公开(公告)号：US5145649A

公开(公告)日：1992-09-08

申请号：US592302

申请日：1990-10-02

申请人： Takashi Iizuka ,  Yasuaki Fukuda ,  Masami Hayashida ,  Masahito Niibe

发明人： Takashi Iizuka ,  Yasuaki Fukuda ,  Masami Hayashida ,  Masahito Niibe

IPC分类号： B08B7/00 ,  C23F4/00 ,  G02B27/00 ,  G03F7/20 ,  H05H13/04

CPC分类号： G03F7/70058 ,  B08B7/0035 ,  G02B27/0006 ,  G03F7/702 ,  G03F7/70841 ,  G03F7/70925

摘要： A method and apparatus for removing unclear matter on an optical element used with a radiation beam is disclosed. A filter is used to introduce light of a desired wavelength into a chamber in which the optical element is accommodated; a gas supplying device is used to supply a reactive gas which is reactable with the unclear matter on the surface of the optical element; and a vacuum-evacuating device is used to vacuum-evacuate the inside of the chamber.

公开(公告)号：US5048066A

公开(公告)日：1991-09-10

申请号：US624521

申请日：1990-12-10

申请人： Yasuaki Fukuda

发明人： Yasuaki Fukuda

IPC分类号： G03F1/22 ,  G03F7/20

CPC分类号： G03F1/22 ,  G03F7/70691

摘要： Provided are an X-ray mask support member, an X-ray mask, and an X-ray exposure process using the X-ray mask, that can effectively prevent the phenomenon of electrostatic attraction or contact of X-ray masks by appropriately disposing an X-ray mask support membrane in an exposure apparatus that employs soft X-rays. A high precision alignment can be performed.

公开(公告)号：US5607733A

公开(公告)日：1997-03-04

申请号：US475464

申请日：1995-06-07

申请人： Yasuaki Fukuda ,  Shigeyuki Matsumoto

发明人： Yasuaki Fukuda ,  Shigeyuki Matsumoto

IPC分类号： G03F1/22 ,  C23C8/00

CPC分类号： G03F1/22

摘要： A process for preparing an X-ray mask structure comprises an X-ray transmissive film, an X-ray absorptive member held on the X-ray transmissive film and supporting frame for supporting the X-ray transmissive film. The X-ray absorptive member is constituted of crystalline grains having a grain boundary size of 1 .mu.m or larger, or has a density of 90% or more relative to the density of the bulk material.

摘要翻译： 制备X射线掩模结构的方法包括X射线透过膜，X射线透射膜上保持的X射线吸收元件和用于支撑X射线透过膜的支撑框架。 X射线吸收构件由晶粒尺寸为1μm以上的晶粒构成，或者相对于散装材料的密度为90％以上的密度。

公开(公告)号：US5469489A

公开(公告)日：1995-11-21

申请号：US413930

申请日：1995-03-30

申请人： Akira Miyake ,  Yasuaki Fukuda ,  Hiroshi Maehara

发明人： Akira Miyake ,  Yasuaki Fukuda ,  Hiroshi Maehara

IPC分类号： G03F1/22 ,  H01L21/027 ,  H01L39/00

CPC分类号： G03F1/22

摘要： The present invention provides a simple and easy processing method for producing an X-ray mask structure having an X-ray absorber whose side walls have waviness. More specifically, in accordance with the present invention, the method for producing an X-ray mask structure which comprises an X-ray absorber, an X-ray transmissive membrane for supporting the X-ray absorber, and a supporting frame for supporting the X-ray transmissive membrane, includes a step of forming the X-ray absorber by depositing an X-ray absorber material in the regions between resist patterns, the above resist patterns having waviness on the side walls of the resist patterns.

摘要翻译： 本发明提供了一种用于制造具有侧壁具有波纹的X射线吸收体的X射线掩模结构的简单且容易的加工方法。 更具体地，根据本发明，用于制造X射线掩模结构的方法包括X射线吸收体，用于支撑X射线吸收体的X射线透过膜，以及支撑X 射线透射膜包括通过在抗蚀剂图案之间的区域中沉积X射线吸收材料来形成X射线吸收体的步骤，上述抗蚀剂图案在抗蚀剂图案的侧壁上具有波纹。

公开(公告)号：US5390228A

公开(公告)日：1995-02-14

申请号：US270794

申请日：1994-07-05

申请人： Masahito Niibe ,  Yasuaki Fukuda ,  Masami Hayashida

发明人： Masahito Niibe ,  Yasuaki Fukuda ,  Masami Hayashida

IPC分类号： G03F7/20 ,  G21K5/02

CPC分类号： G03F7/70008 ,  G03F7/20 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70266 ,  G03F7/70866 ,  G03F7/70875 ,  G03F7/70891

摘要： A temperature distribution of an object, such as an optical element, onto which radiation energy is irradiated, is measured. The change of the shape of the object is controlled by varying the temperature of a part of the object on the basis of the measured temperature distribution to stabilize the shape of the object. Also, the shape of the object being irradiated is stabilized by causing the same temperature distribution in the object when in the thermally stable condition to be generated in the object while it is being irradiated. If the shapes of masks used to manufacture semiconductor devices are stabilized by using the above methods, highly integrated semiconductor devices can be manufactured.

