公开(公告)号：US08077391B2

公开(公告)日：2011-12-13

申请号：US12391918

申请日：2009-02-24

Applicant: Chidane Ouchi ,  Masanobu Hasegawa ,  Seima Kato

Inventor： Chidane Ouchi ,  Masanobu Hasegawa ,  Seima Kato

IPC: G02B5/18 ,  G01B9/02

CPC classification number: G03F7/706 ,  G03F1/44

Abstract: A wavefront aberration measuring device includes a mask placed in an object plane of a to-be-tested optical system and having a pattern including a pinhole producing a spherical wave and adjoining diffraction gratings each ruled with lines oriented in a direction different from the other; an illumination optical system that illuminates an area of the mask with light emitted from a light source; a light splitter that splits the light from the pattern transmitted through the to-be-tested optical system; an image pickup unit that takes an image of interference fringes produced by the split light, the image being used in measuring wavefront aberration of the to-be-tested optical system; a detector that detects respective light quantities of respective diffracted beams from the respective illuminated diffraction gratings; and a control unit that controls alignment of the illuminated area of the mask and the pattern in accordance with a detection result.

Abstract translation: 一种波前像差测量装置，包括放置在被测试光学系统的物平面中的掩模，并且具有包括产生球面波的针孔和相邻衍射光栅的图案，每个衍射光栅以与另一个不同的方向定向的线划分; 照明光学系统，其利用从光源发射的光照射所述掩模的区域; 分光器，其将来自透过待测光学系统的图案的光分离; 摄像单元，拍摄由分光产生的干涉条纹的图像，该图像用于测量待测光学系统的波前像差; 检测器，其检测来自各个被照射的衍射光栅的各个衍射光束的各个光量; 以及控制单元，其根据检测结果控制掩模的照明区域和图案的对准。

公开(公告)号：US20100271636A1

公开(公告)日：2010-10-28

申请号：US12765037

申请日：2010-04-22

Applicant: Toshiyuki Naoi ,  Seima Kato ,  Naoki Kohara ,  Chidane Ouchi

Inventor： Toshiyuki Naoi ,  Seima Kato ,  Naoki Kohara ,  Chidane Ouchi

IPC: G01B9/02

CPC classification number: G01B9/02097 ,  G01B9/02024 ,  G01B2290/30

Abstract: A Talbot interferometer includes a diffraction grating, an image pickup device, a moving unit configured to move at least one of the diffraction grating and the image pickup device in an optical axis direction of the test object, and a computer configured to adjust a position of the at least one of the diffraction grating and the image pickup device using the moving unit so that a Talbot condition can be met, based on a spatial frequency spectrum obtained from a plurality of interference fringes captured by the image pickup device while moving the at least one of the diffraction grating and the image pickup device using the moving unit.

Abstract translation: Talbot干涉仪包括衍射光栅，图像拾取装置，被配置为沿着测试对象的光轴方向移动衍射光栅和图像拾取装置中的至少一个的移动单元，以及计算机，被配置为调整 所述至少一个所述衍射光栅和所述图像拾取装置使用所述移动单元，从而可以基于从所述图像拾取装置捕获的多个干涉条纹获得的空间频谱，同时至少移动所述至少一个 衍射光栅中的一个和使用移动单元的图像拾取装置。

公开(公告)号：US20100165355A1

公开(公告)日：2010-07-01

申请号：US12644714

申请日：2009-12-22

Applicant: Seima Kato

Inventor： Seima Kato

IPC: G01N21/41 ,  G01B9/02

CPC classification number: G01N21/41 ,  G01M11/0228 ,  G01M11/0257

Abstract: A refractive index distribution measurement method includes the steps of measuring a first transmission wavefront of a test object by introducing reference light to the test object immersed in a first medium having a first refractive index lower than that of the test object by 0.01 or more, measuring a second transmission wavefront of the test object by introducing the reference light to the test object immersed in a second medium having a second refractive index lower than that of the test object by 0.01 or more and different from the first refractive index, and obtaining a refractive index distribution of the test object based on a measurement result of the first transmission wavefront and a measurement result of the second transmission wavefront.

Abstract translation: 折射率分布测量方法包括以下步骤：通过将参考光引入浸入第一折射率低于测试对象的第一介质的测试对象0.01或更大，测量测试对象的第一透射波前，测量 通过将参考光引入浸入第二折射率低于测试对象的第二折射率的第二介质并且与第一折射率不同的测试对象，将测试对象的第二透射波前， 基于第一发送波阵面的测量结果和第二发送波阵面的测量结果的测试对象的索引分布。

公开(公告)号：US20090213389A1

公开(公告)日：2009-08-27

申请号：US12391918

申请日：2009-02-24

Applicant: Chidane Ouchi ,  Masanobu Hasegawa ,  Seima Kato

Inventor： Chidane Ouchi ,  Masanobu Hasegawa ,  Seima Kato

IPC: G01B9/02

CPC classification number: G03F7/706 ,  G03F1/44

Abstract: A wavefront aberration measuring device includes a mask placed in an object plane of a to-be-tested optical system and having a pattern including a pinhole producing a spherical wave and adjoining diffraction gratings each ruled with lines oriented in a direction different from the other; an illumination optical system that illuminates an area of the mask with light emitted from a light source; a light splitter that splits the light from the pattern transmitted through the to-be-tested optical system; an image pickup unit that takes an image of interference fringes produced by the split light, the image being used in measuring wavefront aberration of the to-be-tested optical system; a detector that detects respective light quantities of respective diffracted beams from the respective illuminated diffraction gratings; and a control unit that controls alignment of the illuminated area of the mask and the pattern in accordance with a detection result.

