公开(公告)号：US20240002286A1

公开(公告)日：2024-01-04

申请号：US18132313

申请日：2023-04-07

Applicant: Samsung Display Co., LTD.

Inventor： Kyung-Man KIM ,  Byung Hoon KANG ,  Sang Hoon KIM ,  Sung Hoon KIM ,  Min-Hoon CHOI ,  Seong Jin HWANG

IPC: C03C23/00 ,  C03C15/00 ,  C03C17/00 ,  C03C17/06 ,  H05K5/03

CPC classification number: C03C23/0025 ,  C03C15/00 ,  C03C17/002 ,  C03C17/06 ,  H05K5/03

Abstract: A manufacturing method of a cover window is provided. The method including: irradiating a laser at a plurality of first positions on a first surface of a glass, the laser having a focus value for each of the first positions; irradiating a laser at a plurality of second positions on a second surface of the glass, the laser having a focus value for each of the second positions; forming a curved portion on the first surface of the glass and a step portion on the second surface of the glass by etching the irradiated first and second positions of the glass; and forming a printed layer on the step portion in the second surface of the glass.

公开(公告)号：US20230185342A1

公开(公告)日：2023-06-15

申请号：US17974622

申请日：2022-10-27

Applicant: Samsung Display Co., LTD.

Inventor： Min-Hoon CHOI ,  Seung Ho KIM ,  Yu Ri KIM ,  Seong Jin HWANG ,  Kyung-Man KIM ,  Byung Hoon KANG ,  Sang Hoon KIM ,  Sung Hoon KIM

IPC: G06F1/16

CPC classification number: G06F1/1656

Abstract: A window includes a body unit in which a plurality of grooves is defined, and a width of a groove of the plurality of grooves in a first direction which is parallel to a main extension direction of the body unit is about 80 micrometers (μm) to about 100 μm.

公开(公告)号：US20210317035A1

公开(公告)日：2021-10-14

申请号：US17093041

申请日：2020-11-09

Applicant: Samsung Display Co., Ltd.

Inventor： Gyu In SHIM ,  Seung KIM ,  Byung Hoon KANG ,  Young Ok PARK ,  Su Jin SUNG

IPC: C03C21/00

Abstract: A glass article includes a first surface, a second surface opposed to the first surface, a first compressive region extending from the first surface to a first compression depth, a second compressive region extending from the second surface to a second compression depth and a tensile region between the first compression depth and the second compression depth. A stress profile of the first compressive region includes a first segment located between the first surface and a first transition point and a second segment located between the first transition point and the first compression depth. A depth from the first surface to the first transition point ranges from 6.1 μm to 8.1 μm. A compressive stress at the first transition point ranges from 207 MPa to 254 MPa. A stress-depth ratio of the first transition point ranges from 28 MPa/μm to 35 MPa/μm.

公开(公告)号：US20210188703A1

公开(公告)日：2021-06-24

申请号：US16945606

申请日：2020-07-31

Applicant: Samsung Display Co., LTD.

Inventor： Byung Hoon KANG ,  Seung KIM ,  Young Ok PARK ,  Su Jin SUNG ,  Gyu In SHIM

IPC: C03C21/00

Abstract: A glass article includes lithium alumino-silicate (“LAS”), a first surface, a second surface opposed to the first surface, a first compressive region extended from the first surface to a first compression depth, a second compressive region extended from the second surface to a second compression depth, and a tensile region disposed between the first compression depth and the second compression depth, wherein a stress profile in the first compressive region comprises a first segment provided between the first surface and a first transition point and a second segment provided between the first transition point and the first compression depth, and wherein a ratio of a stress at the first transition point to a stress at the first surface ranges from 0.22 to 0.47.

公开(公告)号：US20180114819A1

公开(公告)日：2018-04-26

申请号：US15605431

申请日：2017-05-25

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Byung Hoon KANG ,  Kwang Suk KIM ,  Joon-Hwa BAE ,  Woo Jin CHO ,  Hyun Jin CHO ,  Jun Hyuk CHEON ,  Byoung Kwon CHOO

IPC: H01L27/32

CPC classification number: H01L27/3248 ,  H01L27/3276 ,  H01L2227/323

Abstract: A method of manufacturing a display device includes: forming an active layer on a substrate; forming a first insulation layer covering the active layer; forming a gate metal line on the first insulation layer; forming a third insulation layer covering the gate metal line and including a silicon oxide; forming a fourth insulation layer including a silicon nitride on the third insulation layer; forming a fifth insulation layer including a silicon oxide on the fourth insulation layer; arranging a blocking member over a region in which the active layer and the gate metal line overlap; forming a fifth auxiliary insulation layer by doping nitrogen ions in the fifth insulation layer; and exposing a part of an upper surface of the fourth insulation layer by removing a portion of a fifth main insulation layer of the fifth insulation layer which does not overlap the fifth auxiliary insulation layer.

公开(公告)号：US20180043501A1

公开(公告)日：2018-02-15

申请号：US15664166

申请日：2017-07-31

Applicant: Samsung Display Co., Ltd.

Inventor： Hyun Jin CHO ,  Joon-Hwa BAE ,  Byoung Kwon CHOO ,  Byung Hoon KANG ,  Jun Hyuk CHEON ,  Jeong-Hye CHOI ,  Young Ho JEONG ,  Woo Jin CHO

IPC: B24B37/34 ,  B24B53/017 ,  B24B37/10

CPC classification number: B24B37/345 ,  B24B37/10 ,  B24B53/017

Abstract: A substrate polishing system includes: a polishing machine and a substrate transporter. The polishing machine includes: a lower surface plate to which a substrate is mounted, and an upper surface plate which faces the lower surface plate and polishes the substrate in cooperation with the lower surface plate, the upper surface plate having a larger area than the substrate mounted on the lower surface plate. The substrate transporter is adjacent to the polishing machine and commonly transports the substrate to and from the polishing machine in a first direction, attaches the substrate to the lower surface plate before polishing thereof, and separates from the lower surface plate the substrate after polishing thereof.