摘要翻译： 测量照射有辐射能量的物体（例如光学元件）的温度分布。 通过基于测量的温度分布改变物体的一部分的温度来控制物体的形状的变化，以稳定物体的形状。 此外，当被照射时，当在物体中产生热稳定状态时，通过引起物体中相同的温度分布来稳定被照射物体的形状。 如果通过使用上述方法使用于制造半导体器件的掩模的形状稳定，则可以制造高度集成的半导体器件。

公开(公告)号：US4361581A

公开(公告)日：1982-11-30

申请号：US221007

申请日：1980-12-29

申请人： Yasuaki Fukuda

发明人： Yasuaki Fukuda

IPC分类号： A61K8/35 ,  A61K8/37 ,  A61Q19/02 ,  C07C49/717 ,  A61K7/40 ,  C07C69/02 ,  C07C69/22

CPC分类号： A61K8/37 ,  A61K8/35 ,  A61Q19/02 ,  C07C49/717

摘要： 4-Isopropyltropolone having the formula: ##STR1## and/or the fatty acid esters thereof having the formula: ##STR2## (wherein R is a hydrocarbon group having 1 to 18 carbon atoms) have the excellent skin-beautifying and anti-suntan effects and are usable as active ingredients for the skin-beautifying cosmetics. The fatty acid esters of 4-isopropyltropolone are novel substances.

摘要翻译： 具有下式的4-异丙基托乐酮和/或其具有下式的脂肪酸酯（其中R是具有1至18个碳原子的烃基）具有优异的美白和防晒效果 并且可用作皮肤美容化妆品的活性成分。 4-异丙基托品酮的脂肪酸酯是新物质。

公开(公告)号：US5808312A

公开(公告)日：1998-09-15

申请号：US677526

申请日：1996-07-10

申请人： Yasuaki Fukuda

发明人： Yasuaki Fukuda

IPC分类号： G01B11/24 ,  G01N23/18 ,  G03F1/72 ,  G03F1/74 ,  G03F1/84 ,  G03F1/86 ,  G21K7/00 ,  H01L21/027

CPC分类号： G03F1/74 ,  G03F1/24 ,  G03F1/84 ,  G21K7/00 ,  G01N2021/95676

摘要： An original inspecting and repairing system includes an inspecting device having at least one of a vacuum ultraviolet ray microscope and an X-ray microscope, for inspecting an original, and a processing device for processing the original on the basis of the inspection. This practically enables inspection and repair of any fault of a reflection type original.

摘要翻译： 原始检查和修理系统包括具有用于检查原件的真空紫外线显微镜和X射线显微镜中的至少一个的检查装置和用于基于检查来处理原件的处理装置。 这实际上可以检查和修复反射型原稿的任何故障。

公开(公告)号：US5751780A

公开(公告)日：1998-05-12

申请号：US329787

申请日：1994-10-27

申请人： Yasuaki Fukuda ,  Shigeyuki Matsumoto

发明人： Yasuaki Fukuda ,  Shigeyuki Matsumoto

IPC分类号： G03F1/22 ,  G21K5/00

CPC分类号： G03F1/22

摘要： An X-ray mask structure comprises an X-ray transmissive film, an X-ray absorptive member held on the X-ray transmissive film and supporting frame for supporting the X-ray transmissive film. The X-ray absorptive member is constituted of crystalline grains having a grain boundary size of 1 .mu.m or larger, or has a density of 90% or more relative to the density of the bulk material.

摘要翻译： X射线掩模结构包括X射线透射膜，保持在X射线透射膜上的X射线吸收构件和用于支撑X射线透射膜的支撑框架。 X射线吸收构件由晶粒尺寸为1μm以上的晶粒构成，或者相对于散装材料的密度为90％以上的密度。

公开(公告)号：US5042945A

公开(公告)日：1991-08-27

申请号：US343386

申请日：1989-04-26

申请人： Hirofumi Shibata ,  Yasuaki Fukuda

发明人： Hirofumi Shibata ,  Yasuaki Fukuda

IPC分类号： G03F1/00 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F9/7011 ,  G03F1/22

摘要： A mask structure and a mask positioning device, executes accurate and quick positioning of a mask having a generally ring-like shape. The mask structure includes a supporting frame of a generally ring-like shape, and at least one flat surface formed by a mirror surface is provided at a peripheral part of the supporting frame. Light is projected upon the flat surface and, on the basis of detection of reflected light therefrom, the mask can be positioned with respect to the rotational direction, the inclination and orthogonal coordinate position. The mask positioning device is adapted to execute such positioning accurately and quickly.