公开(公告)号：US20100159401A1

公开(公告)日：2010-06-24

申请号：US12719455

申请日：2010-03-08

申请人： Hironori IKEZAWA ,  Yuji KUDO ,  Yasuhiro OMURA

发明人： Hironori IKEZAWA ,  Yuji KUDO ,  Yasuhiro OMURA

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

摘要： A liquid immersion type projection optical system that can stably prevent the outflow of immersion liquid into inside of an optical system and can maintain good imaging performance. In the projection optical system of the present invention, an optical path between a light transmitting member (Lp) disposed closest to a second surface (W) side and the second surface is filled with a liquid (Lm1) having a refractive index greater than 1.1, and a light shielding film (36) for shielding the passing of light is formed on the side surfaces (41, 42) of the light transmitting member. When D is a space between the second surface and the light shielding film, Θ is a maximum incident angle of an image forming beam which reaches the second surface, and Ym is a maximum image height on the second surface, the condition of 0.25

摘要翻译： 一种液浸型投影光学系统，其可以稳定地防止浸没液体流入光学系统内部并且可以保持良好的成像性能。 在本发明的投影光学系统中，在最靠近第二表面（W）侧设置的透光构件（Lp）和第二表面之间的光路填充有折射率大于1.1的液体（Lm1） 并且在透光构件的侧面（41,42）上形成用于遮蔽光通过的遮光膜（36）。 当D是第二表面和遮光膜之间的空间时，Θ是到达第二表面的图像形成光束的最大入射角，Ym是第二表面上的最大图像高度，条件为0.25

公开(公告)号：US07706074B2

公开(公告)日：2010-04-27

申请号：US11662066

申请日：2005-09-08

申请人： Yuji Kudo ,  Takeshi Iwasaki

发明人： Yuji Kudo ,  Takeshi Iwasaki

IPC分类号： G02B1/00

CPC分类号： G03F7/70591 ,  G02B13/143

摘要： A projection optical system provided with at least one of optical members made of a calcium fluoride single crystal, wherein each of the optical members satisfies at least any one of the following conditions of (i) to (iii): (i) an RMS value of a spatial frequency component having a number of periods fPD in partial diameter in a range from 10 periods to 50 periods inclusive out of fluctuation of a transmission wavefront relative to light having a wavelength of 633 nm is equal to or below 0.35 nm/cm; (ii) an RMS value of a spatial frequency component having a number of periods fPD in partial diameter in a range from 10 periods to 100 periods inclusive out of fluctuation of a transmission wavefront relative to light having a wavelength of 633 nm is equal to or below 0.45 nm/cm; and (iii) an RMS value of a spatial frequency component having a number of periods fPD in partial diameter in a range from 10 periods to 150 periods inclusive out of fluctuation of a transmission wavefront relative to light having a wavelength of 633 nm is equal to or below 0.50 nm/cm.

摘要翻译： 一种设置有由氟化钙单晶制成的光学部件中的至少一个的投影光学系统，其中每个光学部件满足（i）至（iii）的以下条件中的至少一个：（i）RMS值 具有相对于波长为633nm的光的发射波阵面的波动的10个周期至50个周期的范围内的部分直径的周期数fPD的空间频率分量等于或小于0.35nm / cm; （ii）相对于具有波长为633nm的光的发射波阵面的波动在10个周期到100个周期的范围内，具有部分直径的周期数fPD的空间频率分量的RMS值等于或等于 低于0.45nm / cm; 和（iii）相对于具有波长为633nm的光的发射波阵面的波动在10个周期到150个周期的范围内，具有部分直径的周期数fPD的空间频率分量的RMS值等于 或低于0.50nm / cm。

公开(公告)号：US20090011368A1

公开(公告)日：2009-01-08

申请号：US11884891

申请日：2006-02-23

申请人： Yutaka Ichihara ,  Ayako Nakamura ,  Naomasa Shiraishi ,  Akikazu Tanimoto ,  Yuji Kudo

发明人： Yutaka Ichihara ,  Ayako Nakamura ,  Naomasa Shiraishi ,  Akikazu Tanimoto ,  Yuji Kudo

