公开(公告)号：US06377336B1

公开(公告)日：2002-04-23

申请号：US09280580

申请日：1999-03-30

Applicant: Naomasa Shiraishi ,  Yuji Kudo ,  Saburo Kamiya

Inventor： Naomasa Shiraishi ,  Yuji Kudo ,  Saburo Kamiya

IPC: G03B2754

CPC classification number: G03F7/70075 ,  G03F7/70108 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70891

Abstract: A projection exposure apparatus including an Irradiation optical system including a light source and irradiating a mask with irradiation light beams, a projection optical system for projecting an image of a pattern of the mask on a substrate, a plurality of first fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed surface with respect to the pattern of the mask in the irradiation optical system or on a plane adjacent to the same and having a center located at a plurality of positions which are eccentric from the optical axis of the irradiation optical system, a plurality of second fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed plane with respect to the incidental end of each of a plurality of the first fly-eye type optical integrators or on a plane adjacent to the same and being disposed to correspond to a plurality of the first fly-eye type optical integrators, and a light divider for dividing and causing the irradiation light beams from the light source to be incident on each of a plurality of the second fly-eye type optical integrators.

Abstract translation: 一种投影曝光装置，包括：包含光源的照射光学系统和照射光束照射掩模;投影光学系统，用于将掩模图案的图像投影在基板上;多个第一飞眼型光学积分器 每个具有相对于照射光学系统中的掩模的图案或与其相邻的平面设置在傅立叶变换表面上的发射侧焦平面，并且具有位于与光学偏心的多个位置的中心 照射光学系统的轴线，多个第二飞眼型光学积分器，其各自具有相对于多个第一飞眼型光学积分器中的每一个的附带端设置在傅立叶变换平面上的发射侧焦平面 或者在与其相邻的平面上并且被设置为对应于多个第一飞眼型光学积分器，并且li 用于分割和使来自光源的照射光束入射到多个第二飞眼型光学积分器中的每一个上。

公开(公告)号：US5563683A

公开(公告)日：1996-10-08

申请号：US481157

申请日：1995-06-07

Applicant: Saburo Kamiya

Inventor： Saburo Kamiya

IPC: G01N27/28 ,  B23Q3/08 ,  G01N27/327 ,  G01N27/404 ,  G03F7/20 ,  H01L21/00 ,  H01L21/027 ,  H01L21/66 ,  H01L21/683 ,  G03B27/60

CPC classification number: G03F7/707 ,  G03F7/70866 ,  G03F7/70875 ,  H01L21/67109 ,  H01L21/6838

Abstract: A substrate holder is provided with two kinds of grooves (clearances) in the absorbing surface thereof. One kind of groove is made of a suitable depth so as to be able to quickly exhaust air and reduce pressure to thereby vacuum mount a substrate, and the other kind of groove is formed with a very small depth within such a range that there is no influence of dust being interposed between the holder and the substrate, in order to better the heat conduction between the substrate and the substrate holder. In addition, the area of the latter is made large as compared with the area of the former.

Abstract translation: 基板保持件在其吸收表面中设置有两种凹槽（间隙）。 一种凹槽由适当的深度制成，以便能够快速排出空气并降低压力，从而真空安装基板，另一种凹槽在非常小的深度范围内形成非常小的深度 为了更好地使衬底和衬底保持器之间的热传导，粉尘被夹持在保持器和衬底之间的影响。 此外，后者的面积比前者的面积大。

公开(公告)号：US5550633A

公开(公告)日：1996-08-27

申请号：US334059

申请日：1994-11-04

Applicant: Saburo Kamiya

Inventor： Saburo Kamiya

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  G01B9/02

CPC classification number: G03F7/70716 ,  G03F7/70775 ,  G03F7/70866 ,  G03F7/70875

Abstract: An optical measuring apparatus includes an environmental chamber which has a blowing opening to which a temperature-controlled gas is supplied from an external device and an exhaust opening for exhausting the air outside the environmental chamber, a light-emitting unit for irradiating a light beam onto an object to be measured arranged in the environmental chamber, a light-receiving unit for receiving the light beam reflected by the object to be measured, and outputting a signal corresponding to a position of the object to be measured. A heat source is provided in the environmental chamber and forms an air layer having a temperature higher than the gas immediately after the gas is supplied from the blowing opening. There is provided a partitioning wall which is arranged between an optical path of the light beam and the heat source to divide a flow of the gas.

