公开(公告)号：US20110134418A1

公开(公告)日：2011-06-09

申请号：US13058081

申请日：2009-07-15

Applicant: Shigeru Matsui ,  Mizuki Oku

Inventor： Shigeru Matsui ,  Mizuki Oku

IPC: G01N21/88

CPC classification number: G01N21/93 ,  G01N21/94 ,  G01N21/9501

Abstract: A surface inspecting apparatus can inspect a smaller defect by using a PSL of a smaller particle size. However, the particle size of the PSL is restricted. In the conventional surface inspecting apparatus, therefore, no consideration has been taken as to how to inspect the defect of such a small particle size as is not set in the PSL which will be needed in the near future in an inspection of a semiconductor manufacturing step. The invention has a light source device for generating light which simulated at least one of a wavelength, a light intensity, a time-dependent change of the light intensity, and a polarization of light which was scattered, diffracted, or reflected by an inspection object, and the light is inputted to a photodetector of the surface inspecting apparatus. The smaller defect can be inspected.

Abstract translation: 表面检查装置可以通过使用较小粒径的PSL来检查较小的缺陷。 然而，PSL的粒径受到限制。 因此，在传统的表面检查装置中，没有考虑如何检查在半导体制造步骤的检查中在不久的将来需要的PSL中未设置的这种小粒径的缺陷 。 本发明具有用于产生光的光源装置，其模拟由检查对象散射，衍射或反射的光的波长，光强度，时间依赖性变化和光的偏振中的至少一个 并且光被输入到表面检查装置的光电检测器。 可以检查较小的缺陷。

公开(公告)号：US07872742B2

公开(公告)日：2011-01-18

申请号：US12690987

申请日：2010-01-21

Applicant: Shigeru Matsui

Inventor： Shigeru Matsui

IPC: G01N21/00

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N21/9505

Abstract: A surface inspection apparatus capable of acquiring scattered light intensity distribution information for each scattering azimuth angle, and detecting foreign matters and defects with high sensitivity. A concave mirror for condensation and another concave mirror for image formation are used to cope with a broad cubic angle. Since mirrors for condensation and image formation are used, a support for clamping the periphery of a lens is unnecessary, and an effective aperture area does not decrease. A plurality of azimuth-wise detection optical systems is disposed and reflected light at all azimuths can be detected by burying the entire periphery without calling for specific lens polishing. A light signal unification unit sums digital data from a particular system corresponding to a scattering azimuth designated in advance in the systems for improving an S/N ratio.

Abstract translation: 能够获取各散射方位角的散射光强度分布信息，高灵敏度地检测异物和缺陷的表面检查装置。 用于冷凝的凹面镜和用于成像的另一凹面镜用于处理宽的立方角。 由于使用用于冷凝和图像形成的反射镜，所以不需要用于夹持透镜周边的支撑件，并且有效开口面积不会降低。 设置多个方位检测光学系统，并且可以通过掩埋整个周边来检测所有方位角处的反射光，而不需要特定的透镜抛光。 光信号统一单元将来自与用于提高S / N比的系统中预先指定的散射方位相对应的特定系统的数字数据相加。

公开(公告)号：US07853068B2

公开(公告)日：2010-12-14

申请号：US12216642

申请日：2008-07-09

Applicant: Shigeru Matsui ,  Katsuya Suzuki

Inventor： Shigeru Matsui ,  Katsuya Suzuki

IPC: G06K9/00

CPC classification number: G06T7/001 ,  G01N21/95607 ,  G03F7/7065 ,  G06T2207/30148

Abstract: The pattern defect inspection apparatus is operable to detect defects by comparing a detection image, which is obtained through scanning by an image sensor those patterns that have the identical shape and are continuously disposed on the object under tested at equal intervals in row and column directions, with a reference image obtained by scanning neighboring identical shape patterns in the row and column directions. This apparatus has a unit for generating an average reference image by statistical computation processing from the images of identical shape patterns lying next to the detection image including at least eight nearest chips on the up-and-down and right-and-left sides and at diagonal positions with the detection image being intermediately situated. The apparatus also includes a unit that detects a defect by comparing the detection image to the average reference image thus generated.

