摘要:
The present invention has an object to provide a scanning electron microscope which suppresses a potential gradient produced by preliminary charge without changing lens conditions of an electron microscope. As an aspect to achieve the above object, there is proposed a scanning electron microscope in which a scanning deflector is controlled so that a second beam is scanned to detect electrons released from a sample after scanning a first beam on the sample to charge the surface of the sample and the first beam is scanned so that charge density in a surrounding part within a scanned area by the first beam is increased relatively as compared with a center part within the scanned area by the first beam.
摘要:
An obstacle avoidance method for mobile apparatus includes the steps of acquiring, by a mobile apparatus, information as to relative movement of an obstacle with respect to the mobile apparatus, calculating a travel path and a travel direction of the obstacle based on the information during its relative movement, setting a non-intrusion area having a configuration which is longer in the travel direction of the obstacle than in a direction perpendicular to the travel direction, and performing such travel control on the mobile apparatus as to avoid the non-intrusion area, by which obstacle avoidance operation is fulfilled. Thus, an obstacle avoidance method as well as an obstacle-avoidable mobile apparatus are provided which are capable of not only reducing collisions against obstacles and repetitions of avoidance operation, but also preventing impartment of uneasiness and oppression to persons in the obstacle avoidance operation for mobile apparatuses such as robots.
摘要:
An object of this invention is to provide an electron beam lithography system capable of rapidly creating an accurate exposure map for proximity effect correction. The inventive system creates the map by dividing shot figures by mesh and adding up the divided area values for each mesh. The system comprises: (1) a function for judging and dividing boundaries of shots to be rendered based on mesh positions as well as shot positions and figures in the map, and (2) a function for calculating divided shot area values and adding the values simultaneously to adjacent addresses in cumulative fashion in a plurality of memories furnished downstream of the system.
摘要:
A case for housing integrated microwave circuits comprises a metal conductor body for carrying the integrated circuits on the upper surface thereof, the first and second dielectric substrates stacked on each other and also stacked on the upper surface of the body and having square holes for receiving the integrated circuits. The first substrate has strip line patterns for connecting signal input/output pads of the integrated circuits to each other and external signal terminals, and openings each filled with a conductive metal connected to the body. The second substrate has openings each filled with the conductive metal and electromagnetic shielding partitions between the adjacent square holes to provide isolation of a wave guide mode between the integrated circuits. The openings of both substrates are correspondingly arranged to connect the conductive metals thereof so that electromagnetic shielding is effected.
摘要:
A transfer robot for accommodating and transferring a transferred object has a transfer route storage section, a movement mechanism section, and a security level setting section. The transfer route storage section stores a transfer route having been set up at least on the basis of transfer destination information for the transferred object. The movement mechanism section causes the transfer robot to move toward a transfer destination on the basis of the transfer route. The security level setting section switches a security level of the transfer robot under movement on the basis of a zone level defined beforehand by each region in the transfer route, present position information of the transfer robot, and type information of the transferred object.
摘要:
An exemplary a charged particle beam apparatus converts an inspection position on a test sample (wafer coordinate system) to a setting position of an inspection mechanism (stage coordinate system (polar coordinate system)), a rotating arm and a rotating stage being rotated to be moved for the inspection position on the test sample. In this case, inspection devices are arranged over a locus that is drawn by the center of the rotating stage according to the rotation of the rotating arm. A function for calculating errors (e.g., center shift of the rotating stage) and compensating for the errors is provided, by which the precision of inspection is improved in a charged particle beam apparatus equipped with a biaxial rotating stage mechanism.