公开(公告)号：US20110315551A1

公开(公告)日：2011-12-29

申请号：US13226298

申请日：2011-09-06

申请人： Makoto YUASA ,  Masahiko ABE ,  Aritomo Yamaguchi ,  Asako Shiozawa ,  Masuhide Ishikawa ,  Katsuya Eguchi ,  Shigeru Kido

发明人： Makoto YUASA ,  Masahiko ABE ,  Aritomo Yamaguchi ,  Asako Shiozawa ,  Masuhide Ishikawa ,  Katsuya Eguchi ,  Shigeru Kido

IPC分类号： G01N27/333 ,  C25B11/04

CPC分类号： G01N27/3335 ,  A61B5/1473 ,  C11D3/0015 ,  C11D3/2093 ,  C11D3/50 ,  G01N27/3271 ,  G01N33/4925

摘要： An electrode for active oxygen species comprising a conductive component with a polymer membrane of a metal porphyrin complex formed on the surface is disclosed. The electrode for active oxygen species can detect active oxygen species such as superoxide anion radicals, hydrogen peroxide, and .OH and other active radical species (NO, ONOO—, etc.) in any environment including in vivo environment as well as in vitro environment. The electrode thus can be used for specifying various diseases and examining active oxygen species in food or in water such as tap water and sewage water.

摘要翻译： 公开了一种用于活性氧物质的电极，其包含在表面上形成的具有金属卟啉络合物的聚合物膜的导电组分。 用于活性氧的电极可以在包括体内环境以及体外环境的任何环境中检测活性氧，如超氧阴离子自由基，过氧化氢和.OH等活性自由基（NO，ONOO-等） 。 因此，电极可以用于指定各种疾病并检查食物或水中的活性氧，例如自来水和污水。

公开(公告)号：US20060231124A1

公开(公告)日：2006-10-19

申请号：US11433616

申请日：2006-05-15

申请人： Hiroshi Watanabe ,  Tamotsu Mezaki ,  Shigeru Kido ,  Kiyofumi Sakaguchi

发明人： Hiroshi Watanabe ,  Tamotsu Mezaki ,  Shigeru Kido ,  Kiyofumi Sakaguchi

IPC分类号： B08B3/00

CPC分类号： H01L21/67086 ,  B08B3/10 ,  H05K3/26

摘要： Provided is a processing method capable of reliably processing the inside of a depression such as a trench, a contact hole, a deep pattern, or a pore of a porous substrate. A chemical solution M is supplied into a processing bath 1 placing a substrate W, and the processing bath 1 is repetitively evacuated and pressurized several times at a pressure lower than the atmospheric pressure. Alcohol X is brought into contact with the surface of the substrate W and supplied into a depression W−1. The chemical solution M is supplied into the processing bath 1 containing the substrate W until the chemical solution M reaches a water level at which the substrate W is dipped, thereby allowing the chemical solution M to enter the depression W−1. The chemical solution M is discharged from the processing bath 1, and a portion of the chemical solution M entering the depression W−1 and mixed with the alcohol X is evaporated by evacuating the processing bath 1. This process is repeated several times.

摘要翻译： 提供了能够可靠地处理诸如沟槽，接触孔，深图案或多孔基材的孔的凹陷的内部的处理方法。 将化学溶液M供给到放置基板W的处理槽1中，并且处理槽1在低于大气压的压力下重复抽真空并加压数次。 使酒精X与基板W的表面接触并供给到凹部W-1中。 将化学溶液M供给到含有基板W的处理槽1中，直到化学溶液M达到浸渍基板W的水位，从而使化学溶液M进入凹部W-1。 从处理槽1排出化学溶液M，通过抽出处理槽1蒸发进入凹部W-1并与醇X混合的部分化学溶液M. 这个过程重复几次。

公开(公告)号：US20060049487A1

公开(公告)日：2006-03-09

申请号：US11222895

申请日：2005-09-08

申请人： Nobuhiko Sato ,  Shigeru Kido ,  Kazutaka Momoi

发明人： Nobuhiko Sato ,  Shigeru Kido ,  Kazutaka Momoi

IPC分类号： H01L21/78

CPC分类号： H01L21/02203 ,  H01L21/02238 ,  H01L21/02255 ,  H01L21/02299 ,  H01L21/02307 ,  H01L21/02337 ,  H01L21/31675 ,  H01L21/78 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： A semiconductor device manufacturing method is disclosed. A semiconductor substrate having a separation region and a semiconductor region which covers the separation region entirely is prepared. One or a plurality of circuit elements are formed in the semiconductor region. The semiconductor substrate is split at the separation region.

摘要翻译： 公开了半导体器件制造方法。 制备具有分离区域和完全覆盖分离区域的半导体区域的半导体衬底。 在半导体区域中形成有一个或多个电路元件。 半导体衬底在分离区域处分裂。