Abstract translation: 图案缺陷检查装置可以通过将通过图像传感器进行扫描而得到的检测图像进行比较来检测缺陷，所述检测图像具有相同形状且连续设置在被检测物体上的行和列方向上等间隔的那些图案， 具有通过扫描行和列方向上的相邻相同形状图案而获得的参考图像。 该装置具有用于通过统计计算处理从邻近检测图像的相同形状图案的图像生成平均参考图像的单元，该检测图像包括上下左右侧至少八个最近的码片，以及在 对角位置，检测图像位于中间位置。 该装置还包括通过将检测图像与由此生成的平均参考图像进行比较来检测缺陷的单元。

公开(公告)号：US20100118310A1

公开(公告)日：2010-05-13

申请号：US12690987

申请日：2010-01-21

Applicant: Shigeru Matsui

Inventor： Shigeru Matsui

IPC: G01N21/94 ,  G01N21/47

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N21/9505

Abstract: A surface inspection apparatus capable of acquiring scattered light intensity distribution information for each scattering azimuth angle, and detecting foreign matters and defects with high sensitivity. A concave mirror for condensation and another concave mirror for image formation are used to cope with a broad cubic angle. Since mirrors for condensation and image formation are used, a support for clamping the periphery of a lens is unnecessary, and an effective aperture area does not decrease. A plurality of azimuth-wise detection optical systems is disposed and reflected light at all azimuths can be detected by burying the entire periphery without calling for specific lens polishing. A light signal unification unit sums digital data from a particular system corresponding to a scattering azimuth designated in advance in the systems for improving an S/N ratio.

Abstract translation: 能够获取各散射方位角的散射光强度分布信息，高灵敏度地检测异物和缺陷的表面检查装置。 用于冷凝的凹面镜和用于成像的另一凹面镜用于处理宽的立方角。 由于使用用于冷凝和图像形成的反射镜，所以不需要用于夹持透镜周边的支撑件，并且有效开口面积不会降低。 设置多个方位检测光学系统，并且可以通过掩埋整个周边来检测所有方位角处的反射光，而不需要特定的透镜抛光。 光信号统一单元将来自与用于提高S / N比的系统中预先指定的散射方位相对应的特定系统的数字数据相加。

公开(公告)号：US07616805B2

公开(公告)日：2009-11-10

申请号：US12249328

申请日：2008-10-10

Applicant: Shigeru Matsui ,  Katsuya Suzuki

Inventor： Shigeru Matsui ,  Katsuya Suzuki

IPC: G06K9/00

CPC classification number: G06T7/001 ,  G01N21/95607 ,  G03F7/7065 ,  G06T2207/30148

Abstract: The pattern defect inspection apparatus is operable to detect defects by comparing a detection image, which is obtained through scanning by an image sensor those patterns that have the identical shape and are continuously disposed on the object under tested at equal intervals in row and column directions, with a reference image obtained by scanning neighboring identical shape patterns in the row and column directions. This apparatus has a unit for generating an average reference image by statistical computation processing from the images of identical shape patterns lying next to the detection image including at least eight nearest chips on the up-and-down and right-and-left sides and at diagonal positions with the detection image being intermediately situated. The apparatus also includes a unit that detects a defect by comparing the detection image to the average reference image thus generated.

Abstract translation: 图案缺陷检查装置可以通过将通过图像传感器进行扫描而得到的检测图像进行比较来检测缺陷，所述检测图像具有相同形状且连续设置在被检测物体上的行和列方向上等间隔的那些图案， 具有通过扫描行和列方向上的相邻相同形状图案而获得的参考图像。 该装置具有用于通过统计计算处理从邻近检测图像的相同形状图案的图像生成平均参考图像的单元，该检测图像包括上下左右侧至少八个最近的码片，以及在 对角位置，检测图像位于中间位置。 该装置还包括通过将检测图像与由此生成的平均参考图像进行比较来检测缺陷的单元。

