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    Imaging optical arrangement to image an object illuminated by X-rays
    1.
    发明授权
    Imaging optical arrangement to image an object illuminated by X-rays 有权

    公开(公告)号：US12040103B2

    公开(公告)日：2024-07-16

    申请号：US17402819

    申请日：2021-08-16

    Applicant: Carl Zeiss SMT GmbH

    Inventor： Johannes Ruoff ,  Heiko Feldmann

    IPC: G01N23/083 ,  G01N23/04 ,  G21K7/00

    CPC classification number: G21K7/00 ,  G01N23/04 ,  G01N23/083

    Abstract: An imaging optical arrangement serves to image an object illuminated by X-rays. An imaging optics serves to image a transfer field in a field plane into a detection field in a detection plane. A layer of scintillator material is arranged at the transfer field. A stop is arranged in a pupil plane of the imaging optics. The imaging optics has an optical axis. A center of a stop opening of the stop is arranged at a decentering distance with respect to the optical axis. Such imaging optical arrangement ensures a high quality imaging of the object irrespective of a tilt of X-rays entering the transfer field. The imaging optical arrangement is part of a detection assembly further comprising a detection array and an object mount. Such detection assembly is part of a detection system further comprising a X-ray source.

    X-ray laser microscopy system and method
    4.
    发明授权
    X-ray laser microscopy system and method 有权

    公开(公告)号：US09943272B2

    公开(公告)日：2018-04-17

    申请号：US15713645

    申请日：2017-09-23

    Applicant: Rising Star Pathway, a California Corporation

    Inventor： Yiming Wang ,  Vincent Huang ,  Hanjie Zou ,  Eileen Guo ,  Ruibo Wu ,  Zhuotong Xian

    IPC: A61B6/00 ,  G21K7/00 ,  G01N23/20 ,  G01N23/083 ,  G01N23/223

    CPC classification number: A61B6/4064 ,  G01N23/083 ,  G01N23/20008 ,  G01N23/20083 ,  G01N23/223 ,  G01N2223/3103 ,  G21K7/00

    Abstract: Improved system and method of X-ray laser microscopy that combines information obtained from both X-ray diffraction and X-ray imaging methods. The sample is placed in an ultra-cold, ultra-low pressure vacuum chamber, and exposed to brief bursts of coherent X-ray illumination further concentrated using X-ray mirrors and pinhole collimation methods. Higher resolution data from a sample is obtained using hard X-ray lasers, such as free electron X-ray lasers, and X-ray diffraction methods. Lower resolution data from the same sample can be obtained using any of hard or soft X-ray laser sources, and X-ray imaging methods employing nanoscale etched zone plate technology. In some embodiments both diffraction and imaging data can be obtained simultaneously. Data from both sources are combined to create a more complete representation of the sample. Methods to further improve performance, such as concave or curved detectors, improved temperature control, and alternative X-ray optics are also disclosed.

    X-ray laser microscopy sample analysis system and method
    5.
    发明授权
    X-ray laser microscopy sample analysis system and method 有权

    公开(公告)号：US09859029B2

    公开(公告)日：2018-01-02

    申请号：US15442670

    申请日：2017-02-26

    Applicant: Rising Star Pathway, a California Corporation

    Inventor： Allison Sihan Jia ,  Muzhi Liu ,  Yuhao Wang ,  Kevin Shaokang You ,  Jingyi Zhang ,  Zhuotong Xian

    IPC: G01N23/00 ,  G21K7/00

    CPC classification number: G21K7/00 ,  G01N23/00 ,  G01N23/20083 ,  G01N2223/304 ,  G01N2223/3103 ,  G01N2223/316

    Abstract: Improved system and method of X-ray laser microscopy that combines information obtained from both X-ray diffraction and X-ray imaging methods. At least one sample is placed in an ultra-cold, ultra-low pressure vacuum chamber, often using a sample administration device configured to present a plurality of samples. The sample is exposed to brief bursts of coherent X-ray illumination, often further concentrated using X-ray mirrors and pinhole collimation methods. Higher resolution data from the samples is obtained using hard X-ray lasers, such as free electron X-ray lasers, and X-ray diffraction methods. Lower resolution data from the same samples can be obtained using any of hard or soft X-ray laser sources, and X-ray imaging methods employing nanoscale etched zone plate technology. In some embodiments both diffraction and imaging data can be obtained simultaneously. Data from both sources are combined to create a more complete representation of the samples.

    Compac X-ray source for semiconductor metrology
    6.
    发明授权
    Compac X-ray source for semiconductor metrology 有权

    公开(公告)号：US09826614B1

    公开(公告)日：2017-11-21

    申请号：US14181697

    申请日：2014-02-16

    Applicant: KLA-Tencor Corporation

    Inventor： Michael S. Bakeman ,  Andrei V. Shchegrov

    IPC: H05G2/00

    CPC classification number: H05G2/00 ,  G21K7/00 ,  H05G2/008

    Abstract: Methods and systems for realizing a high brightness, compact x-ray source suitable for high throughput, in-line x-ray metrology are presented herein. A compact electron beam accelerator is coupled to a compact undulator to produce a high brightness, compact x-ray source capable of generating x-ray radiation with wavelengths of approximately one Angstrom or less with a flux of at least 1e10 photons/s*mm^2. In some embodiments, the electron path length through the electron beam accelerator is less than ten meters and the electron path length through the undulator is also less than 10 meters. The compact x-ray source is tunable, allowing for adjustments of both wavelength and flux of the generated x-ray radiation. The x-ray radiation generated by the compact x-ray source is delivered to the specimen over a small spot, thus enabling measurements of modern semiconductor structures.

