, so that time required to transmit the image data is shortened.A client computer and a main image server are connected to each other. A user image to be synthesized on a template image is read in the client computer. Image data representing the template image used for the image synthesis and image data representing a mask image are transmitted from the main image server to the client computer. In the client computer, image synthesis processing is performed. Image data representing an area required for image synthesis of the user image used for the image synthesis is extracted. The extracted user image data and synthesis information required for the synthesis are transmitted from the client computer to the main image server. In the main image server, a composite image is printed.