IPC分类号： G03F7/22 ,  G03B27/42 ,  G03B27/72

CPC分类号： G03F7/70408 ,  G02B5/1838 ,  G02B5/1866 ,  G02B13/143 ,  G02B27/4222 ,  G02B27/4272 ,  G02B27/4277 ,  G03B27/42 ,  G03F7/70283 ,  G03F7/7035

摘要： An object is to provide a high-resolution and economical exposure method suitable for use in formation of a fine pattern for making up an electronic device. Two diffraction gratings (P1, P2) are located in series in an optical path; the two diffraction gratings (P1, P2) and a wafer or the like (W) for making up an electronic device are arranged with a predetermined spacing; a light-dark pattern of interference fringes generated by the diffraction gratings (P1, P2) is transferred onto the wafer or the like (W) to effect exposure. The exposure is done while changing a positional relation between the wafer or the like (W) and the diffraction gratings (P1, P2) according to need.

摘要翻译： 目的是提供一种适合用于形成用于构成电子设备的精细图案的高分辨率和经济的曝光方法。 两个衍射光栅（P1，P2）串联在光路中; 用于构成电子设备的两个衍射光栅（P1，P2）和晶片等（W）以预定间隔布置; 由衍射光栅（P1，P2）产生的干涉条纹的暗暗图案被转印到晶片等（W）上以进行曝光。 在根据需要改变晶片等（W）和衍射光栅（P1，P2）之间的位置关系的同时进行曝光。

公开(公告)号：US06831406B1

公开(公告)日：2004-12-14

申请号：US09577137

申请日：2000-05-24

申请人： Masao Fukuyama ,  Mutsumi Suzuki ,  Yuji Kudo ,  Yoshikazu Hori

发明人： Masao Fukuyama ,  Mutsumi Suzuki ,  Yuji Kudo ,  Yoshikazu Hori

IPC分类号： H05B3304

CPC分类号： H01L51/5012 ,  H01L51/005 ,  H01L51/0059 ,  H01L51/0081

摘要： An organic electroluminescent device comprises a pair of electrodes, and a layer structure provided between the pair of electrodes and including a charge transport layer capable of transporting electrons or holes and an emission layer comprising a major proportion of an organic material capable of emitting light on application of a voltage thereto via the pair of electrodes. The organic material undergoes concentration quenching and the emission layer has a thickness of 4 nm or below. The emission layer may be made of an electroluminescent organic material, which has a fluorescent lifetime shorter than an organic material present in the charge transport layer.

摘要翻译： 有机电致发光器件包括一对电极和设置在该对电极之间的层结构，并且包括能够传输电子或空穴的电荷输送层和包含主要部分的能够在施加时发光的有机材料的发射层 经由一对电极施加电压。 有机材料进行浓缩淬火，发光层的厚度为4nm以下。 发光层可以由电致发光有机材料制成，其荧光寿命短于电荷输送层中存在的有机材料。

公开(公告)号：US06730929B2

公开(公告)日：2004-05-04

申请号：US09740858

申请日：2000-12-21

申请人： Masao Fukuyama ,  Mutsumi Suzuki ,  Yuji Kudo ,  Yoshikazu Hori

发明人： Masao Fukuyama ,  Mutsumi Suzuki ,  Yuji Kudo ,  Yoshikazu Hori

IPC分类号： H01L3524

CPC分类号： H01L51/5012 ,  C09K11/06 ,  H01L51/0035 ,  H01L51/0036 ,  H01L51/0037 ,  H01L51/005 ,  H01L51/0052 ,  H01L51/0055 ,  H01L51/0059 ,  H01L51/0065 ,  H01L51/0067 ,  H01L51/0068 ,  H01L51/0069 ,  H01L51/0071 ,  H01L51/0078 ,  H01L51/0081 ,  H01L2251/308

摘要： An organic electroluminescent device comprises a pair of electrodes and a layer structure provided between the paired electrodes and including, at least, an emission layer comprising a specific type of oligomer. The layer structure may further comprise an electron injection layer and an electron transport layer, one of which comprises a specific type of oligomer. Alternatively, the layer structure may be of the type which comprises an organic layer having a charge transport interference layer in the inside thereof along with an emission layer.