公开(公告)号：US07602482B2

公开(公告)日：2009-10-13

申请号：US11798805

申请日：2007-05-17

Applicant: Shigeru Matsui

Inventor： Shigeru Matsui

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N21/47 ,  G01N2021/8861

Abstract: An optical inspection apparatus irradiates a light beam onto the outer surface of an object to be inspected, in the form of an illumination spot having an illumination intensity which is higher in the outer peripheral part of the object to be inspected than in the inner peripheral part thereof while uniformly maintains a temperature rise caused by the irradiation of the light beam, over the outer surface of the object to be inspected, in order to prevent the effective entire signal value of a scattered light signal from lowering, without lowering the linear speed of a movable stage for the object to be inspected in the outer peripheral part of the object to be inspected, thereby it is possible to prevent lowering of the detectability for a foreign matter or a defect, for preventing lowering of inspection throughput.

Abstract translation: 光学检查装置将光束照射到被检查物体的外周部的照明强度比要检查对象的外周部的照明强度高于内周部的照明光斑的形状 同时在被检查物体的外表面上均匀地保持由光束照射引起的温度升高，以防止散射光信号的有效整体信号值降低，而不会降低线性速度 在待检查物体的外周部分中可检测物体的可移动台，从而可以防止异物或缺陷的可检测性的降低，以防止检查吞吐量的降低。

公开(公告)号：US20080015810A1

公开(公告)日：2008-01-17

申请号：US11826088

申请日：2007-07-12

Applicant: Shigeru Matsui

Inventor： Shigeru Matsui

IPC: G01D1/00 ,  G01N21/47

CPC classification number: G01N21/9501 ,  G01N21/47

Abstract: When detecting light scattered by an object to be inspected by using a pulse laser as a light source, noise increases unless a sampling repletion period of an A/D converter is determined so as to be related to a pulse oscillation repetition period of the light source. (1) The sampling repletion period of the A/D converter is set equal to the pulse oscillation repetition period of the light source or an integer times thereof, and the sampling is synchronized with oscillation of the light source. Or (2) the sampling repletion period of the A/D converter is set equal to a half-integer times the pulse oscillation repetition period of the light source. Even if a ripple component resulting from emission pulses of the light source remains in the scattered light signal supplied to the A/D converter remains, therefore, its influence can be eliminated or reduced.

Abstract translation: 当通过使用脉冲激光器作为光源检测被检查物体散射的光时，噪声增加，除非确定A / D转换器的采样恢复周期以与光源的脉冲振荡重复周期相关 。 （1）A / D转换器的采样补偿周期被设定为等于光源的脉冲振荡重复周期或其整数倍，采样与光源的振荡同步。 或者（2）将A / D转换器的采样恢复周期设定为等于光源的脉冲振荡重复周期的半个整数倍。 即使由于光源的发射脉冲而产生的纹波分量残留在供给A / D转换器的散射光信号中，因此可以消除或减小其影响。

公开(公告)号：US20080013076A1

公开(公告)日：2008-01-17

申请号：US11776887

申请日：2007-07-12

Applicant: Shigeru Matsui

Inventor： Shigeru Matsui

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N21/4738 ,  G01N21/94

Abstract: It is an object of the present invention to realize a surface inspection method capable of enlarging a dynamic range of a measurement system while keeping high a calculation accuracy for a particle size of a contaminant particle/defect irrespectively of the particle size even if an intensity of a scattered light resulting from the contaminant particle/defect present on a surface of an object to be inspected is dependent on an illumination direction or the like.A surface of an object to be inspected is illuminated with two illumination beams having an identical wavelength, an identical elevation angle, an identical azimuth, and an identical polarization characteristic but different in intensity by 100:1. Even if an intensity of a scattered light resulting from a contaminant particle/defect present on or near the surface of the object to be inspected has anisotropy dependent on an illumination direction or a detection direction, an intensity ratio of scattered/diffracted/reflected lights generated by illumination beams is always constant to 100:1. It is possible to enlarge a dynamic range of a measurement system while keeping high calculation accuracy for a particle size of the contaminant particle/defect irrespectively of the anisotropy and the particle size of the contaminant particle/defect.