Abstract translation: 一种光学测量装置，包括：环境室，具有从外部装置供给温度控制气体的吹入口和用于排出环境室外的空气的排气口;发光部，其将光束照射到 布置在环境室中的被测量物体，用于接收由待测物体反射的光束的光接收单元，并输出与待测物体的位置对应的信号。 在环境室中设置有热源，并且在从吹风口供给气体之后立即形成温度高于气体的空气层。 设置有分隔壁，该分隔壁布置在光束的光路和热源之间以分开气体流。

公开(公告)号：US5392120A

公开(公告)日：1995-02-21

申请号：US90579

申请日：1993-07-12

Applicant: Saburo Kamiya

Inventor： Saburo Kamiya

IPC: G01B9/02 ,  G01B11/00

CPC classification number: G01B9/02003 ,  G01B9/02002 ,  G01B9/02021 ,  G01B9/0207 ,  G03F7/70775 ,  G01B2290/60 ,  G01B2290/70

Abstract: A laser interferometer apparatus is designed such that the path of the laser beam of an interference refractometer to the path of the laser beam of a measuring interferometer is covered with a blast duct temperature-controlled atmospheric gas blown by a blower fan is directed through the interior of the blast duct toward the corner cube of a moving stage along the laser beam.

Abstract translation: 激光干涉仪装置被设计成使得干涉折射计的激光束到测量干涉仪的激光束的路径的路径被鼓风管道温度控制的鼓风机风吹入的大气气体覆盖，通过内部 的鼓风管道沿着激光束朝向移动台的角立方体。

公开(公告)号：US5151749A

公开(公告)日：1992-09-29

申请号：US707925

申请日：1991-05-28

Applicant: Akikazu Tanimoto ,  Saburo Kamiya

Inventor： Akikazu Tanimoto ,  Saburo Kamiya

IPC: G01B9/02 ,  G01B11/00 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70716 ,  G01B11/005 ,  G01B9/02018 ,  G01B9/02019 ,  G01B9/02021 ,  G01B9/02027 ,  G01B9/02061 ,  G03F7/70725 ,  G03F7/70775 ,  G03F9/70

Abstract: A method and apparatus for measuring the coordinate position of a stage on which a semiconductor wafer or the like is placed. Two .theta. interferometers are provided as measuring means for detecting local curving deviations of reflecting surfaces of two plane mirrors perpendicular to each other which mirrors are provided on the stage for detection of the coordinate position of the stage based on the use of light wave interferometers. The curving deviations of the reflecting surfaces of the plane mirrors are measured with the .theta. interferometers to calculate the difference thereby measured and, hence, the true curving deviations of the reflecting surfaces while cancelling out errors in linear movement of the stage. The position of the stage measured with the coordinate position measuring light wave interferometers is corrected by values corresponding to the true curving deviations.

Abstract translation: 一种用于测量其上放置半导体晶片等的台的坐标位置的方法和装置。 提供两个θ干涉仪作为测量装置，用于检测垂直于彼此的两个平面镜的反射表面的局部弯曲偏差，这些反射镜设置在舞台上，用于基于使用光波干涉仪来检测舞台的坐标位置。 使用θ干涉仪测量平面镜的反射面的弯曲偏差，以计算反射面的真实弯曲偏差，从而计算反射面的真实弯曲偏差，同时消除平台的线性运动中的误差。 用坐标位置测量光波干涉仪测量的平台的位置通过对应于真实弯曲偏差的值来校正。