摘要翻译： 有机电致发光器件包括一对电极和设置在成对电极之间的层结构，并且至少包括包含特定类型低聚物的发射层。 层结构还可以包括电子注入层和电子传输层，其中之一包含特定类型的低聚物。 或者，层结构可以是包括其内部具有电荷传输干涉层的有机层以及发射层的类型。

公开(公告)号：US06710854B2

公开(公告)日：2004-03-23

申请号：US09991696

申请日：2001-11-26

申请人： Naomasa Shiraishi ,  Yuji Kudo ,  Saburo Kamiya

发明人： Naomasa Shiraishi ,  Yuji Kudo ,  Saburo Kamiya

IPC分类号： G03B2754

CPC分类号： G03F7/70075 ,  G03F7/70108 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70891

摘要： A projection exposure apparatus including an irradiation optical system including a light source and irradiating a mask with irradiation light beams, a projection optical system for projecting an image of a pattern of the mask on a substrate, a plurality of first fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed surface with respect to the pattern of the mask in the irradiation optical system or on a plane adjacent to the same and having a center located at a plurality of positions which are eccentric from the optical axis of the irradiation optical system, a plurality of second fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed plane with respect to the incidental end of each of a plurality of the first fly-eye type optical integrators or on a plane adjacent to the same and being disposed to correspond to a plurality of the first fly-eye type optical integrators, and a light divider for dividing and causing the irradiation light beams from the light source to be incident on each of a plurality of the second fly-eye type optical integrators.

摘要翻译： 一种投射曝光装置，包括：包含光源的照射光学系统和照射光束照射掩模;投影光学系统，用于将掩模图案的图像投影在基板上;多个第一飞眼型光学积分器 每个具有相对于照射光学系统中的掩模的图案或与其相邻的平面设置在傅立叶变换表面上的发射侧焦平面，并且具有位于与光学偏心的多个位置的中心 照射光学系统的轴线，多个第二飞眼型光学积分器，其各自具有相对于多个第一飞眼型光学积分器中的每一个的附带端设置在傅立叶变换平面上的发射侧焦平面 或者在与其相邻的平面上并且被设置为对应于多个第一飞眼型光学积分器，并且li 用于分割和使来自光源的照射光束入射到多个第二飞眼型光学积分器中的每一个上。

公开(公告)号：US06549267B1

公开(公告)日：2003-04-15

申请号：US09455271

申请日：1999-12-06

申请人： Yuji Kudo

发明人： Yuji Kudo

IPC分类号： G03B2742

CPC分类号： G03B27/42 ,  G03F7/7055 ,  H01S3/0057 ,  Y10S372/70

摘要： This invention pertains to systems for extending the pulse length of pulsed sources of optical radiation. These systems reduce peak optical pulse power without reducing average optical power. The pulse-width extending systems split optical pulses into pulse portions, introduce relative delays among the pulse portions, and then redirect the pulse portions (or portions thereof) along a common axis. Such pulse-width extending systems are especially useful in projection-exposure apparatus for the manufacture of semiconductor devices where short wavelength, high power optical sources tend to damage optical components.

摘要翻译： 本发明涉及用于延长脉冲光源的脉冲长度的系统。 这些系统降低峰值光脉冲功率，而不会降低平均光功率。 脉冲宽度延伸系统将光脉冲分成脉冲部分，引入脉冲部分之间的相对延迟，然后沿公共轴重新定向脉冲部分（或其部分）。 这种脉冲宽度延伸系统在用于制造其中短波长，高功率光源倾向于损坏光学部件的半导体器件的投影曝光装置中特别有用。

公开(公告)号：US06392740B1

公开(公告)日：2002-05-21

申请号：US09246853

申请日：1999-02-09

申请人： Naomasa Shiraishi ,  Yuji Kudo

发明人： Naomasa Shiraishi ,  Yuji Kudo

IPC分类号： G03B2754

CPC分类号： G03F7/70075 ,  G03F7/70108 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70891