Abstract translation: 本发明的目的是为了实现能够扩大测量系统的动态范围的表面检查方法，同时保持与污染物颗粒/缺陷的粒径的计算精度无关的粒度，即使是强度 存在于待检查物体的表面上的污染物颗粒/缺陷产生的散射光取决于照明方向等。 待检查物体的表面用具有相同波长，相同仰角，相同方位角和相同偏振特性但具有100:1不同强度的两个照明光束照射。 即使存在于待检查对象的表面上或附近的污染物粒子/缺陷产生的散射光的强度具有取决于照明方向或检测方向的各向异性，产生散射/衍射/反射光的强度比 通过照明光束始终恒定为100：1。 可以扩大测量系统的动态范围，同时对于污染物颗粒/缺陷的粒度保持高的计算精度，而与污染物颗粒/缺陷的各向异性和粒径无关。

公开(公告)号：US06792359B2

公开(公告)日：2004-09-14

申请号：US09794532

申请日：2001-02-27

Applicant: Takanori Ninomiya ,  Seiji Isogai ,  Shigeru Matsui ,  Toshiei Kurosaki

Inventor： Takanori Ninomiya ,  Seiji Isogai ,  Shigeru Matsui ,  Toshiei Kurosaki

IPC: G01B528

CPC classification number: H01L21/67288 ,  G01N21/9501 ,  G01N23/22 ,  G01N2021/8861 ,  G06T7/0004 ,  G06T7/73 ,  G06T2207/30148 ,  H01J37/28 ,  H01J2237/24592

Abstract: Based on a plurality of defects' position-coordinates and attribute detected by an inspecting apparatus, defects that are easily detectable by an observing apparatus are selected. With these selected defects employed as the indicator, the observing apparatus detects and observes the defects. Moreover, creating a coordinate transformation formula for representing a correlated relationship in the defects' position-coordinates between both the apparatuses, the observing apparatus transforms the defects' position-coordinates so as to observe the defects.

Abstract translation: 基于检查装置检测到的多个缺陷的位置坐标和属性，选择由观察装置容易检测的缺陷。 利用这些选择的缺陷作为指标，观察装置检测并观察缺陷。 此外，创建用于表示两个装置之间的缺陷位置坐标中的相关关系的坐标变换公式，观察装置转换缺陷位置坐标以观察缺陷。

公开(公告)号：US06683683B2

公开(公告)日：2004-01-27

申请号：US10084059

申请日：2002-02-28

Applicant: Koji Tomita ,  Muneo Maeshima ,  Shigeru Matsui ,  Yoshitaka Kodama ,  Hitoshi Komuro ,  Kazuo Takeda

Inventor： Koji Tomita ,  Muneo Maeshima ,  Shigeru Matsui ,  Yoshitaka Kodama ,  Hitoshi Komuro ,  Kazuo Takeda

IPC: G01N2188

CPC classification number: G01N21/9505 ,  G01N21/9501

Abstract: A defect inspection apparatus for detecting defects existing on a surface of a semiconductor sample and/or inside the sample based on light information from the sample obtained by irradiating a light beam onto the sample is provided, which comprises a detecting means for detecting positions in the depth direction where the defects exist and distribution of the defects based on the light information; a setting means for setting a position in the depth direction where defects exist; and a means for displaying the distribution of the defects obtained by the detecting means, the displaying means displaying the distribution of the defects corresponding to the position in the depth direction set by the setting means.

Abstract translation: 提供了一种用于根据从将样本照射光束获得的样本的光信息检测存在于半导体样品表面和/或样品内部的缺陷的缺陷检查装置，其包括检测装置， 存在缺陷的深度方向和基于光信息的缺陷分布; 用于设置存在缺陷的深度方向上的位置的设定装置; 以及用于显示由检测装置获得的缺陷的分布的装置，显示装置显示与由设置装置设置的深度方向上的位置相对应的缺陷的分布。