Abstract translation: 一种波前像差测量装置，包括放置在被测试光学系统的物平面中的掩模，并且具有包括产生球面波的针孔和相邻衍射光栅的图案，每个衍射光栅以与另一个不同的方向定向的线划分; 照明光学系统，其利用从光源发射的光照射所述掩模的区域; 分光器，其将来自透过待测光学系统的图案的光分离; 摄像单元，拍摄由分光产生的干涉条纹的图像，该图像用于测量待测光学系统的波前像差; 检测器，其检测来自各个被照射的衍射光栅的各个衍射光束的各个光量; 以及控制单元，其根据检测结果控制掩模的照明区域和图案的对准。

公开(公告)号：US20080186509A1

公开(公告)日：2008-08-07

申请号：US12020726

申请日：2008-01-28

Applicant: Seima Kato

Inventor： Seima Kato

IPC: G01B9/02

CPC classification number: G01M11/0264 ,  B82Y10/00 ,  B82Y40/00 ,  G01M11/0271 ,  G03F1/24 ,  G03F1/44 ,  G03F7/706

Abstract: The invention provides a measurement apparatus which measures a wavefront aberration of an optical system to be measured, the apparatus includes a measurement mask which is inserted on an object plane of the optical system to be measured, and includes a plurality of reflection units configured to generate spherical waves by reflecting light, the measurement mask including a reflection layer configured to reflect the light, a first layer which is stacked on the reflection layer, has a plurality of openings, and is made of a first substance, and a second layer which is stacked on the first layer, has a window configured to expose a region in which the plurality of openings are arrayed, and is made of a second substance different from the first substance, wherein the plurality of reflection units are formed by portions of the reflection layer, which are exposed through the plurality of openings.

Abstract translation: 本发明提供了一种测量待测量的光学系统的波前像差的测量装置，该装置包括插入待测量的光学系统的物平面上的测量掩模，并且包括多个反射单元，其被配置为产生 通过反射光的球面波，包括被配置为反射光的反射层的测量掩模，堆叠在反射层上的第一层具有多个开口，并且由第一物质制成，第二层是 堆叠在第一层上，具有窗口，其被配置为暴露多个开口排列的区域，并且由不同于第一物质的第二物质制成，其中多个反射单元由反射层的部分形成 ，其通过多个开口暴露。

公开(公告)号：US07283252B2

公开(公告)日：2007-10-16

申请号：US10996381

申请日：2004-11-26

Applicant: Seima Kato

Inventor： Seima Kato

IPC: G01B11/02 ,  G01B9/02

CPC classification number: G03F7/706

Abstract: A measuring method for measuring an interference fringe includes the steps of generating a reference wave as a result of transmission through a slit or pinhole in a mask of a portion of light that has passed a target optical system, generating the interference fringe between the reference wave and a wave of another portion of light that has passed the target optical system and contains aberration information of the target optical system, determining whether contrast of the interference fringe is higher than a predetermined threshold, and exchanging the pinhole or the slit when the contrast is below the predetermined threshold.

Abstract translation: 用于测量干涉条纹的测量方法包括以下步骤：通过通过目标光学系统的光的一部分的掩模中的狭缝或针孔传输的结果产生参考波，产生参考波之间的干涉条纹 以及已经通过目标光学系统并且包含目标光学系统的像差信息的另一部分光的波，确定干涉条纹的对比度是否高于预定阈值，并且当对比度为对比度时更换针孔或狭缝 低于预定阈值。

公开(公告)号：US20060203253A1

公开(公告)日：2006-09-14

申请号：US11364600

申请日：2006-02-27

Applicant: Seima Kato

Inventor： Seima Kato

IPC: G01B9/02

CPC classification number: G03F7/706

Abstract: Disclosed is a method of analyzing an interference fringe, with which method the optical characteristics of an optical system to be examined can be analyzed very precisely. In one preferred form of the invention, the analyzing method includes a step of detecting information related to a first interference fringe produced by interference of two light fluxes, a step of detecting information related to a second interference fringe produced while changing a phase of one of the two light fluxes by π as multiplied by an odd number (e.g., 1 π, 3 π, . . . ), and a step of detecting averaged information of phase information of the two interference fringes, on the basis of the detected information of the first and second interference fringes and by use of Fourier transform.

Abstract translation: 公开了一种分析干涉条纹的方法，通过该方法可以非常精确地分析要检查的光学系统的光学特性。 在本发明的一个优选形式中，分析方法包括检测与由两个光束的干扰产生的第一干涉条纹有关的信息的步骤，检测与改变第二干涉条纹相关的信息的步骤， pi的两个光通量乘以奇数（例如，1π，3π，...），以及检测两条干涉条纹的相位信息的平均信息的步骤，基于检测到的信息 第一和第二干涉条纹以及利用傅立叶变换。

公开(公告)号：US20060072091A1

公开(公告)日：2006-04-06

申请号：US11239859

申请日：2005-09-29

Applicant: Seima Kato

Inventor： Seima Kato

IPC: G03B27/42 ,  G02B26/00

CPC classification number: G03F7/70291 ,  G02B26/0808 ,  G03F7/70275

Abstract: An exposure apparatus includes plural light modulators that are arranged in parallel, each of which includes an element for modulating a phase distribution of incident light by providing the incident light with a phase difference, and plural projection optical systems that are arranged in parallel, each of which corresponds to each light modulator and projects a pattern formed by a corresponding one of the light modulators onto an object to be exposed.

Abstract translation: 曝光装置包括并列布置的多个调光器，每个调制器包括用于通过提供具有相位差的入射光来调制入射光的相位分布的元件，以及平行布置的多个投影光学系统 其对应于每个光调制器并且将由相应的一个光调制器形成的图案投影到待曝光的物体上。