摘要： A projection exposure apparatus including an irradiation optical system including a light source and irradiating a mask with irradiation light beams, a projection optical system for projecting an image of a pattern of the mask on a substrate, a plurality of first fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed surface with respect to the pattern of the mask in the irradiation optical system or on a plane adjacent to the same and having a center located at a plurality of positions which are eccentric from the optical axis of the irradiation optical system, a plurality of second fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed plane with respect to the incidental end of each of a plurality of the first fly-eye type optical integrators or on a plane adjacent to the same and being disposed to correspond to a plurality of the first fly-eye type optical integrators, and a light divider for dividing and causing the irradiation light beams from the light source to be incident on each of a plurality of the second fly-eye type optical integrators.

公开(公告)号：US5798823A

公开(公告)日：1998-08-25

申请号：US559398

申请日：1995-11-15

申请人： Yuji Kudo

发明人： Yuji Kudo

IPC分类号： G02B27/09 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/701

摘要： The illumination optical apparatus of this invention is so arranged that light from a discharge lamp is collected by a rotationally symmetric collector mirror, the thus collected light is collimated into nearly parallel light by a collimator optical system, an optical integrator splits the parallel light into a plurality of light beams to form a plurality of secondary light sources, and thereafter the light from the secondary light sources is projected through a condenser optical system. A secondary light source distribution shaping portion is provided for shaping a light intensity distribution of the plural secondary light sources into a predetermined light intensity distribution, the two electrodes of the anode and cathode in the same discharge lamp are located in a predetermined relation, and an entrance surface of the optical integrator is located at a predetermined position with respect to a position where an image of a reflecting surface of the rotationally symmetric collector mirror is formed by the same collimator optical system.

摘要翻译： 本发明的照明光学装置被布置成使得来自放电灯的光被旋转对称的集光镜收集，由此收集的光通过准直光学系统被准直成几乎平行的光，光学积分器将平行光分解为 多个光束形成多个次级光源，之后来自二次光源的光通过聚光镜投影。 提供二次光源分布成形部分，用于将多个次级光源的光强度分布形成预定的光强度分布，同一放电灯中的阳极和阴极的两个电极以预定关系定位，并且 光积分器的入射面相对于通过相同的准直光学系统形成旋转对称的集光镜的反射面的图像的位置而位于预定位置。

公开(公告)号：US07710653B2

公开(公告)日：2010-05-04

申请号：US11645041

申请日：2006-12-26

申请人： Hironori Ikezawa ,  Yuji Kudo ,  Yasuhiro Omura

发明人： Hironori Ikezawa ,  Yuji Kudo ,  Yasuhiro Omura

IPC分类号： G02B27/10

CPC分类号： G03F7/70341

摘要： A liquid immersion type projection optical system that can stably prevent the outflow of immersion liquid into inside of an optical system and can maintain good imaging performance. In the projection optical system of the present invention, an optical path between a light transmitting member (Lp) disposed closest to a second surface (W) side and the second surface is filled with a liquid (Lm1) having a refractive index greater than 1.1, and a light shielding film (36) for shielding the passing of light is formed on the side surfaces (41, 42) of the light transmitting member. When D is a space between the second surface and the light shielding film, Θ is a maximum incident angle of an image forming beam which reaches the second surface, and Ym is a maximum image height on the second surface, the condition of 0.25

摘要翻译： 一种液浸型投影光学系统，其可以稳定地防止浸没液体流入光学系统内部并且可以保持良好的成像性能。 在本发明的投影光学系统中，在最靠近第二表面（W）侧设置的透光构件（Lp）和第二表面之间的光路填充有折射率大于1.1的液体（Lm1） 并且在透光构件的侧面（41,42）上形成用于遮蔽光通过的遮光膜（36）。 当D是第二表面和遮光膜之间的空间时，Θ是到达第二表面的图像形成光束的最大入射角，Ym是第二表面上的最大图像高度，条件为0.25