    Devices processed using x-rays
    7.
    发明授权
    Devices processed using x-rays 有权

    公开(公告)号：US09607724B2

    公开(公告)日：2017-03-28

    申请号：US14732674

    申请日：2015-06-06

    Applicant: David Lewis Adler

    Inventor： David Lewis Adler

    IPC: G21K7/00 ,  G01N23/04

    CPC classification number: G21K7/00 ,  G01N23/04 ,  G01N23/083 ,  G06T7/0002 ,  G21K2207/005 ,  H01L22/12

    Abstract: Objects undergoing processing by a high resolution x-ray microscope with a high flux x-ray source that allows high speed metrology or inspection of objects such as integrated circuits (ICs), printed circuit boards (PCBs), and other IC packaging technologies. The object to be investigated is illuminated by collimated, high-flux x-rays from an extended source having a designated x-ray spectrum. The system also comprises a stage to control the position and orientation of the object; a scintillator that absorbs x-rays and emits visible photons positioned in very close proximity to (or in contact with) the object; an optical imaging system that forms a highly magnified, high-resolution image of the photons emitted by the scintillator; and a detector such as a CCD array to convert the image to electronic signals.

    ILLUMINATION AND IMAGING DEVICE FOR HIGH-RESOLUTION X-RAY MICROSCOPY WITH HIGH PHOTON ENERGY
    9.
    发明申请
    ILLUMINATION AND IMAGING DEVICE FOR HIGH-RESOLUTION X-RAY MICROSCOPY WITH HIGH PHOTON ENERGY 审中-公开
    具有高光能量的高分辨率X射线显微镜的照明和成像装置

    公开(公告)号：US20170003234A1

    公开(公告)日：2017-01-05

    申请号：US15193380

    申请日：2016-06-27

    Applicant: FRAUNHOFER-GESELLSCHAFT zur Foerderung der angewandten Forschung e.V. ,  AXO Dresden GmbH

    Inventor： Martin GALL ,  Ehrenfried ZSCHECH ,  Reiner DIETSCH ,  Sven NIESE

    IPC: G01N23/207 ,  G21K1/06

    CPC classification number: G21K7/00 ,  G01N23/04 ,  G01N2223/419 ,  G01N2223/611 ,  G21K1/06 ,  G21K1/062

    Abstract: The present invention relates to an illumination and imaging device for high-resolution X-ray microscopy with high photon energy, comprising an X-ray source (1) for emitting X-ray radiation and an area detector (4) for detecting the X-ray radiation. Moreover, the device comprises a monochromatizing and two-dimensionally focussing condenser-based optical system (2) arranged in the optical path of X-ray radiation with two reflective elements (6) being arranged side-by-side for focussing impinging X-ray radiation on an object to be imaged (5) and a diffractive X-ray lens (3) for imaging the object to be imaged (5) on the X-ray detector (4). Typically, the illumination and imaging device is used for performing radiography, tomography and examination of a micro-electronic component or an iron-based material.

    Abstract translation: 本发明涉及具有高光子能量的高分辨率X射线显微镜的照明和成像装置，其包括用于发射X射线辐射的X射线源（1）和用于检测X射线的区域检测器（4） 射线辐射。 此外，该装置包括布置在X射线辐射的光路中的单色和二维聚焦的基于聚光的光学系统（2），两个反射元件（6）并排布置，用于聚焦入射X射线 在成像对象物（5）上的放射线和用于使待成像对象（5）成像（5）在X射线检测器（4）上成像的衍射X射线透镜（3）。 通常，照明和成像装置用于对微电子部件或铁基材料进行射线照相，断层摄影和检查。

    HIGH SPEED X-RAY MICROSCOPE
    10.
    发明申请
    HIGH SPEED X-RAY MICROSCOPE 有权
    高速X射线显微镜

    公开(公告)号：US20160351283A1

    公开(公告)日：2016-12-01

    申请号：US15231774

    申请日：2016-08-08

    Applicant: David Lewis Adler ,  Benjamin Thomas Adler ,  Freddie Erich Babian

    Inventor： David Lewis Adler ,  Benjamin Thomas Adler ,  Freddie Erich Babian

    IPC: G21K7/00

    CPC classification number: G21K7/00 ,  G01N23/04 ,  G01N23/083 ,  G06T7/0002 ,  G21K2207/005 ,  H01L22/12

    Abstract: A high resolution x-ray microscope with a high flux x-ray source that allows high speed metrology or inspection of objects such as integrated circuits (ICs), printed circuit boards (PCBs), and other IC packaging technologies. The object to be investigated is illuminated by collimated, high-flux x-rays from a movable, extended source having a designated x-ray spectrum. The system also comprises a means to control the relative positions of the x-ray source and the object; a scintillator that absorbs x-rays and emits visible photons positioned in very close proximity to (or in contact with) the object; an optical imaging system that forms a highly magnified, high-resolution image of the photons emitted by the scintillator; and a detector such as a CCD array to convert the image to electronic signals.

    Abstract translation: 具有高通量x射线源的高分辨率x射线显微镜，可以对诸如集成电路（IC），印刷电路板（PCB）和其他IC封装技术的物体进行高速计量或检测。 待调查的物体由具有指定的X射线光谱的可移动的扩展源的准直的高通量X射线照射。 该系统还包括控制x射线源和物体的相对位置的装置; 吸收x射线并发射位于与物体非常接近（或接触）的可见光子的闪烁体; 形成由闪烁体发射的光子的高度放大的高分辨率图像的光学成像系统; 以及诸如CCD阵列的检测器，以将图像转换成电子信号。

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